KR960025387U - Particle removal device of semiconductor manufacturing equipment - Google Patents
Particle removal device of semiconductor manufacturing equipmentInfo
- Publication number
- KR960025387U KR960025387U KR2019940035246U KR19940035246U KR960025387U KR 960025387 U KR960025387 U KR 960025387U KR 2019940035246 U KR2019940035246 U KR 2019940035246U KR 19940035246 U KR19940035246 U KR 19940035246U KR 960025387 U KR960025387 U KR 960025387U
- Authority
- KR
- South Korea
- Prior art keywords
- removal device
- semiconductor manufacturing
- manufacturing equipment
- particle removal
- particle
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019940035246U KR0133388Y1 (en) | 1994-12-23 | 1994-12-23 | Particle eliminating apparatus for fabricating semiconductor equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019940035246U KR0133388Y1 (en) | 1994-12-23 | 1994-12-23 | Particle eliminating apparatus for fabricating semiconductor equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960025387U true KR960025387U (en) | 1996-07-22 |
KR0133388Y1 KR0133388Y1 (en) | 1999-03-20 |
Family
ID=19402360
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019940035246U KR0133388Y1 (en) | 1994-12-23 | 1994-12-23 | Particle eliminating apparatus for fabricating semiconductor equipment |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0133388Y1 (en) |
-
1994
- 1994-12-23 KR KR2019940035246U patent/KR0133388Y1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR0133388Y1 (en) | 1999-03-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application | ||
J201 | Request for trial against refusal decision |
Free format text: TRIAL AGAINST DECISION OF REJECTION FOR APPEAL AGAINST DECISION TO DECLINE REFUSAL |
|
B701 | Decision to grant | ||
REGI | Registration of establishment | ||
LAPS | Lapse due to unpaid annual fee |