KR950025847A - 콜리메이터 및 그 제조방법 - Google Patents

콜리메이터 및 그 제조방법 Download PDF

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Publication number
KR950025847A
KR950025847A KR1019940003231A KR19940003231A KR950025847A KR 950025847 A KR950025847 A KR 950025847A KR 1019940003231 A KR1019940003231 A KR 1019940003231A KR 19940003231 A KR19940003231 A KR 19940003231A KR 950025847 A KR950025847 A KR 950025847A
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KR
South Korea
Prior art keywords
collimator
base plate
side wall
wall surface
cells
Prior art date
Application number
KR1019940003231A
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English (en)
Other versions
KR970009828B1 (en
Inventor
이정길
박선후
최길현
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR94003231A priority Critical patent/KR970009828B1/ko
Priority to JP01097295A priority patent/JP3781127B2/ja
Priority to CN95101479A priority patent/CN1059474C/zh
Priority to US08/493,735 priority patent/US5544771A/en
Publication of KR950025847A publication Critical patent/KR950025847A/ko
Application granted granted Critical
Publication of KR970009828B1 publication Critical patent/KR970009828B1/ko

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Classifications

    • H01L21/203—
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • G21K1/025—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using multiple collimators, e.g. Bucky screens; other devices for eliminating undesired or dispersed radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3447—Collimators, shutters, apertures

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Nuclear Medicine (AREA)

Abstract

성장되는 막의 균일성(uniformity) 및 낮은 결함 밀도(low defect density)를 얻을 수 있는 스퍼터링 장치의 콜리메이터(collimator)에 관하여 개시한다. 상기 콜리메이터는 상하로 관통되게 벌집모양으로 형성된 복수개의 셀들과, 상기 각 셀의 측벽 표면에 요철(凹凸)구조의 스크래치를 구비하여 상기 측벽 표면에 형성되는 입자의 부착력을 향상시킨다. 또한 각 셀의 측별 표면에 소정 간격, 소정 깊이의 요철형태로 스크래치가 형성되어 있기 때문에, 스퍼터링시 수평 이동성분입자의 부착력을 향상시켜 공정 진행중에 파티클의 발생을 억제할 수 있어, 반도체 장치의 신뢰성 및 스퍼터링 장비의 안정적 사용을 꾀할 수 있다.

Description

콜리메이터 및 그 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제3도는 본 발명에 의한 콜리메이터를 도시한 사시도이다.
제4도는 상기 제3도에 도시한 콜리메이터의 한 셀을 확대하여 도시한 도면이다.
제5도는 상기 제3도에 도시한 콜리메이터의 한 셀의 일측면을 도시한 도면이다.

Claims (5)

  1. 육각기둥의 관통형 구조로 형성된 복수개의 셀들이 원통형 모양을 이루고, 상기 각 셀의 측벽 표면에 요철(凹凸)구조의 스크래치를 구비하여 상기 측벽 표면에 형성되는 입자의 부착력을 향상시키는 것을 특징으로 하는 콜리메이터.
  2. 제1항에 있어서, 상기 콜리메이터의 재질은 알루미늄, 티타늄, 텅스텐, 실리콘 및 스테인레스 스틸로 이루어진 군에서 선택된 어느 하나로 이루어진 것을 특징으로 하는 콜리메이터.
  3. 콜리메이터용 박판 재료를 직사각형 형태로 잘라 복수개의 기본 판재들을 형성하는 단계; 상기 기본 판재의 양쪽 표면에 소정 간격 및 소정깊이로 스크래채를 형성하는 단계; 상기 스크래치가 형성된 기본 판재를 육각 기둥의 관통형 구조로 만들기 위해 일정크기로 접는 단계; 및 상기 접혀진 기본 판재들을 서로 세워서 상기 기본판재와 상기 기본판재가 겹치는 부분을 용접하여, 육각 기둥의 관통형 구조의 셀을 복수개 형성하는 단계를 포함하는 것을 특징으로 하는 콜리메이터의 제조방법.
  4. 제3항에 있어서, 상기 기본 판재의 두께는 1mm이하인 것을 특징으로 하는 콜리메이터의 제조방법.
  5. 제1항에 기재된 콜리메이터를 이용하여 스퍼터링 하는 공정을 포함하는 반도체 장치의 제조방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR94003231A 1994-02-23 1994-02-23 Fabrication method of collimator KR970009828B1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR94003231A KR970009828B1 (en) 1994-02-23 1994-02-23 Fabrication method of collimator
JP01097295A JP3781127B2 (ja) 1994-02-23 1995-01-26 コリメータの製造方法
CN95101479A CN1059474C (zh) 1994-02-23 1995-01-28 准直器及其制造方法
US08/493,735 US5544771A (en) 1994-02-23 1995-06-22 Method for manufacturing a collimator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR94003231A KR970009828B1 (en) 1994-02-23 1994-02-23 Fabrication method of collimator

