KR960012294A - 노광방법 및 스테퍼 - Google Patents
노광방법 및 스테퍼Info
- Publication number
- KR960012294A KR960012294A KR1019950029744A KR19950029744A KR960012294A KR 960012294 A KR960012294 A KR 960012294A KR 1019950029744 A KR1019950029744 A KR 1019950029744A KR 19950029744 A KR19950029744 A KR 19950029744A KR 960012294 A KR960012294 A KR 960012294A
- Authority
- KR
- South Korea
- Prior art keywords
- stepper
- exposure method
- exposure
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1994-219884 | 1994-09-14 | ||
JP21988494A JP3531227B2 (ja) | 1994-09-14 | 1994-09-14 | 露光方法および露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960012294A true KR960012294A (ko) | 1996-04-20 |
KR100391345B1 KR100391345B1 (ko) | 2003-10-17 |
Family
ID=16742568
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950029744A KR100391345B1 (ko) | 1994-09-14 | 1995-09-13 | 노광방법및스테퍼 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP3531227B2 (ko) |
KR (1) | KR100391345B1 (ko) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1097083A (ja) * | 1996-09-19 | 1998-04-14 | Nikon Corp | 投影露光方法及び投影露光装置 |
US5825043A (en) * | 1996-10-07 | 1998-10-20 | Nikon Precision Inc. | Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus |
KR100535781B1 (ko) * | 1996-11-14 | 2006-02-28 | 가부시키가이샤 니콘 | 투영노광장치및투영노광방법 |
JP5197198B2 (ja) * | 2008-07-04 | 2013-05-15 | キヤノン株式会社 | 結像光学系、露光装置、及びデバイス製造方法 |
NL2005092A (en) * | 2009-07-16 | 2011-01-18 | Asml Netherlands Bv | Object alignment measurement method and apparatus. |
JP6226525B2 (ja) * | 2013-01-15 | 2017-11-08 | キヤノン株式会社 | 露光装置、露光方法、それらを用いたデバイスの製造方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01191420A (ja) * | 1988-01-27 | 1989-08-01 | Canon Inc | 半導体焼付装置 |
JPH0547625A (ja) * | 1991-08-09 | 1993-02-26 | Nikon Corp | 投影露光装置 |
JPH0627252A (ja) * | 1992-07-07 | 1994-02-04 | Tokyo Electron Yamanashi Kk | 被処理体の位置合わせ装置 |
-
1994
- 1994-09-14 JP JP21988494A patent/JP3531227B2/ja not_active Expired - Fee Related
-
1995
- 1995-09-13 KR KR1019950029744A patent/KR100391345B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JPH0883758A (ja) | 1996-03-26 |
JP3531227B2 (ja) | 2004-05-24 |
KR100391345B1 (ko) | 2003-10-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20060626 Year of fee payment: 4 |
|
LAPS | Lapse due to unpaid annual fee |