KR950030735A - 화학증착 장치용 히터 - Google Patents
화학증착 장치용 히터 Download PDFInfo
- Publication number
- KR950030735A KR950030735A KR1019940009004A KR19940009004A KR950030735A KR 950030735 A KR950030735 A KR 950030735A KR 1019940009004 A KR1019940009004 A KR 1019940009004A KR 19940009004 A KR19940009004 A KR 19940009004A KR 950030735 A KR950030735 A KR 950030735A
- Authority
- KR
- South Korea
- Prior art keywords
- heater
- plate
- vapor deposition
- chemical vapor
- wire
- Prior art date
Links
- 238000005229 chemical vapour deposition Methods 0.000 title claims abstract description 7
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 1
- 230000037431 insertion Effects 0.000 claims 1
- 238000003780 insertion Methods 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 239000011733 molybdenum Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 1
- 229910052721 tungsten Inorganic materials 0.000 claims 1
- 239000010937 tungsten Substances 0.000 claims 1
- 239000007789 gas Substances 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/16—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor the conductor being mounted on an insulating base
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
본 발명은 화학증착(Chemical Vapor Deposition)장치의 가판가열을 위한 히터구조에 관한 것이다. 본 발명의 화학증착 장치용 히터는 언판상의 히터 판위에 평면상으로 절곡 형성된 몰리브덴 재질의 히터선이 지지되고 히터판의 아래쪽과 측면부에는 히터선으로부터 발생된 열의 방출을 방지하기 위한 방열판이 설치된 구성으로 이루어져있다. 본 발명의 히터구조는 히터 선이 와이어 형태이므로 그 모양과 크기를 임의호 변화시킬 수 있고 대부분의 가스에 대해서도 안정적일 뿐 아니라 제작비용이 싸다는 장점이 있다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명 히터의 일실시예 구조에 대한 평면도, 제5도는 본 발명 히터가 화학증착 장치에 장착된 상태를 보인 종단면도.
Claims (4)
- 평면상으로 절곡형성된 히터 선(1)과 판상체의 히터 판(2)과 히터 선(1)이 히터 판(2)과 일정간격을 유지한 상태로 히터 판(2)위에 지지되도록 하는 히터 선 지지구(3)와 히터 판(2)의 하부 및 측면에 설치되는 하부방열판(5a) 및 측면 방열판(5b)으로 구성됨을 특징으로 하는 화학증착 장치용 히터.
- 제1항에 있어서, 히터 선(1)은 몰리브덴 또는 텅스텐으로 이루어짐을 특징으로 하는 화학증착 장치용 히터.
- 제1항에 있어서, 히터 판(2)은 중앙부에 기판지지대 회전축 삽입구멍(2a)이 형성됨을 특징으로 하는 화학증착 장치용 히터.
- 제1항에 있어서, 히터 선 지지구(3)에는 히터선 통과공(3a)과 고정공(3b)가 상, 하로 관통형성됨을 특징으로 하는 화학증착 장치용 히터.※ 참고사항 : 최초출원 내용에 의하여 공개되는 것임.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR94009004A KR970008839B1 (en) | 1994-04-27 | 1994-04-27 | Heater for chemical deposition |
US08/385,968 US5648006A (en) | 1994-04-27 | 1995-02-09 | Heater for chemical vapor deposition equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR94009004A KR970008839B1 (en) | 1994-04-27 | 1994-04-27 | Heater for chemical deposition |
Publications (2)
Publication Number | Publication Date |
---|---|
KR950030735A true KR950030735A (ko) | 1995-11-24 |
KR970008839B1 KR970008839B1 (en) | 1997-05-29 |
Family
ID=19381873
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR94009004A KR970008839B1 (en) | 1994-04-27 | 1994-04-27 | Heater for chemical deposition |
Country Status (2)
Country | Link |
---|---|
US (1) | US5648006A (ko) |
KR (1) | KR970008839B1 (ko) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6427622B2 (en) * | 1998-08-28 | 2002-08-06 | Mv Systems, Inc. | Hot wire chemical vapor deposition method and apparatus using graphite hot rods |
