KR950034560A - Board Cleaning Device - Google Patents

Board Cleaning Device Download PDF

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Publication number
KR950034560A
KR950034560A KR1019950001437A KR19950001437A KR950034560A KR 950034560 A KR950034560 A KR 950034560A KR 1019950001437 A KR1019950001437 A KR 1019950001437A KR 19950001437 A KR19950001437 A KR 19950001437A KR 950034560 A KR950034560 A KR 950034560A
Authority
KR
South Korea
Prior art keywords
substrate
cleaning
ultrasonic
cleaning liquid
cleaning apparatus
Prior art date
Application number
KR1019950001437A
Other languages
Korean (ko)
Other versions
KR100292932B1 (en
Inventor
후도시 시마이
히로요시 사고
히데야 고바리
시게미 후지야마
Original Assignee
나까네 히사시
도쿄 오호카 고꾜 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 나까네 히사시, 도쿄 오호카 고꾜 가부시끼가이샤 filed Critical 나까네 히사시
Publication of KR950034560A publication Critical patent/KR950034560A/en
Application granted granted Critical
Publication of KR100292932B1 publication Critical patent/KR100292932B1/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Liquid Crystal (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

본 발명은 유리기판등의 표면에 부착되어 있는 미세한 먼지를 세정하는 기판 세정장치에 관한 것으로, 기판의 세정을 단시간에 효과적으로 하려는 목적을 달성하기 위해, 3개의 초음파노즐(15)은 분출하는 세정액이 기판(W)위의 1점(집속점P)에서 집속되도록 수평면(기판면)에 대하여 그 축선이 경사하도록 할 뿐만 아니라 각 초음파노즐(15)의 축은 상기 집속점(P)을 중심으로 하여 수평방향에서 90~180° 범위내에 모두 수용되도록 구성하여, 기판을 비접촉 세정하므로서 흠집없이 효율좋게 세정을 할 뿐만 아니라 세정액의 배출방향 및 회전 속도 진동수의 조정으로 먼지의 부착량이나 종류등에 관계없이 모두 적절히 세정할 수 있도록 하였다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate cleaning apparatus for cleaning fine dust adhered to a surface such as a glass substrate. In order to achieve the purpose of effectively cleaning the substrate in a short time, the three ultrasonic nozzles 15 are provided with a cleaning liquid to be ejected. Not only does the axis be inclined with respect to the horizontal plane (substrate surface) so as to focus at one point (focusing point P) on the substrate W, but the axis of each ultrasonic nozzle 15 is horizontal with respect to the focusing point P. It is configured to be accommodated within the range of 90-180 ° in the direction, and it cleans the substrate efficiently without being scratched by non-contact cleaning, and it properly cleans all irrespective of the amount or type of dust by adjusting the discharge direction and rotation speed frequency of the cleaning liquid. I could do it.

Description

기판세정장치Board Cleaning Device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 본 발명에 관한 기판세정장치의 전체 종단면도, 제2도는 본 발명의 요부 확대 평면도, 제3도는 본 발명을 구성하는 초음파 세정유닛트의 종단면도.1 is an overall longitudinal sectional view of the substrate cleaning apparatus according to the present invention, FIG. 2 is an enlarged plan view of the main portion of the present invention, and FIG. 3 is a longitudinal sectional view of the ultrasonic cleaning unit constituting the present invention.

Claims (4)

기판표면에 존재하는 먼지를 기판을 회전시키면서 배제하는 기판 세정장치에 있어서, 상기 기판 세정장치는 세정액을 기판 표면으로 향하여 분출하는 초음파 세정유닛트를 구비하고, 상기 초음파 세정유닛트는 3개 이상의 초음파 노즐을 가지고, 이들 초음파노즐의 축은 분출한 세정액이 기판 표면의 1점에서 집속하도록 배열되고, 게다가 각 초음파 노즐의 축은 상기 집속점을 중심으로 한 수평방향에서 90∼180°범위내에 모두 수용되어 있는 것을 특징으로 하는 기판 세정장치.A substrate cleaning apparatus for removing dust existing on a surface of a substrate while rotating the substrate, wherein the substrate cleaning apparatus includes an ultrasonic cleaning unit for ejecting the cleaning liquid toward the substrate surface, and the ultrasonic cleaning unit includes three or more ultrasonic nozzles. The axes of these ultrasonic nozzles are arranged such that the ejected cleaning liquid is focused at one point on the substrate surface, and the axes of each ultrasonic nozzle are all contained within a range of 90 to 180 degrees in the horizontal direction around the focusing point. A substrate cleaning device. 제1항에 있어서, 복수의 초음파 노즐은 세정액 분출량 및 초음파 발진수가 개별로 제어가능하도록 되어 있는 것을 특징으로 하는 기판 세정장치.The substrate cleaning apparatus according to claim 1, wherein the plurality of ultrasonic nozzles are configured to individually control the amount of ejection of the cleaning liquid and the ultrasonic oscillation. 제1항 또는 제2항의 어느 한 항에 있어서, 복수의 초음파 노즐은 적어도 그 선단부가 하나의 우산안에 놓여져 있는 것을 특징으로 하는 기판 세정장치.The substrate cleaning apparatus according to any one of claims 1 to 3, wherein the plurality of ultrasonic nozzles have at least their tips placed in one umbrella. 제3항에 있어서, 상기 우산의 중심부에 세정액 분출구가 개구하고 있는 것을 특징으로 하는 기판 세정장치.The substrate cleaning apparatus according to claim 3, wherein a cleaning liquid jet opening is opened in the center of the umbrella. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950001437A 1994-02-01 1995-01-27 Board Cleaning Device KR100292932B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP94-10558 1994-02-01
JP01055894A JP3361872B2 (en) 1994-02-01 1994-02-01 Substrate cleaning equipment

Publications (2)

Publication Number Publication Date
KR950034560A true KR950034560A (en) 1995-12-28
KR100292932B1 KR100292932B1 (en) 2001-06-15

Family

ID=11753588

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950001437A KR100292932B1 (en) 1994-02-01 1995-01-27 Board Cleaning Device

Country Status (2)

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JP (1) JP3361872B2 (en)
KR (1) KR100292932B1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3630524B2 (en) * 1997-05-08 2005-03-16 大日本スクリーン製造株式会社 Substrate cleaning device
KR100634832B1 (en) * 2000-02-24 2006-10-17 엘지.필립스 엘시디 주식회사 Fine Jet Apparatus
KR100416592B1 (en) * 2001-02-10 2004-02-05 삼성전자주식회사 single type wafer cleaning apparatus and wafer cleaning method using the same
CN115009667B (en) * 2022-05-27 2024-02-09 曹阳 Soil sample's strorage device in soil property detects

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR940001307A (en) * 1992-06-27 1994-01-11 김광호 Surface Cleaning Device of Semiconductor Substrate

Also Published As

Publication number Publication date
JP3361872B2 (en) 2003-01-07
JPH07214015A (en) 1995-08-15
KR100292932B1 (en) 2001-06-15

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