KR960012294A - 노광방법 및 스테퍼 - Google Patents

노광방법 및 스테퍼

Info

Publication number
KR960012294A
KR960012294A KR1019950029744A KR19950029744A KR960012294A KR 960012294 A KR960012294 A KR 960012294A KR 1019950029744 A KR1019950029744 A KR 1019950029744A KR 19950029744 A KR19950029744 A KR 19950029744A KR 960012294 A KR960012294 A KR 960012294A
Authority
KR
South Korea
Prior art keywords
stepper
exposure method
exposure
Prior art date
Application number
KR1019950029744A
Other languages
English (en)
Other versions
KR100391345B1 (ko
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of KR960012294A publication Critical patent/KR960012294A/ko
Application granted granted Critical
Publication of KR100391345B1 publication Critical patent/KR100391345B1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1019950029744A 1994-09-14 1995-09-13 노광방법및스테퍼 KR100391345B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1994-219884 1994-09-14
JP21988494A JP3531227B2 (ja) 1994-09-14 1994-09-14 露光方法および露光装置

Publications (2)

Publication Number Publication Date
KR960012294A true KR960012294A (ko) 1996-04-20
KR100391345B1 KR100391345B1 (ko) 2003-10-17

Family

ID=16742568

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950029744A KR100391345B1 (ko) 1994-09-14 1995-09-13 노광방법및스테퍼

Country Status (2)

Country Link
JP (1) JP3531227B2 (ko)
KR (1) KR100391345B1 (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1097083A (ja) * 1996-09-19 1998-04-14 Nikon Corp 投影露光方法及び投影露光装置
US5825043A (en) * 1996-10-07 1998-10-20 Nikon Precision Inc. Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
KR100535781B1 (ko) * 1996-11-14 2006-02-28 가부시키가이샤 니콘 투영노광장치및투영노광방법
JP5197198B2 (ja) * 2008-07-04 2013-05-15 キヤノン株式会社 結像光学系、露光装置、及びデバイス製造方法
NL2005092A (en) * 2009-07-16 2011-01-18 Asml Netherlands Bv Object alignment measurement method and apparatus.
JP6226525B2 (ja) * 2013-01-15 2017-11-08 キヤノン株式会社 露光装置、露光方法、それらを用いたデバイスの製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01191420A (ja) * 1988-01-27 1989-08-01 Canon Inc 半導体焼付装置
JPH0547625A (ja) * 1991-08-09 1993-02-26 Nikon Corp 投影露光装置
JPH0627252A (ja) * 1992-07-07 1994-02-04 Tokyo Electron Yamanashi Kk 被処理体の位置合わせ装置

Also Published As

Publication number Publication date
JP3531227B2 (ja) 2004-05-24
JPH0883758A (ja) 1996-03-26
KR100391345B1 (ko) 2003-10-17

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Legal Events

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