KR960038492A - Semiconductor exposure apparatus and exposure method using the same - Google Patents
Semiconductor exposure apparatus and exposure method using the same Download PDFInfo
- Publication number
- KR960038492A KR960038492A KR1019950009001A KR19950009001A KR960038492A KR 960038492 A KR960038492 A KR 960038492A KR 1019950009001 A KR1019950009001 A KR 1019950009001A KR 19950009001 A KR19950009001 A KR 19950009001A KR 960038492 A KR960038492 A KR 960038492A
- Authority
- KR
- South Korea
- Prior art keywords
- filter
- mask
- high frequency
- same
- exposure apparatus
- Prior art date
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
라인과 스패이스 패턴의 피치를 줄일 수 있는 반도체 노광장치 및 이를 이용한 노광방법에 대해 기재되어 있다.Disclosed are a semiconductor exposure apparatus capable of reducing the pitch of lines and space patterns and an exposure method using the same.
이는, 마스크, 마스크 하부에 배치된 제1투영계 렌즈, 제1투영계 렌즈 하부에 배치된 고주파 투과 공간 필터, 및 필터 하부에 배치된 제2투영계 렌즈를 포함하는 것을 특징으로 한다. 이때, 고주파 투과 공간 필터로 동공필터를 사용하며, 이는 백그라운드 성분을 제거한다. 따라서, 통상의 노광장치 및 노광방법과 비교하면 동일 마스크로 2배 향상된 피치의 라인 및 스페이스를 구현할 수 있다.This includes a mask, a first projection system lens disposed below the mask, a high frequency transmission spatial filter disposed below the first projection system lens, and a second projection system lens disposed below the filter. At this time, the pupil filter is used as the high frequency transmission spatial filter, which removes the background component. Therefore, compared to the conventional exposure apparatus and the exposure method, it is possible to realize the line and the space of the pitch twice improved with the same mask.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제4도는 본 발명에 의한 반도체 노광장치의 광학 시스템을 도시한 개략도이다.4 is a schematic diagram showing an optical system of a semiconductor exposure apparatus according to the present invention.
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950009001A KR960038492A (en) | 1995-04-17 | 1995-04-17 | Semiconductor exposure apparatus and exposure method using the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950009001A KR960038492A (en) | 1995-04-17 | 1995-04-17 | Semiconductor exposure apparatus and exposure method using the same |
Publications (1)
Publication Number | Publication Date |
---|---|
KR960038492A true KR960038492A (en) | 1996-11-21 |
Family
ID=66522980
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950009001A KR960038492A (en) | 1995-04-17 | 1995-04-17 | Semiconductor exposure apparatus and exposure method using the same |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR960038492A (en) |
-
1995
- 1995-04-17 KR KR1019950009001A patent/KR960038492A/en not_active Application Discontinuation
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ATE112398T1 (en) | LIQUID CRYSTAL PROJECTOR AND PROCESS. | |
KR950033695A (en) | Optical integrator and projection exposure apparatus using the same | |
TW343357B (en) | Projection exposure device, projection exposure method, mask pattern for amplitude aberration evaluation, amplitude aberration evaluation method | |
KR970067587A (en) | Pattern division method and exposure method | |
JPS5246813A (en) | Photographic optical system for observation for ophthalmofunduscopic c amera | |
KR970018121A (en) | Method of forming fine pattern of semiconductor device | |
KR960038492A (en) | Semiconductor exposure apparatus and exposure method using the same | |
KR930013822A (en) | Multicolor system of projection LCD | |
KR960024696A (en) | Exposure device | |
KR970028856A (en) | Projection Exposure Equipment and Exposure Method | |
JP2894922B2 (en) | Projection exposure method and apparatus | |
JPS52126241A (en) | Slit illumination device | |
KR100825000B1 (en) | Exposure system capable of improving image contrast | |
KR100356483B1 (en) | Stepper for manufacturing a semiconductor device | |
KR950025854A (en) | Manufacturing method of fine pattern of semiconductor device | |
KR100722985B1 (en) | Multi-mask exposure system | |
KR930018323A (en) | Projection exposure apparatus and pattern formation method using the same | |
JPS5738462A (en) | Copying method of variable magnification and reciprocating exposure | |
KR950021037A (en) | Semiconductor exposure equipment | |
KR960019480A (en) | Wafer Pattern Forming Method | |
KR970054568A (en) | Deformed lighting device and lighting method | |
KR19980025763A (en) | Exposure method of semiconductor device | |
EP0398518A3 (en) | Slide projector | |
KR970022559A (en) | Projection exposure apparatus | |
KR970022529A (en) | Transmittance control mask |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E902 | Notification of reason for refusal | ||
WITB | Written withdrawal of application |