KR950028650U - 반도체 웨이퍼 식각장비 - Google Patents

반도체 웨이퍼 식각장비

Info

Publication number
KR950028650U
KR950028650U KR2019940004886U KR19940004886U KR950028650U KR 950028650 U KR950028650 U KR 950028650U KR 2019940004886 U KR2019940004886 U KR 2019940004886U KR 19940004886 U KR19940004886 U KR 19940004886U KR 950028650 U KR950028650 U KR 950028650U
Authority
KR
South Korea
Prior art keywords
semiconductor wafer
etching equipment
wafer etching
equipment
semiconductor
Prior art date
Application number
KR2019940004886U
Other languages
English (en)
Other versions
KR970003601Y1 (ko
Inventor
황준
박상훈
Original Assignee
현대전자산업 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업 주식회사 filed Critical 현대전자산업 주식회사
Priority to KR2019940004886U priority Critical patent/KR970003601Y1/ko
Publication of KR950028650U publication Critical patent/KR950028650U/ko
Application granted granted Critical
Publication of KR970003601Y1 publication Critical patent/KR970003601Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
KR2019940004886U 1994-03-11 1994-03-11 반도체 웨이퍼 식각장비 KR970003601Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940004886U KR970003601Y1 (ko) 1994-03-11 1994-03-11 반도체 웨이퍼 식각장비

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940004886U KR970003601Y1 (ko) 1994-03-11 1994-03-11 반도체 웨이퍼 식각장비

Publications (2)

Publication Number Publication Date
KR950028650U true KR950028650U (ko) 1995-10-20
KR970003601Y1 KR970003601Y1 (ko) 1997-04-18

Family

ID=19378773

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940004886U KR970003601Y1 (ko) 1994-03-11 1994-03-11 반도체 웨이퍼 식각장비

Country Status (1)

Country Link
KR (1) KR970003601Y1 (ko)

Also Published As

Publication number Publication date
KR970003601Y1 (ko) 1997-04-18

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Legal Events

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A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
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Payment date: 20080619

Year of fee payment: 12

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