KR960019557A - Substrate Cleaning Method Using Megasonic - Google Patents

Substrate Cleaning Method Using Megasonic Download PDF

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Publication number
KR960019557A
KR960019557A KR1019940032225A KR19940032225A KR960019557A KR 960019557 A KR960019557 A KR 960019557A KR 1019940032225 A KR1019940032225 A KR 1019940032225A KR 19940032225 A KR19940032225 A KR 19940032225A KR 960019557 A KR960019557 A KR 960019557A
Authority
KR
South Korea
Prior art keywords
substrate
megasonic
cleaning method
substrate cleaning
cleaning
Prior art date
Application number
KR1019940032225A
Other languages
Korean (ko)
Other versions
KR0146272B1 (en
Inventor
유성재
Original Assignee
엄길용
오리온전기 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엄길용, 오리온전기 주식회사 filed Critical 엄길용
Priority to KR1019940032225A priority Critical patent/KR0146272B1/en
Publication of KR960019557A publication Critical patent/KR960019557A/en
Application granted granted Critical
Publication of KR0146272B1 publication Critical patent/KR0146272B1/en

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/02—Details of machines or methods for cleaning by the force of jets or sprays
    • B08B2203/0288—Ultra or megasonic jets

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Liquid Crystal (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)

Abstract

본 발명은 메가소닉 장치를 이용한 기판세정방법에 관한것으로 1~1.5㎒의 진동을 갖는물을 유리기판(1)에 분사하여 기판에 잔존하는 먼지입자를 떨어뜨리는 기판 세정방법이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for cleaning a substrate using a megasonic device, wherein a substrate having a vibration of 1 to 1.5 MHz is sprayed onto the glass substrate 1 to drop dust particles remaining on the substrate.

본 발명의 종래의 브러쉬를 이용한 기판세정법이나 초음파를 이용한 방법보다 기판세정의 신뢰성이 뛰어난 액정디스플레이 제조공정의 수율을 보장할 수 있어 생산성을 증대시킬 수 있다.It is possible to ensure the yield of the liquid crystal display manufacturing process that is superior in the reliability of substrate cleaning than the substrate cleaning method using the conventional brush or ultrasonic method of the present invention can increase the productivity.

Description

메가소닉을 이용한 기판 세정방법Substrate Cleaning Method Using Megasonic

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제3도는 본 발명 따른 메가소닉 장치를 이용한 기판 세정방법을 나타낸 개략도.3 is a schematic view showing a substrate cleaning method using a megasonic device according to the present invention.

Claims (1)

다수개의 메가소닉장치(20)를 유리기판(1)이 이송되는 이송벨트의 상측에 교호로 배치하고 상기 유리기판(10)이 이송벨트를 타고 일측으로 이동할 때 메가소닉 장치(20)로부터 극초음파의 진동을 갖는 물을 상기 유리기판(1)에 분사하는 것을 특징으로 하는 메가소닉장치를 이용한 기판세정방법.A plurality of megasonic apparatuses 20 are alternately arranged on the upper side of the conveying belt to which the glass substrate 1 is conveyed, and the ultrasonic waves from the megasonic apparatus 20 when the glass substrate 10 moves to one side by the conveying belt. Substrate cleaning method using a megasonic device, characterized in that for spraying water having a vibration of the glass substrate (1). ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019940032225A 1994-11-30 1994-11-30 Method for cleaning board using megasonic KR0146272B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019940032225A KR0146272B1 (en) 1994-11-30 1994-11-30 Method for cleaning board using megasonic

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019940032225A KR0146272B1 (en) 1994-11-30 1994-11-30 Method for cleaning board using megasonic

Publications (2)

Publication Number Publication Date
KR960019557A true KR960019557A (en) 1996-06-17
KR0146272B1 KR0146272B1 (en) 1998-11-02

Family

ID=19399862

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940032225A KR0146272B1 (en) 1994-11-30 1994-11-30 Method for cleaning board using megasonic

Country Status (1)

Country Link
KR (1) KR0146272B1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW553780B (en) * 1999-12-17 2003-09-21 Sharp Kk Ultrasonic processing device and electronic parts fabrication method using the same
JP3463028B2 (en) * 2000-08-25 2003-11-05 シャープ株式会社 Ultrasonic cleaning device and cleaning method
KR101388505B1 (en) * 2007-06-01 2014-04-23 주식회사 케이씨텍 Cleaning apparatus and method for large area substrate

Also Published As

Publication number Publication date
KR0146272B1 (en) 1998-11-02

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GRNT Written decision to grant
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