KR960001896A - Photocuring composition - Google Patents

Photocuring composition Download PDF

Info

Publication number
KR960001896A
KR960001896A KR1019940015561A KR19940015561A KR960001896A KR 960001896 A KR960001896 A KR 960001896A KR 1019940015561 A KR1019940015561 A KR 1019940015561A KR 19940015561 A KR19940015561 A KR 19940015561A KR 960001896 A KR960001896 A KR 960001896A
Authority
KR
South Korea
Prior art keywords
polyfunctional monomer
iii
formula
weight
photosensitive resin
Prior art date
Application number
KR1019940015561A
Other languages
Korean (ko)
Other versions
KR0126436B1 (en
Inventor
지승룡
황재영
김면수
Original Assignee
하기주
주식회사 코오롱
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 하기주, 주식회사 코오롱 filed Critical 하기주
Priority to KR1019940015561A priority Critical patent/KR0126436B1/en
Publication of KR960001896A publication Critical patent/KR960001896A/en
Application granted granted Critical
Publication of KR0126436B1 publication Critical patent/KR0126436B1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • C08F265/06—Polymerisation of acrylate or methacrylate esters on to polymers thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

결합체 고분자, 광중합 개시제, 말단 에틸렌싱 불포화기를 포함하는 다관능성 단량체로 이루어진 감광성 수지 조성물에 있어서, 상기 다관능성 단량첼는 하기 일반식(I), (II) 및 (III)으로 나타내어지는 다관능성 단량체들을 동시에 포함함을 특징으로 하는 광경화 조성물은 텐팅성이 우수하여 알칼리 현상성 드라이 필름 포토레지스트의 제작에 이용할 수 있다.In the photosensitive resin composition consisting of a binder polymer, a photopolymerization initiator, and a polyfunctional monomer containing a terminal ethylenically unsaturated group, the multifunctional monomer is a polyfunctional monomer represented by the following general formulas (I), (II) and (III). At the same time, the photocurable composition is characterized in that it is excellent in the tentability can be used for the production of alkali developable dry film photoresist.

Description

광경화 조성물Photocuring composition

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

Claims (2)

결합체 고분자, 광중합 개시제, 말단 에틸렌성 불포화기를 포함하는 다관능성 단량체로 이루어진 감광성 수지 조성물에 있어서, 상기 다관능성 단량체는 하기 일반식(I), (II) 및 (III)으로 나타내어지는 다관능성 단량체들을 동시에 포함함을 특징으로 하는 광경화 조성물.In the photosensitive resin composition composed of a binder polymer, a photopolymerization initiator, and a polyfunctional monomer including a terminal ethylenically unsaturated group, the polyfunctional monomer may be a polyfunctional monomer represented by the following general formulas (I), (II) and (III). At the same time comprising a photocurable composition. 제1항에 있어서, 감광성 수지 조성물의 전체량에 대하여 상기 식(I)의 다관능성 단량체는 6.0 내지 15.0중량%, 상기 식(II)의 다관능성 단량체는 3.0 내지 8.0중량%, 상기 식 (III)의 다관능성 조성물은 1.0 내지 5.0중량%의 양으로 첨가함을 특징으로 하는 광경화 조성물.The polyfunctional monomer of Formula (I) is 6.0 to 15.0% by weight, the polyfunctional monomer of Formula (II) is 3.0 to 8.0% by weight, and the formula (III) to the total amount of the photosensitive resin composition. The multifunctional composition of) is added in an amount of 1.0 to 5.0% by weight of the photocurable composition. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019940015561A 1994-06-30 1994-06-30 Photocuring composition KR0126436B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019940015561A KR0126436B1 (en) 1994-06-30 1994-06-30 Photocuring composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019940015561A KR0126436B1 (en) 1994-06-30 1994-06-30 Photocuring composition

Publications (2)

Publication Number Publication Date
KR960001896A true KR960001896A (en) 1996-01-26
KR0126436B1 KR0126436B1 (en) 1997-12-18

Family

ID=19386938

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940015561A KR0126436B1 (en) 1994-06-30 1994-06-30 Photocuring composition

Country Status (1)

Country Link
KR (1) KR0126436B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100591065B1 (en) * 1999-08-23 2006-06-19 주식회사 코오롱 A composition of photo-cure

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980049928A (en) * 1996-12-20 1998-09-15 구광시 Photocurable Resin Composition
KR100553245B1 (en) * 2001-07-18 2006-02-20 주식회사 코오롱 Photopolymerizable composition
KR101369268B1 (en) * 2006-04-24 2014-03-04 코오롱인더스트리 주식회사 Photosensitive resist composition with high Chemical resistance

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100591065B1 (en) * 1999-08-23 2006-06-19 주식회사 코오롱 A composition of photo-cure

Also Published As

Publication number Publication date
KR0126436B1 (en) 1997-12-18

Similar Documents

Publication Publication Date Title
GB1425274A (en) Photosensitive compositions
KR920004450A (en) Photopolymerizable composition and photopolymerizable recording material prepared using the composition
ATE7792T1 (en) NEW MIXTURES BASED ON AROMATICALIPHATIC KETONES, THEIR USE AS PHOTOINITIATORS, AND PHOTOPOLYMERIZABLE SYSTEMS CONTAINING SUCH MIXTURES.
KR950019945A (en) Radiation-sensitive resin composition
KR960011556A (en) Water soluble film forming composition
KR920018520A (en) Photosensitive composition for offset printing
JPS56110927A (en) Manufacture of silver halide photographic material
KR840004589A (en) Positive type photoresist composition
KR920016265A (en) Alkali-developable photosensitive resin composition
GB1507704A (en) Photopolymerisable compositions
KR960001896A (en) Photocuring composition
KR900002125A (en) Resist composition
KR970048906A (en) Photosensitive resin composition
KR920013028A (en) Photosensitizer composition
KR960024670A (en) Photosensitive Resin Composition
KR910006779A (en) Radiation-sensitive positive resist composition
JPS57161742A (en) Photosensitive resin composition
KR890017674A (en) Photopolymerizable Compositions Suitable for Laser Photographic Information Recording
JPS5614232A (en) Negative type resist resin
KR830002816A (en) Semi-esters and their compositions
DE69811491D1 (en) LIQUID PHOTO-SENSITIVE COMPOSITION
KR970028792A (en) Photosensitive resin composition
JPS55153936A (en) Storage-stabilized photosensitive resin composition for flexographic plate
KR920010356A (en) Photosensitive resin composition
KR960022852A (en) Photocurable composition

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20110907

Year of fee payment: 15

FPAY Annual fee payment

Payment date: 20120912

Year of fee payment: 16

LAPS Lapse due to unpaid annual fee