KR950025862A - Exposure mask formation method - Google Patents
Exposure mask formation method Download PDFInfo
- Publication number
- KR950025862A KR950025862A KR1019940003450A KR19940003450A KR950025862A KR 950025862 A KR950025862 A KR 950025862A KR 1019940003450 A KR1019940003450 A KR 1019940003450A KR 19940003450 A KR19940003450 A KR 19940003450A KR 950025862 A KR950025862 A KR 950025862A
- Authority
- KR
- South Korea
- Prior art keywords
- exposure mask
- measurement mark
- mask
- forming
- mask pattern
- Prior art date
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
본 발명은 노광마스크 형성방법에 관한 것으로, 노광마스크의 중앙에 마스크 패턴을 형성한 다음, 중첩정확도와 CD를 측정할 수 있도록 형성된 측정마크를 상기 마스크 패턴 밖의 마스크 패턴 대각선 상에 정사각형 형태로 형성함으로써, 중첩정확도 및 CD를 정확히 측정하여 노광마스크 제작 오차를 줄임으로써 반도체소자의 신뢰도 및 수율을 향상시키는 기술이다.The present invention relates to a method for forming an exposure mask, by forming a mask pattern in the center of the exposure mask, and then forming a measurement mark formed to measure overlapping accuracy and CD in a square shape on a mask pattern diagonal outside the mask pattern. This technology improves the reliability and yield of semiconductor devices by accurately measuring overlapping accuracy and CD and reducing the exposure mask fabrication error.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제2A도 및 제2B도는 본 발명의 실시예에 의한 측정마크 및 노광마스크를 도시한 평면도.2A and 2B are plan views showing measurement marks and exposure masks according to embodiments of the present invention.
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940003450A KR950025862A (en) | 1994-02-25 | 1994-02-25 | Exposure mask formation method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940003450A KR950025862A (en) | 1994-02-25 | 1994-02-25 | Exposure mask formation method |
Publications (1)
Publication Number | Publication Date |
---|---|
KR950025862A true KR950025862A (en) | 1995-09-18 |
Family
ID=66689575
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940003450A KR950025862A (en) | 1994-02-25 | 1994-02-25 | Exposure mask formation method |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR950025862A (en) |
-
1994
- 1994-02-25 KR KR1019940003450A patent/KR950025862A/en not_active Application Discontinuation
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