KR920010356A - Photosensitive resin composition - Google Patents

Photosensitive resin composition Download PDF

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Publication number
KR920010356A
KR920010356A KR1019900018549A KR900018549A KR920010356A KR 920010356 A KR920010356 A KR 920010356A KR 1019900018549 A KR1019900018549 A KR 1019900018549A KR 900018549 A KR900018549 A KR 900018549A KR 920010356 A KR920010356 A KR 920010356A
Authority
KR
South Korea
Prior art keywords
photosensitive resin
weight
resin composition
compound
average molecular
Prior art date
Application number
KR1019900018549A
Other languages
Korean (ko)
Other versions
KR930008133B1 (en
Inventor
안태완
이창황
Original Assignee
공정곤
동양나이론 주식회사
배도
동양폴리에스터 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 공정곤, 동양나이론 주식회사, 배도, 동양폴리에스터 주식회사 filed Critical 공정곤
Priority to KR1019900018549A priority Critical patent/KR930008133B1/en
Publication of KR920010356A publication Critical patent/KR920010356A/en
Application granted granted Critical
Publication of KR930008133B1 publication Critical patent/KR930008133B1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C7/00—Multicolour photographic processes or agents therefor; Regeneration of such processing agents; Photosensitive materials for multicolour processes
    • G03C7/30—Colour processes using colour-coupling substances; Materials therefor; Preparing or processing such materials
    • G03C7/32—Colour coupling substances

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Optical Filters (AREA)
  • Laminated Bodies (AREA)

Abstract

내용 없음.No content.

Description

감광성 수지 조성물Photosensitive resin composition

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

Claims (3)

보호 필름층, 광중합성층 및 지지필름층으로 구성되는 감광성 수지 적층판에 있어서, 광중합성층이(1) 20 내지 60중량%의 말단에틸렌성 불포화 화합물, (2) 30 내지 70중량%의 고분자 결합재, (3) 0.1 내지 15중량%의 광중합 개시제 및 (4) 5 내지 12중량%의 첨가제를 포함하고, 상기 (2)의 고분자 결합재가 300 내지 400의 산가 및 1,000 내지 20,000의 수평균 분자량을 가지는 화합물을 함유하는 것을 특징으로 하는 감광성 수지 조성물.In the photosensitive resin laminate composed of a protective film layer, a photopolymerizable layer and a support film layer, the photopolymerizable layer is (1) 20 to 60% by weight of a terminal ethylenically unsaturated compound, (2) 30 to 70% by weight of a polymer binder, ( 3) A compound comprising 0.1 to 15% by weight of a photopolymerization initiator and (4) 5 to 12% by weight of an additive, wherein the polymer binder of (2) has an acid value of 300 to 400 and a number average molecular weight of 1,000 to 20,000. It contains, Photosensitive resin composition characterized by the above-mentioned. 제1항에 있어서, 상기 300 내지 400의 산가 및 1,000 내지 20,000의 수평균 분자량을 가지는 화합물이 상기 고분자 결합재에 대하여 20 내지 70중량%로 포함되는 것을 특징으로 하는 감광성 수지 조성물.The photosensitive resin composition according to claim 1, wherein the compound having an acid value of 300 to 400 and a number average molecular weight of 1,000 to 20,000 is included at 20 to 70% by weight based on the polymer binder. 제2항에 있어서, 상기 300 내지 400의 산가 및 1,000 내지 20,000의 수평균 분자량을 가지는 화합물이 스티렌 말레익 안하이드라이드인 것을 특징으로 하는 감광성 수지 조성물.The photosensitive resin composition according to claim 2, wherein the compound having an acid value of 300 to 400 and a number average molecular weight of 1,000 to 20,000 is styrene maleic anhydride. ※ 참고사항 : 최초출원 내용에 의하여 공개되는 것임.※ Note: This is to be disclosed by the original application.
KR1019900018549A 1990-11-16 1990-11-16 Composition for sensitizer KR930008133B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019900018549A KR930008133B1 (en) 1990-11-16 1990-11-16 Composition for sensitizer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019900018549A KR930008133B1 (en) 1990-11-16 1990-11-16 Composition for sensitizer

Publications (2)

Publication Number Publication Date
KR920010356A true KR920010356A (en) 1992-06-26
KR930008133B1 KR930008133B1 (en) 1993-08-26

Family

ID=19306115

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900018549A KR930008133B1 (en) 1990-11-16 1990-11-16 Composition for sensitizer

Country Status (1)

Country Link
KR (1) KR930008133B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100314997B1 (en) * 1997-10-30 2002-02-19 마시모 델라 포타 Evaporable getter device with imporved deflector

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100314997B1 (en) * 1997-10-30 2002-02-19 마시모 델라 포타 Evaporable getter device with imporved deflector

Also Published As

Publication number Publication date
KR930008133B1 (en) 1993-08-26

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O035 Opposition [patent]: request for opposition

Free format text: OPPOSITION NUMBER: 001993000646; OPPOSITION DATE: 19931026

SUBM Submission of document of abandonment before or after decision of registration