KR960019552A - Substrate Cleaning Equipment - Google Patents

Substrate Cleaning Equipment Download PDF

Info

Publication number
KR960019552A
KR960019552A KR1019940028847A KR19940028847A KR960019552A KR 960019552 A KR960019552 A KR 960019552A KR 1019940028847 A KR1019940028847 A KR 1019940028847A KR 19940028847 A KR19940028847 A KR 19940028847A KR 960019552 A KR960019552 A KR 960019552A
Authority
KR
South Korea
Prior art keywords
nozzle
brush
substrate
slit nozzle
cleaning
Prior art date
Application number
KR1019940028847A
Other languages
Korean (ko)
Inventor
최진호
Original Assignee
이헌조
엘지전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이헌조, 엘지전자 주식회사 filed Critical 이헌조
Priority to KR1019940028847A priority Critical patent/KR960019552A/en
Publication of KR960019552A publication Critical patent/KR960019552A/en

Links

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)

Abstract

본 발명은 세정중에 오염된 브러쉬를 초음파로 세정함으로써 브러쉬에 부착된 오염물을 제거할 수 있도록 한 기판 세정장치에 관한 것으로서, 반송롤러에 의해 기판이 이송되고 이송된 기판의 상측에서 브러쉬가 회전되어 기판을 세정하게 된다. 상기 브러쉬는 기판 세정중에 오염되므로 급수관을 통하여 슬리트노즐에 세정액을 공급하면 초음파 진동자에 의해 초음파 진동이 실린 세정액이 슬리트노즐을 통해 브러쉬 회전의 반대방향으로 분사됨으로써 기판 세정중에 오염된 브러쉬를 세정하게 되므로 기판의 재오염을 방지하고 브러쉬의 세정을 향상시킬 수 있는 잇점이 있다.The present invention relates to a substrate cleaning apparatus capable of removing contaminants attached to the brush by ultrasonically cleaning the contaminated brush during cleaning. The substrate is transported by a conveying roller, and the brush is rotated on the upper side of the transported substrate. Will be cleaned. Since the brush is contaminated during substrate cleaning, when the cleaning liquid is supplied to the slit nozzle through the water supply pipe, the cleaning liquid loaded with ultrasonic vibration by the ultrasonic vibrator is sprayed in the opposite direction of the brush rotation through the slitting nozzle to clean the contaminated brush during substrate cleaning. As a result, it is possible to prevent recontamination of the substrate and to improve the cleaning of the brush.

Description

기판 세정장치Substrate Cleaning Equipment

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제3도는 본 발명에 의한 기판 세정장치가 간략히 표현된 사시도,3 is a perspective view briefly showing a substrate cleaning apparatus according to the present invention;

제4도는 제3도 B-B선의 단면도.4 is a cross-sectional view taken along the line B-B of FIG.

Claims (4)

