KR960038492A - Semiconductor exposure apparatus and exposure method using the same - Google Patents

Semiconductor exposure apparatus and exposure method using the same Download PDF

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Publication number
KR960038492A
KR960038492A KR1019950009001A KR19950009001A KR960038492A KR 960038492 A KR960038492 A KR 960038492A KR 1019950009001 A KR1019950009001 A KR 1019950009001A KR 19950009001 A KR19950009001 A KR 19950009001A KR 960038492 A KR960038492 A KR 960038492A
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KR
South Korea
Prior art keywords
filter
mask
high frequency
same
exposure apparatus
Prior art date
Application number
KR1019950009001A
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Korean (ko)
Inventor
박영소
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950009001A priority Critical patent/KR960038492A/en
Publication of KR960038492A publication Critical patent/KR960038492A/en

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

라인과 스패이스 패턴의 피치를 줄일 수 있는 반도체 노광장치 및 이를 이용한 노광방법에 대해 기재되어 있다.Disclosed are a semiconductor exposure apparatus capable of reducing the pitch of lines and space patterns and an exposure method using the same.

이는, 마스크, 마스크 하부에 배치된 제1투영계 렌즈, 제1투영계 렌즈 하부에 배치된 고주파 투과 공간 필터, 및 필터 하부에 배치된 제2투영계 렌즈를 포함하는 것을 특징으로 한다. 이때, 고주파 투과 공간 필터로 동공필터를 사용하며, 이는 백그라운드 성분을 제거한다. 따라서, 통상의 노광장치 및 노광방법과 비교하면 동일 마스크로 2배 향상된 피치의 라인 및 스페이스를 구현할 수 있다.This includes a mask, a first projection system lens disposed below the mask, a high frequency transmission spatial filter disposed below the first projection system lens, and a second projection system lens disposed below the filter. At this time, the pupil filter is used as the high frequency transmission spatial filter, which removes the background component. Therefore, compared to the conventional exposure apparatus and the exposure method, it is possible to realize the line and the space of the pitch twice improved with the same mask.

Description

반도체 노광장치 및 이를 이용한 노광방법Semiconductor exposure apparatus and exposure method using the same

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제4도는 본 발명에 의한 반도체 노광장치의 광학 시스템을 도시한 개략도이다.4 is a schematic diagram showing an optical system of a semiconductor exposure apparatus according to the present invention.

Claims (3)

마스크; 상기 마스크 하부에 배치된 제1투영계 렌즈; 상기 제1투영계 렌즈 하부에 배치된 고주파 투과 공간 필터; 및 상기 필터 하부에 배치된 제2투영계 렌즈를 포함하는 것을 특징으로 하는 반도체 노광장치Mask; A first projection lens disposed under the mask; A high frequency transmissive spatial filter disposed under the first projection lens; And a second projection lens disposed under the filter. 제1항에 있어서, 상기 고주파 투과 공간 필터는 동공필터(pupil filter)인 것을 특징으로 하는 반도체 노광 장치The semiconductor exposure apparatus according to claim 1, wherein the high frequency transmission spatial filter is a pupil filter. 마스크와 투영제 필터를 통과한 광의 백그라운드 성분을 고주파투과 공간 필터를 이용하여 소거하는 것을 특징으로 하는 반도체 노광방법A semiconductor exposure method characterized by erasing a background component of light passing through a mask and a projection agent filter using a high frequency transmission spatial filter.
KR1019950009001A 1995-04-17 1995-04-17 Semiconductor exposure apparatus and exposure method using the same KR960038492A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950009001A KR960038492A (en) 1995-04-17 1995-04-17 Semiconductor exposure apparatus and exposure method using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950009001A KR960038492A (en) 1995-04-17 1995-04-17 Semiconductor exposure apparatus and exposure method using the same

Publications (1)

Publication Number Publication Date
KR960038492A true KR960038492A (en) 1996-11-21

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950009001A KR960038492A (en) 1995-04-17 1995-04-17 Semiconductor exposure apparatus and exposure method using the same

Country Status (1)

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KR (1) KR960038492A (en)

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