Publications (2)

Publication Number Publication Date
KR950025847A true KR950025847A (ko) 1995-09-18
KR970009828B1 KR970009828B1 (en) 1997-06-18

Family

ID=19377625

Family Applications (1)

Application Number Title Priority Date Filing Date
KR94003231A KR970009828B1 (en) 1994-02-23 1994-02-23 Fabrication method of collimator

Country Status (4)

Country Link
US (1) US5544771A (ko)
JP (1) JP3781127B2 (ko)
KR (1) KR970009828B1 (ko)
CN (1) CN1059474C (ko)

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JP2002306957A (ja) * 2001-04-11 2002-10-22 Matsushita Electric Ind Co Ltd プラズマ処理装置
US20030029715A1 (en) 2001-07-25 2003-02-13 Applied Materials, Inc. An Apparatus For Annealing Substrates In Physical Vapor Deposition Systems
JP2005504885A (ja) 2001-07-25 2005-02-17 アプライド　マテリアルズ　インコーポレイテッド 新規なスパッタ堆積方法を使用したバリア形成
US20090004850A1 (en) 2001-07-25 2009-01-01 Seshadri Ganguli Process for forming cobalt and cobalt silicide materials in tungsten contact applications
US8110489B2 (en) 2001-07-25 2012-02-07 Applied Materials, Inc. Process for forming cobalt-containing materials
SG126681A1 (en) * 2001-07-25 2006-11-29 Inst Data Storage Oblique deposition apparatus
US9051641B2 (en) 2001-07-25 2015-06-09 Applied Materials, Inc. Cobalt deposition on barrier surfaces
US8066955B2 (en) * 2003-10-17 2011-11-29 James M. Pinchot Processing apparatus fabrication
US20050084072A1 (en) * 2003-10-17 2005-04-21 Jmp Industries, Inc., An Ohio Corporation Collimator fabrication
US6994245B2 (en) * 2003-10-17 2006-02-07 James M. Pinchot Micro-reactor fabrication
JP2007273490A (ja) * 2004-03-30 2007-10-18 Renesas Technology Corp 半導体集積回路装置の製造方法
KR20060076445A (ko) 2004-12-29 2006-07-04 동부일렉트로닉스 주식회사 스퍼터 장비 및 이를 이용한 금속 실리사이드막의 형성방법
US20090188097A1 (en) * 2008-01-25 2009-07-30 Siemens Power Generation, Inc. Method of layered fabrication
DE102011083422B4 (de) * 2011-09-26 2017-08-10 Siemens Healthcare Gmbh Verfahren zur Herstellung eines Kollimators
US9543126B2 (en) * 2014-11-26 2017-01-10 Applied Materials, Inc. Collimator for use in substrate processing chambers
JP6509553B2 (ja) * 2014-12-19 2019-05-08 株式会社アルバック スパッタリング装置
US9960024B2 (en) 2015-10-27 2018-05-01 Applied Materials, Inc. Biasable flux optimizer / collimator for PVD sputter chamber
JP6088083B1 (ja) * 2016-03-14 2017-03-01 株式会社東芝 処理装置及びコリメータ
USD1026054S1 (en) * 2022-04-22 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1025935S1 (en) * 2022-11-03 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1025936S1 (en) * 2022-12-16 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1026839S1 (en) * 2022-12-16 2024-05-14 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber
USD1024149S1 (en) * 2022-12-16 2024-04-23 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber

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Also Published As

Publication number Publication date
KR970009828B1 (en) 1997-06-18
CN1114784A (zh) 1996-01-10
JPH07286271A (ja) 1995-10-31
JP3781127B2 (ja) 2006-05-31
CN1059474C (zh) 2000-12-13
US5544771A (en) 1996-08-13

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