기판을 이송시키는 반송롤러와, 기판의 상측면과 접촉하여 회전하는 브러쉬와, 상기 브러쉬의 상측에 위치되어 세정중에 오염된 브러쉬를 세정하는 슬리트노즐과, 상기 슬리트노즐의 상측에 다수개 연결되어 슬리트노즐에 세정액을 공급하는 급수관과, 상기 슬리트노즐 상단부에 위치되어 슬리트노즐에 공급되는 세정액에 초음파 진동을 걸어주는 초음파진동자와, 상기 슬리트노즐을 지지 고정하는 슬리트노즐 지지축으로 구성된 것을 특징으로 하는 기판 세정장치.A conveying roller for conveying the substrate, a brush rotating in contact with the upper surface of the substrate, a slit nozzle positioned above the brush to clean the contaminated brush during cleaning, and a plurality of connected to the upper side of the slit nozzle A water supply pipe for supplying a cleaning liquid to the slit nozzle, an ultrasonic vibrator positioned at an upper end of the slit nozzle and applying ultrasonic vibration to the cleaning liquid supplied to the slit nozzle, and a slitting nozzle support shaft for supporting and fixing the slit nozzle. Substrate cleaning apparatus, characterized in that consisting of. 기판을 이송시키는 반송롤러와, 기판의 상측면과 접촉하여 회전하는 브러쉬와, 상기 브러쉬의 상측에 위치되어 세정중에 오염된 브러쉬를 세정하는 슬리트노즐과, 상기 슬리트노즐의 상측에 다수개 연결되어 슬리트노즐에 세정액을 공급하는 급수관과, 상기 슬리트노즐 상단부에 위치되어 슬리트노즐에 공급되는 세정액에 초음파 진동을 걸어주는 초음파진동자와, 상기 슬리트노즐을 지지 고정하는 슬리트노즐 지지축과, 상기 슬리트노즐의 하측에 위치되어 상기 슬리트노즐을 전후 이동가능토록 한 안내판으로 구성된 것을 특징으로 하는 기판 세정장치.A conveying roller for conveying the substrate, a brush rotating in contact with the upper surface of the substrate, a slit nozzle positioned above the brush to clean the contaminated brush during cleaning, and a plurality of connected to the upper side of the slit nozzle A water supply pipe for supplying a cleaning liquid to the slit nozzle, an ultrasonic vibrator positioned at an upper end of the slit nozzle and applying ultrasonic vibration to the cleaning liquid supplied to the slit nozzle, and a slitting nozzle support shaft for supporting and fixing the slit nozzle. And a guide plate positioned below the slit nozzle to move the slit nozzle back and forth. 제2항에 있어서, 상기 안내판은 양단부가 굴절형성되고 그 굴절부에 장공이 형성되어 상기 슬리트노즐이 장공을 따라 이동하고 볼트에 의해 안내판과 결합하는 것을 특징으로 하는 기판 세정장치.The substrate cleaning apparatus according to claim 2, wherein the guide plate is bent at both ends thereof, and a long hole is formed at the refraction thereof, so that the slits nozzle moves along the long hole and is coupled to the guide plate by bolts. 기판을 이송시키는 반송롤러와, 기판의 상측면과 접촉하며 회전하는 브러쉬와, 상기 브러쉬의 상측에 위치되어 세정중에 오염된 브러쉬를 세정하는 다수개의 노즐과, 상기 노즐의 상측에 연결되어 노즐에 세정액을 공급하는 급수관과, 상기 노즐 상단부에 위치되어 노즐에 공급되는 세정액에 초음파 진동을 걸어주는 초음파진동자와, 상기 노즐을 지지 고정하는 노즐 지지축으로 구성된 것을 특징으로 하는 기판 세정장치.A conveying roller for transporting the substrate, a brush rotating in contact with the upper surface of the substrate, a plurality of nozzles located above the brush to clean the contaminated brush during cleaning, and a cleaning liquid connected to the nozzle above the nozzle And a water supply pipe for supplying an ultrasonic wave, an ultrasonic vibrator positioned at the upper end of the nozzle to apply ultrasonic vibration to the cleaning liquid supplied to the nozzle, and a nozzle support shaft for supporting and fixing the nozzle. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019940028847A 1994-11-04 1994-11-04 Substrate Cleaning Equipment KR960019552A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019940028847A KR960019552A (en) 1994-11-04 1994-11-04 Substrate Cleaning Equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019940028847A KR960019552A (en) 1994-11-04 1994-11-04 Substrate Cleaning Equipment

Publications (1)

Publication Number Publication Date
KR960019552A true KR960019552A (en) 1996-06-17

Family

ID=66687791

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940028847A KR960019552A (en) 1994-11-04 1994-11-04 Substrate Cleaning Equipment

Country Status (1)

Country Link
KR (1) KR960019552A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010037210A (en) * 1999-10-14 2001-05-07 구본준, 론 위라하디락사 Apparatus and Method of Cleaning Substrate
KR100458211B1 (en) * 2000-03-08 2004-11-26 샤프 가부시키가이샤 Cleaning apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010037210A (en) * 1999-10-14 2001-05-07 구본준, 론 위라하디락사 Apparatus and Method of Cleaning Substrate
KR100458211B1 (en) * 2000-03-08 2004-11-26 샤프 가부시키가이샤 Cleaning apparatus

Similar Documents

Publication Publication Date Title
KR970063586A (en) Semiconductor wafer cleaning apparatus
JP5377037B2 (en) High-pressure liquid jet cleaning equipment for thin-film solar panels
KR100299333B1 (en) Board Cleaning Device
KR930001331A (en) Attachment plate cleaning device
KR970075041A (en) Cleaning treatment facility
RU2097202C1 (en) Inker washing apparatus for printing machine
KR940015605A (en) Rubbing method and apparatus of liquid crystal display device
JPH05277456A (en) Liquid treatment apparatus
KR960019552A (en) Substrate Cleaning Equipment
JPH0795540B2 (en) Method and apparatus for cleaning both sides of substrate using ultrasonic cleaning spray nozzle
JPH065577A (en) Substrate cleaning device
KR980001775A (en) Method and apparatus for cleaning and peeling off the wiper
US4408364A (en) Apparatus for washing an aloe vera leaf
KR100685919B1 (en) Cleaning Device
JP2002159922A (en) Ultrasonic cleaning device
KR980005282A (en) Belt cleaning device and its cleaning method
KR0118226Y1 (en) Glass cleaning apparatus for lcd manufacturing process
JP2007020489A (en) Washing apparatus of roll plate material for cultivating enoki mushroom and method for washing the same
KR0130743Y1 (en) Cleaning apparatus of a wafer
FI81617C (en) ANORDING FROM THE MATERIAL.
ES2146463T3 (en) PROCEDURE AND DEVICE TO KEEP THE NOZZLE HOLE PARTS CLEAN ON THE NOZZLES OF A SPRAY HUMIDIFYING EQUIPMENT OF A ROTARY PRINTING MACHINE.
US3614941A (en) Glue pot
JP2004273623A (en) Apparatus and method for cleaning brush
JPH05317783A (en) Cleaning device
JP2000262955A (en) Cleaning device for coating rod

Legal Events

Date Code Title Description
WITN Withdrawal due to no request for examination