KR960018523A - 드럼의 다이아몬드상 카본 코팅두께 측정방법 - Google Patents
드럼의 다이아몬드상 카본 코팅두께 측정방법 Download PDFInfo
- Publication number
- KR960018523A KR960018523A KR1019940029981A KR19940029981A KR960018523A KR 960018523 A KR960018523 A KR 960018523A KR 1019940029981 A KR1019940029981 A KR 1019940029981A KR 19940029981 A KR19940029981 A KR 19940029981A KR 960018523 A KR960018523 A KR 960018523A
- Authority
- KR
- South Korea
- Prior art keywords
- coating thickness
- color
- drum
- measuring
- maintained
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/22—Measuring arrangements characterised by the use of optical techniques for measuring depth
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
- G01B11/0633—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection using one or more discrete wavelengths
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
본 발명은 드럼의 다이아몬드상 카본 코팅두께 측정방법을 개시한다. 개시된 방법은 보강간섭현상으로 인한 코팅두께에 따른 드럼의 색상변화를 체크하여 동일 색상이 유지되고 있는 시간과, 한 주기동안에 색상이 변화되는 횟수를 측정하는 제1단계와; 상기 제1단계에서 체크된 색상변화중 소정주기에서 특정색상이 나타난 때의 코팅두께와 다음 번 주기에서 특정색상이 나타난 때의 코팅두께를 측정하는 제2단계와; 상기 제2단계에서 각각 측정된 두께간의 차이값을 구하고, 그 차이값을 상기 제1단계에서 측정한 횟수로 나누어 동일 색상이 유지되고 있는 시간당 코팅두께를 구하는 제3단계를 포함하는 점에 특징이 있다. 따라서 코티두께를 간단하고도 정확하게 측정할 수 있게 된다.
*선택도 : 제3도
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 따른 드럼의 다이아몬드상 카본 코팅두께 측정방법을 설명하기 위하여 예시한 코팅장치의 개략 측면도.
제2도는 본 발명에 따른 드럼의 다이아몬도상 카본코팅두께 측정방법을 설명하기 위하여 예시한 참고도.
Claims (1)
- 진공챔버 내부에 고주파전류를 인가시킨 상태에서 메탄가스로 주입하여 플라즈마를 발생시켜 메탄가스로부터 탄소이온을 전리시켜 드럼의 표면에 증착시키는 드럼의 다이아몬드상 카본 코팅방법에 있어서, 보강간섭현상으로 이한 코팅두께에 따른 드럼의 색상변화를 체크하여 동일 색상이 유지되고 있는 시간과, 한 주기동안에 색상이 변화되는 횟수를 측정하는 제1단계와; 상기 제1단계에서 체크된 색상변화중 소정주기에서 특정색상이 나타난 때의 코팅두께와 다음 번 주기에서 특정색상이 나타난 때의 코팅두께를 측정하는 제2단계와; 상기 제2단계에서 각각 측정된 두께간의 차이값을 구하고, 그 차이값을 상기 제1단계에서 측정한 횟수로 나누어 동일 색상이 유지되고 있는 시간당 코팅두께를 구하는 제3단계를 포함하는 드럼의 다이아몬도상 카본 코팅두께 측정방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940029981A KR960018523A (ko) | 1994-11-16 | 1994-11-16 | 드럼의 다이아몬드상 카본 코팅두께 측정방법 |
US08/524,921 US5696583A (en) | 1994-11-16 | 1995-09-08 | Apparatus for automatically measuring the thickness of a transparent coating material using a white light source |
JP7262561A JPH08145631A (ja) | 1994-11-16 | 1995-09-14 | コーティング厚さ測定装置 |
CN95116985A CN1053274C (zh) | 1994-11-16 | 1995-09-19 | 测量涂层厚度的装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940029981A KR960018523A (ko) | 1994-11-16 | 1994-11-16 | 드럼의 다이아몬드상 카본 코팅두께 측정방법 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR960018523A true KR960018523A (ko) | 1996-06-17 |
Family
ID=19397999
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940029981A KR960018523A (ko) | 1994-11-16 | 1994-11-16 | 드럼의 다이아몬드상 카본 코팅두께 측정방법 |
Country Status (4)
Country | Link |
---|---|
US (1) | US5696583A (ko) |
JP (1) | JPH08145631A (ko) |
KR (1) | KR960018523A (ko) |
CN (1) | CN1053274C (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100867628B1 (ko) * | 2007-06-04 | 2008-11-10 | 한국표준과학연구원 | 탄소나노튜브의 밀도제어방법과 탄소나노튜브로 만들어진박막의 전기전도율제어방법 |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6271047B1 (en) * | 1998-05-21 | 2001-08-07 | Nikon Corporation | Layer-thickness detection methods and apparatus for wafers and the like, and polishing apparatus comprising same |
DE19928171B4 (de) * | 1999-06-19 | 2011-01-05 | Leybold Optics Gmbh | Verfahren zur kontinuierlichen Bestimmung der optischen Schichtdicke von Beschichtungen |