US6221437B1 (en) | 1999-04-12 | 2001-04-24 | Reynolds Tech Fabricators, Inc. | Heated workpiece holder for wet plating bath |
US6660095B2 (en) | 2001-01-15 | 2003-12-09 | Jusung Engineering Co., Ltd. | Single wafer LPCVD apparatus |
US20040055539A1 (en) * | 2002-09-13 | 2004-03-25 | Dielectric Systems, Inc. | Reactive-reactor for generation of gaseous intermediates |
US20050274322A1 (en) * | 2001-02-26 | 2005-12-15 | Lee Chung J | Reactor for producing reactive intermediates for low dielectric constant polymer thin films |
US20040255862A1 (en) * | 2001-02-26 | 2004-12-23 | Lee Chung J. | Reactor for producing reactive intermediates for low dielectric constant polymer thin films |
KR20030026387A (ko) * | 2001-09-12 | 2003-04-03 | 주식회사 아이앤에스 | 반도체 웨이퍼의 화학기상증착공정중에 사용되는받침히터와 그 제조방법 |
US7309395B2 (en) | 2004-03-31 | 2007-12-18 | Dielectric Systems, Inc. | System for forming composite polymer dielectric film |
US7094661B2 (en) * | 2004-03-31 | 2006-08-22 | Dielectric Systems, Inc. | Single and dual damascene techniques utilizing composite polymer dielectric film |
US6962871B2 (en) * | 2004-03-31 | 2005-11-08 | Dielectric Systems, Inc. | Composite polymer dielectric film |
US20050223984A1 (en) * | 2004-04-08 | 2005-10-13 | Hee-Gyoun Lee | Chemical vapor deposition (CVD) apparatus usable in the manufacture of superconducting conductors |
US20050223983A1 (en) | 2004-04-08 | 2005-10-13 | Venkat Selvamanickam | Chemical vapor deposition (CVD) apparatus usable in the manufacture of superconducting conductors |
US20060201426A1 (en) * | 2004-05-25 | 2006-09-14 | Lee Chung J | Reactor for Producing Reactive Intermediates for Transport Polymerization |
US20060046044A1 (en) * | 2004-08-24 | 2006-03-02 | Lee Chung J | Porous composite polymer dielectric film |
US7387811B2 (en) * | 2004-09-21 | 2008-06-17 | Superpower, Inc. | Method for manufacturing high temperature superconducting conductors using chemical vapor deposition (CVD) |
KR100688836B1 (ko) * | 2005-05-11 | 2007-03-02 | 삼성에스디아이 주식회사 | 촉매 화학기상증착장치 |
US20060274474A1 (en) * | 2005-06-01 | 2006-12-07 | Lee Chung J | Substrate Holder |
US20060275547A1 (en) * | 2005-06-01 | 2006-12-07 | Lee Chung J | Vapor Phase Deposition System and Method |
AT16524U1 (de) * | 2018-06-04 | 2019-12-15 | Epcos Ag | Heizelement |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5313957Y1 (ko) * | 1967-11-15 | 1978-04-14 | ||
US3633537A (en) * | 1970-07-06 | 1972-01-11 | Gen Motors Corp | Vapor deposition apparatus with planetary susceptor |
US4296311A (en) * | 1979-08-15 | 1981-10-20 | The Kanthal Corporation | Electric hot plate |
DE3049521A1 (de) * | 1980-12-30 | 1982-07-29 | Karl 7519 Oberderdingen Fischer | Elektrischer heizkoerper |
KR930006305B1 (ko) * | 1991-07-09 | 1993-07-12 | 한국과학기술연구원 | 텅스텐 박막 제조용 플라즈마 화학증착 온도 측정장치 |
-
1994
- 1994-04-27 KR KR94009004A patent/KR970008839B1/ko not_active IP Right Cessation
-
1995
- 1995-02-09 US US08/385,968 patent/US5648006A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US5648006A (en) | 1997-07-15 |
KR970008839B1 (en) | 1997-05-29 |
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