KR960015707A - - Google Patents
Info
- Publication number
- KR960015707A KR960015707A KR19950035952A KR19950035952A KR960015707A KR 960015707 A KR960015707 A KR 960015707A KR 19950035952 A KR19950035952 A KR 19950035952A KR 19950035952 A KR19950035952 A KR 19950035952A KR 960015707 A KR960015707 A KR 960015707A
- Authority
- KR
- South Korea
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Light Sources And Details Of Projection-Printing Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25224394A JP3613288B2 (ja) | 1994-10-18 | 1994-10-18 | 露光装置用のクリーニング装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR960015707A true KR960015707A (cg-RX-API-DMAC10.html) | 1996-05-22 |
Family
ID=17234512
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR19950035952A Ceased KR960015707A (cg-RX-API-DMAC10.html) | 1994-10-18 | 1995-10-18 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP3613288B2 (cg-RX-API-DMAC10.html) |
| KR (1) | KR960015707A (cg-RX-API-DMAC10.html) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001319872A (ja) * | 2000-03-01 | 2001-11-16 | Nikon Corp | 露光装置 |
| KR20150036786A (ko) | 2003-04-09 | 2015-04-07 | 가부시키가이샤 니콘 | 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
| SG2013077797A (en) | 2003-04-11 | 2017-02-27 | Nippon Kogaku Kk | Cleanup method for optics in immersion lithography |
| TWI612556B (zh) | 2003-05-23 | 2018-01-21 | 尼康股份有限公司 | 曝光裝置、曝光方法及元件製造方法 |
| TWI628698B (zh) | 2003-10-28 | 2018-07-01 | 尼康股份有限公司 | 照明光學裝置、曝光裝置、曝光方法以及元件製造方法 |
| TW201809801A (zh) | 2003-11-20 | 2018-03-16 | 日商尼康股份有限公司 | 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法 |
| TWI366219B (en) | 2004-02-06 | 2012-06-11 | Nikon Corp | Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method |
| WO2005122218A1 (ja) | 2004-06-09 | 2005-12-22 | Nikon Corporation | 露光装置及びデバイス製造方法 |
| US8698998B2 (en) | 2004-06-21 | 2014-04-15 | Nikon Corporation | Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device |
| JP2006147776A (ja) * | 2004-11-18 | 2006-06-08 | Nikon Corp | メンテナンス装置及びメンテナンス方法並びに露光装置 |
| KR101544336B1 (ko) | 2005-05-12 | 2015-08-12 | 가부시키가이샤 니콘 | 투영 광학계, 노광 장치 및 노광 방법 |
| JP4835976B2 (ja) * | 2006-01-31 | 2011-12-14 | 株式会社ニコン | 保持装置及び露光装置 |
| US7894037B2 (en) * | 2007-07-30 | 2011-02-22 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP5267029B2 (ja) | 2007-10-12 | 2013-08-21 | 株式会社ニコン | 照明光学装置、露光装置及びデバイスの製造方法 |
| US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
| JP5104280B2 (ja) * | 2007-12-17 | 2012-12-19 | 株式会社ニコン | クリーニング装置、クリーニング方法、露光装置、露光方法及びデバイス製造方法 |
| TWI417980B (zh) * | 2009-02-04 | 2013-12-01 | Hoya Corp | 載台清潔器、描繪裝置及基板處理裝置 |
| NL2004153A (en) | 2009-02-24 | 2010-08-25 | Asml Netherlands Bv | Lithographic apparatus, a method for removing material of one or more protrusions on a support surface, and an article support system. |
| JP6313585B2 (ja) * | 2013-12-10 | 2018-04-18 | キヤノン株式会社 | 露光装置及び物品の製造方法 |
| JP6942562B2 (ja) | 2017-08-25 | 2021-09-29 | キヤノン株式会社 | リソグラフィ装置、および物品の製造方法 |
-
1994
- 1994-10-18 JP JP25224394A patent/JP3613288B2/ja not_active Expired - Lifetime
-
1995
- 1995-10-18 KR KR19950035952A patent/KR960015707A/ko not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| JPH08115868A (ja) | 1996-05-07 |
| JP3613288B2 (ja) | 2005-01-26 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
St.27 status event code: A-0-1-A10-A12-nap-PA0109 |
|
| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| A201 | Request for examination | ||
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-3-3-R10-R18-oth-X000 |
|
| PN2301 | Change of applicant |
St.27 status event code: A-3-3-R10-R13-asn-PN2301 St.27 status event code: A-3-3-R10-R11-asn-PN2301 |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
|
| T11-X000 | Administrative time limit extension requested |
St.27 status event code: U-3-3-T10-T11-oth-X000 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| E601 | Decision to refuse application | ||
| PE0601 | Decision on rejection of patent |
St.27 status event code: N-2-6-B10-B15-exm-PE0601 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-3-3-R10-R18-oth-X000 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-3-3-R10-R18-oth-X000 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-2-2-P10-P22-nap-X000 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-3-3-R10-R18-oth-X000 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-2-2-P10-P22-nap-X000 |