KR950021360U - 반도체 노광장비의 웨이퍼 수평도 조절장치 - Google Patents

반도체 노광장비의 웨이퍼 수평도 조절장치

Info

Publication number
KR950021360U
KR950021360U KR2019930026879U KR930026879U KR950021360U KR 950021360 U KR950021360 U KR 950021360U KR 2019930026879 U KR2019930026879 U KR 2019930026879U KR 930026879 U KR930026879 U KR 930026879U KR 950021360 U KR950021360 U KR 950021360U
Authority
KR
South Korea
Prior art keywords
leveling device
exposure equipment
semiconductor exposure
wafer leveling
wafer
Prior art date
Application number
KR2019930026879U
Other languages
English (en)
Other versions
KR970002001Y1 (ko
Inventor
권정현
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR2019930026879U priority Critical patent/KR970002001Y1/ko
Publication of KR950021360U publication Critical patent/KR950021360U/ko
Application granted granted Critical
Publication of KR970002001Y1 publication Critical patent/KR970002001Y1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR2019930026879U 1993-12-08 1993-12-08 반도체 노광장비의 웨이퍼 수평도 조절장치 KR970002001Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019930026879U KR970002001Y1 (ko) 1993-12-08 1993-12-08 반도체 노광장비의 웨이퍼 수평도 조절장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019930026879U KR970002001Y1 (ko) 1993-12-08 1993-12-08 반도체 노광장비의 웨이퍼 수평도 조절장치

Publications (2)

Publication Number Publication Date
KR950021360U true KR950021360U (ko) 1995-07-28
KR970002001Y1 KR970002001Y1 (ko) 1997-03-17

Family

ID=19370248

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019930026879U KR970002001Y1 (ko) 1993-12-08 1993-12-08 반도체 노광장비의 웨이퍼 수평도 조절장치

Country Status (1)

Country Link
KR (1) KR970002001Y1 (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8488107B2 (en) 2009-03-13 2013-07-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a level sensor having multiple projection units and detection units
US8842293B2 (en) 2009-03-13 2014-09-23 Asml Netherlands B.V. Level sensor arrangement for lithographic apparatus and device manufacturing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8488107B2 (en) 2009-03-13 2013-07-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method involving a level sensor having multiple projection units and detection units
US8842293B2 (en) 2009-03-13 2014-09-23 Asml Netherlands B.V. Level sensor arrangement for lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
KR970002001Y1 (ko) 1997-03-17

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