KR910008492A - Photosensitive resin composition - Google Patents

Photosensitive resin composition Download PDF

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Publication number
KR910008492A
KR910008492A KR1019890015415A KR890015415A KR910008492A KR 910008492 A KR910008492 A KR 910008492A KR 1019890015415 A KR1019890015415 A KR 1019890015415A KR 890015415 A KR890015415 A KR 890015415A KR 910008492 A KR910008492 A KR 910008492A
Authority
KR
South Korea
Prior art keywords
ethylenically unsaturated
photosensitive resin
compound
unsaturated compound
resin composition
Prior art date
Application number
KR1019890015415A
Other languages
Korean (ko)
Other versions
KR910006540B1 (en
Inventor
이창황
서승원
정종구
Original Assignee
공정곤
동양나이론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 공정곤, 동양나이론 주식회사 filed Critical 공정곤
Priority to KR1019890015415A priority Critical patent/KR910006540B1/en
Publication of KR910008492A publication Critical patent/KR910008492A/en
Application granted granted Critical
Publication of KR910006540B1 publication Critical patent/KR910006540B1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Abstract

내용 없음No content

Description

감광성 수지 조성물Photosensitive resin composition

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

Claims (3)

보호필름층, 광중합성층 및 지지필름층으로 구성되는 감광성 수지 적층판에 있어서, 광중합성층이 다음의 조성을 갖는 것을 특징으로 하는 감광성 수지 조성물, 1)밀단 에틸렌성 불포화 화합물, 2)고분자 결합재, 3)광중합개시제, 및 4)화합물내에 에폭시기를 2개 이상 가진 말단 에틸렌성 불포화 화합물A photosensitive resin laminate comprising a protective film layer, a photopolymerizable layer, and a support film layer, wherein the photopolymerizable layer has the following composition, 1) a close ethylenically unsaturated compound, 2) a polymer binder, and 3) a photopolymerization. Initiator, and 4) terminal ethylenically unsaturated compound having two or more epoxy groups in the compound. 제1항에 있어서, 화합물내에 2개 이상의 에폭시기를 갖는 말단 에틸렌성 불포화 화합물이 트리에틸렌글리콜디아크릴레이트, 또는 테트라에틸렌글리콜 디아크릴레이트, 또는 폴리에틸렌글리콜 디아크릴레이트, 또는 에폭시레이티드 트리메틸롤 프로판 트리아크릴레이트인 것을 특징으로 하는 감광성 수지 조성물.The terminal ethylenically unsaturated compound having at least two epoxy groups in the compound is triethylene glycol diacrylate, or tetraethylene glycol diacrylate, or polyethylene glycol diacrylate, or epoxylated trimethylol propane tree. It is an acrylate, The photosensitive resin composition characterized by the above-mentioned. 제1항 또는 제2항에 있어서, 화합물내에 에폭시기를 2개 이상 갖는 말단 에틸렌성 불포화 화합물은 고분자 결합재에 대하여 5내지 70중량부 포함되고, 말단 에틸렌성 불포화 화합물에 대하여는 10내지 50중량부 포함되는 것을 특징으로 하는 감광성 수지 조성물.The terminal ethylenically unsaturated compound having two or more epoxy groups in the compound is included in an amount of 5 to 70 parts by weight based on the polymer binder, and 10 to 50 parts by weight based on the terminal ethylenically unsaturated compound. The photosensitive resin composition characterized by the above-mentioned. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019890015415A 1989-10-26 1989-10-26 Photosensitive resin composition KR910006540B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019890015415A KR910006540B1 (en) 1989-10-26 1989-10-26 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019890015415A KR910006540B1 (en) 1989-10-26 1989-10-26 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
KR910008492A true KR910008492A (en) 1991-05-31
KR910006540B1 KR910006540B1 (en) 1991-08-27

Family

ID=19291046

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890015415A KR910006540B1 (en) 1989-10-26 1989-10-26 Photosensitive resin composition

Country Status (1)

Country Link
KR (1) KR910006540B1 (en)

Also Published As

Publication number Publication date
KR910006540B1 (en) 1991-08-27

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