KR960026507A - Formation method of overlapping error measurement mark - Google Patents

Formation method of overlapping error measurement mark Download PDF

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Publication number
KR960026507A
KR960026507A KR1019940032629A KR19940032629A KR960026507A KR 960026507 A KR960026507 A KR 960026507A KR 1019940032629 A KR1019940032629 A KR 1019940032629A KR 19940032629 A KR19940032629 A KR 19940032629A KR 960026507 A KR960026507 A KR 960026507A
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KR
South Korea
Prior art keywords
mark
overlapping
layer
directions
symmetrically
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KR1019940032629A
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Korean (ko)
Inventor
김근영
Original Assignee
김주용
현대전자산업 주식회사
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Priority to KR1019940032629A priority Critical patent/KR960026507A/en
Publication of KR960026507A publication Critical patent/KR960026507A/en

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Abstract

본 발명은 중첩오차 측정마크 형성방법에 관한 것으로, 기준마크가 X, Y방향으로 대칭되게 네구석에 형성되거나 네구석으로부터 안쪽으로 다수개 X, Y방향으로 대칭되게 형성된 기준층과, 기준층에 형성된 기준마크의 위치에 중첩마크가 형성된 하나 또는 다수의 중첩층을 중첩시켜 배율오차를 측정함으로써 반도체소자의 신뢰성을 향상시킬 수 있는 기술이다.The present invention relates to a method for forming an overlapping error measurement mark, wherein a reference mark is formed in four corners symmetrically in the X and Y directions, or a reference layer formed symmetrically in a plurality of X and Y directions inwardly from the four corners, and a reference formed in the reference layer. It is a technique that can improve the reliability of a semiconductor device by measuring magnification errors by superimposing one or a plurality of overlapping layers in which overlap marks are formed at positions of marks.

Description

중첩오차 측정마크 형성방법Formation method of overlapping error measurement mark

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1D도는 본 발명의 제1실시예에 따른 중첩오차 측정마크를 도시한 개략도.1D is a schematic diagram showing overlapping error measurement marks according to a first embodiment of the present invention.

Claims (7)

기준마크가 X, Y방향으로 대칭되게 형성된 기준층과 중첩마크가 X, Y방향으로 대칭되게 형성된 중첩층을 중첩시켜 배율오차를 측정하는 중첩오차 측정마크 형성방법.A method of forming an overlapping error measurement mark for measuring a magnification error by overlapping a reference layer in which reference marks are symmetrically formed in X and Y directions and an overlapping layer in which overlapping marks are symmetrically formed in X and Y directions. 제1항에 있어서, 상기 기준마크와 중첩마크는 각각 기준층과 중첩층의 네구석에 형성된 것을 특징으로 하는 중첩오차 측정마크 형성방법.The method of claim 1, wherein the reference mark and the overlap mark are formed at four corners of the reference layer and the overlap layer, respectively. 바깥쪽으로부터 안쪽으로 X, Y방향으로 대칭되게 형성된 제1기준마크, 제2기준마크 및 제3기준마크가 형성된 기준층과, 제1중첩마크가 형성된 제1중첩층과, 제2중첩마크가 형성된 제2중첩층 및 제3중첩마크가 형성된 제3중첩층을 중첩시켜 배율오차를 측정하는 중첩오차 측정마크 형성방법.A reference layer on which the first reference mark, the second reference mark, and the third reference mark are formed symmetrically in the X and Y directions from the outside to the inside, the first overlapping layer on which the first overlapping mark is formed, and the second overlapping mark are formed A method for forming an overlapping error measurement mark for measuring a magnification error by overlapping a third overlapping layer having a second overlapping layer and a third overlapping mark formed thereon. 제3항에 있어서, 상기 제1중첩마크는 상기 제1기준마크와 정렬하도록 X, Y방향으로 대칭되게 형성된 것을 특징으로 중첩정확도 측정마크 형성방법.The method of claim 3, wherein the first overlap mark is formed symmetrically in the X and Y directions to align with the first reference mark. 제3항에 있어서, 상기 제2중첩마크는 상기 제2기준마크와 정렬하도록 X, Y 방향으로 대칭되게 형성된 것을 특징으로 하는 중첩오차 측정마크 형성방법.The method of claim 3, wherein the second overlap mark is formed symmetrically in the X and Y directions to align with the second reference mark. 제3항에 있어서, 상기 제3중첩마크는 상기 제3기준마크와 정렬하도록 X, Y 방향으로 대칭되게 형성된 것을 특징으로 하는 중첩오차 측정마크 형성방법.4. The method of claim 3, wherein the third overlap mark is formed symmetrically in the X and Y directions to align with the third reference mark. 제3항에 있어서, 상기 기준마크는 중첩층의 수만큼 기준층에 형성되는 것을 특징으로 하는 중첩오차 측정마크 형성방법.The method of claim 3, wherein the reference mark is formed in the reference layer by the number of overlapping layers. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019940032629A 1994-12-02 1994-12-02 Formation method of overlapping error measurement mark KR960026507A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019940032629A KR960026507A (en) 1994-12-02 1994-12-02 Formation method of overlapping error measurement mark

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019940032629A KR960026507A (en) 1994-12-02 1994-12-02 Formation method of overlapping error measurement mark

Publications (1)

Publication Number Publication Date
KR960026507A true KR960026507A (en) 1996-07-22

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KR1019940032629A KR960026507A (en) 1994-12-02 1994-12-02 Formation method of overlapping error measurement mark

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KR (1) KR960026507A (en)

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