KR950021389U - 반도체 웨이퍼의 파티클 제거장치 - Google Patents
반도체 웨이퍼의 파티클 제거장치Info
- Publication number
- KR950021389U KR950021389U KR2019930028200U KR930028200U KR950021389U KR 950021389 U KR950021389 U KR 950021389U KR 2019930028200 U KR2019930028200 U KR 2019930028200U KR 930028200 U KR930028200 U KR 930028200U KR 950021389 U KR950021389 U KR 950021389U
- Authority
- KR
- South Korea
- Prior art keywords
- semiconductor wafer
- removal device
- particle removal
- wafer particle
- semiconductor
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019930028200U KR200158118Y1 (ko) | 1993-12-17 | 1993-12-17 | 반도체 웨이퍼의 파티클 제거장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019930028200U KR200158118Y1 (ko) | 1993-12-17 | 1993-12-17 | 반도체 웨이퍼의 파티클 제거장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR950021389U true KR950021389U (ko) | 1995-07-28 |
KR200158118Y1 KR200158118Y1 (ko) | 1999-10-15 |
Family
ID=19371407
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019930028200U KR200158118Y1 (ko) | 1993-12-17 | 1993-12-17 | 반도체 웨이퍼의 파티클 제거장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR200158118Y1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100790273B1 (ko) * | 2003-12-12 | 2007-12-31 | 동부일렉트로닉스 주식회사 | 펜슬 스펀지 클리닝 장치 및 그 방법 |
-
1993
- 1993-12-17 KR KR2019930028200U patent/KR200158118Y1/ko not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100790273B1 (ko) * | 2003-12-12 | 2007-12-31 | 동부일렉트로닉스 주식회사 | 펜슬 스펀지 클리닝 장치 및 그 방법 |
Also Published As
Publication number | Publication date |
---|---|
KR200158118Y1 (ko) | 1999-10-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
FPAY | Annual fee payment |
Payment date: 20050621 Year of fee payment: 7 |
|
LAPS | Lapse due to unpaid annual fee |