WO2001001070A1 (fr) * | 1999-06-29 | 2001-01-04 | Omron Corporation | Dispositif a source lumineuse, spectroscope comportant le dispositif a source lumineuse et capteur d'epaisseur de couche |
CA2371988A1 (en) * | 2001-02-15 | 2002-08-15 | Seiji Funakawa | Wavelength measurement apparatus |
US7663385B2 (en) | 2002-12-13 | 2010-02-16 | Nanometrics Incorporated | Apparatus and method for electrical characterization by selecting and adjusting the light for a target depth of a semiconductor |
JP2004286446A (ja) * | 2003-03-19 | 2004-10-14 | Nippon Petrochemicals Co Ltd | 光学素子の製造方法 |
JP2005157601A (ja) * | 2003-11-25 | 2005-06-16 | Canon Inc | 電磁波による積層状物体計数装置及び計数方法 |
US20060012582A1 (en) * | 2004-07-15 | 2006-01-19 | De Lega Xavier C | Transparent film measurements |
CN100516772C (zh) * | 2004-09-09 | 2009-07-22 | 鸿富锦精密工业(深圳)有限公司 | 光学信号处理装置及方法 |
DE102005008889B4 (de) * | 2005-02-26 | 2016-07-07 | Leybold Optics Gmbh | Optisches Monitoringsystem für Beschichtungsprozesse |
US7402826B2 (en) * | 2005-05-13 | 2008-07-22 | Honeywell International Inc. | System and method for non-destructively determining thickness and uniformity of anti-tamper coatings |
CN101451944B (zh) * | 2008-12-25 | 2010-09-08 | 大连理工大学 | 基于声压反射系数相位谱的涂层密度超声测量方法 |
CN102054721B (zh) * | 2009-11-05 | 2012-05-30 | 中芯国际集成电路制造(上海)有限公司 | 检测半导体晶圆表面涂层的涂布情况的方法及装置 |
FR2979014B1 (fr) * | 2011-08-10 | 2013-08-30 | Snecma | Procede de determination de l'apparition de decohesions dans une couche de revetement en ceramique transparente formee sur un substrat |
US9140542B2 (en) * | 2012-02-08 | 2015-09-22 | Honeywell Asca Inc. | Caliper coating measurement on continuous non-uniform web using THz sensor |
CN105352443B (zh) * | 2015-11-02 | 2016-09-28 | 清华大学深圳研究生院 | 一种绝缘子rtv涂层厚度的测量方法 |
CN108474739B (zh) * | 2016-01-07 | 2021-10-01 | 阿科玛股份有限公司 | 测量基材上沉积的涂层的厚度的光学方法 |
CN111024009B (zh) * | 2019-12-31 | 2022-06-07 | 北京君融创新科技有限公司 | 一种测量云母片厚度的系统及方法 |
CN111238384A (zh) * | 2020-02-27 | 2020-06-05 | 无锡市振华开祥科技有限公司 | 一种薄不锈钢零件镀层定性测厚方法 |
CN117704980B (zh) * | 2024-02-05 | 2024-04-30 | 钛玛科(北京)工业科技有限公司 | 一种可进行滤光片切换的材料涂层厚度检测系统和方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4293224A (en) * | 1978-12-04 | 1981-10-06 | International Business Machines Corporation | Optical system and technique for unambiguous film thickness monitoring |
DE3373341D1 (en) * | 1983-12-27 | 1987-10-08 | Ibm Deutschland | White-light interferometer |
US4660979A (en) * | 1984-08-17 | 1987-04-28 | At&T Technologies, Inc. | Method and apparatus for automatically measuring semiconductor etching process parameters |
JPS63122906A (ja) * | 1986-11-13 | 1988-05-26 | Toshiba Corp | 膜厚測定装置 |
-
1994
- 1994-11-16 KR KR1019940029981A patent/KR960018523A/ko not_active Application Discontinuation
-
1995
- 1995-09-08 US US08/524,921 patent/US5696583A/en not_active Expired - Fee Related
- 1995-09-14 JP JP7262561A patent/JPH08145631A/ja active Pending
- 1995-09-19 CN CN95116985A patent/CN1053274C/zh not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100867628B1 (ko) * | 2007-06-04 | 2008-11-10 | 한국표준과학연구원 | 탄소나노튜브의 밀도제어방법과 탄소나노튜브로 만들어진박막의 전기전도율제어방법 |
Also Published As
Publication number | Publication date |
---|---|
CN1128346A (zh) | 1996-08-07 |
US5696583A (en) | 1997-12-09 |
CN1053274C (zh) | 2000-06-07 |
JPH08145631A (ja) | 1996-06-07 |
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E601 | Decision to refuse application |