KR950021390U - 반도체 제조장비의 감광제 코팅장치 - Google Patents

반도체 제조장비의 감광제 코팅장치

Info

Publication number
KR950021390U
KR950021390U KR2019930028630U KR930028630U KR950021390U KR 950021390 U KR950021390 U KR 950021390U KR 2019930028630 U KR2019930028630 U KR 2019930028630U KR 930028630 U KR930028630 U KR 930028630U KR 950021390 U KR950021390 U KR 950021390U
Authority
KR
South Korea
Prior art keywords
semiconductor manufacturing
coating device
manufacturing equipment
photosensitive agent
agent coating
Prior art date
Application number
KR2019930028630U
Other languages
English (en)
Other versions
KR200152643Y1 (ko
Inventor
김범수
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019930028630U priority Critical patent/KR200152643Y1/ko
Publication of KR950021390U publication Critical patent/KR950021390U/ko
Application granted granted Critical
Publication of KR200152643Y1 publication Critical patent/KR200152643Y1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR2019930028630U 1993-12-20 1993-12-20 반도체 제조장비의 감광제 코팅장치 KR200152643Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019930028630U KR200152643Y1 (ko) 1993-12-20 1993-12-20 반도체 제조장비의 감광제 코팅장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019930028630U KR200152643Y1 (ko) 1993-12-20 1993-12-20 반도체 제조장비의 감광제 코팅장치

Publications (2)

Publication Number Publication Date
KR950021390U true KR950021390U (ko) 1995-07-28
KR200152643Y1 KR200152643Y1 (ko) 1999-07-15

Family

ID=19371765

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019930028630U KR200152643Y1 (ko) 1993-12-20 1993-12-20 반도체 제조장비의 감광제 코팅장치

Country Status (1)

Country Link
KR (1) KR200152643Y1 (ko)

Also Published As

Publication number Publication date
KR200152643Y1 (ko) 1999-07-15

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