KR960032726U - 반도체 장비용 진공시스템 - Google Patents

반도체 장비용 진공시스템

Info

Publication number
KR960032726U
KR960032726U KR2019950005160U KR19950005160U KR960032726U KR 960032726 U KR960032726 U KR 960032726U KR 2019950005160 U KR2019950005160 U KR 2019950005160U KR 19950005160 U KR19950005160 U KR 19950005160U KR 960032726 U KR960032726 U KR 960032726U
Authority
KR
South Korea
Prior art keywords
vacuum system
semiconductor equipment
semiconductor
equipment
vacuum
Prior art date
Application number
KR2019950005160U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to KR2019950005160U priority Critical patent/KR960032726U/ko
Publication of KR960032726U publication Critical patent/KR960032726U/ko

Links

KR2019950005160U 1995-03-22 1995-03-22 반도체 장비용 진공시스템 KR960032726U (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950005160U KR960032726U (ko) 1995-03-22 1995-03-22 반도체 장비용 진공시스템

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950005160U KR960032726U (ko) 1995-03-22 1995-03-22 반도체 장비용 진공시스템

Publications (1)

Publication Number Publication Date
KR960032726U true KR960032726U (ko) 1996-10-24

Family

ID=60864765

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950005160U KR960032726U (ko) 1995-03-22 1995-03-22 반도체 장비용 진공시스템

Country Status (1)

Country Link
KR (1) KR960032726U (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100227829B1 (ko) * 1996-11-11 1999-11-01 윤종용 반도체설비의 진공시스템 검사장치 및 이 검사장치가 설치된 진공시스템과 그에 따른 진공도 검사방법

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100227829B1 (ko) * 1996-11-11 1999-11-01 윤종용 반도체설비의 진공시스템 검사장치 및 이 검사장치가 설치된 진공시스템과 그에 따른 진공도 검사방법

Similar Documents

Publication Publication Date Title
NO971007L (no) Vakuumsystem
DE69429748D1 (de) Halbleiterinspektionssystem
DE69432737D1 (de) Halbleiterinspektionssystem
KR960032726U (ko) 반도체 장비용 진공시스템
DE69501569D1 (de) Hochvakuumanlage
EP0818055A4 (en) SELF-ALIGNING TECHNOLOGY FOR SEMICONDUCTOR ARRANGEMENTS
KR970045362U (ko) 반도체 노광장치
KR960035318U (ko) 진공단열체의 진공도검사장치
KR970046624U (ko) 반도체 장치의 진공라인 누설 체크 시스템
KR960032728U (ko) 웨이퍼 증착장치
KR970008242U (ko) 진공설비용 진공트랩
KR970025797U (ko) 진공 시스템을 구비한 반도체 소자 제조 장치
KR970025784U (ko) 반도체 상압증착장치
KR970046673U (ko) 웨이퍼의 쿨링 시스템
KR970046649U (ko) 진공처리장치
KR970003194U (ko) 웨이퍼 식각장비용 배플
KR970046742U (ko) 반도체 식각장치
KR970046659U (ko) 반도체 식각장치
KR970050336U (ko) 반도체기판 흡착용 진공시스템
KR970046605U (ko) 웨이퍼 편평도를 위한 진공장치
KR960025291U (ko) 진공 시스템
ITPD950090V0 (it) Attrezzatura particolarmente per macchine aspirapolvere
DE19680091T1 (de) Mehrfach-Halbleitertestsystem
KR970015298U (ko) 식각장비에 사용되는 스테이지
KR970050344U (ko) 진공 시스템

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application