KR950018640A - 열방식 스프레더를 포함하는 다이아몬드의 화학 증착 장치 - Google Patents

열방식 스프레더를 포함하는 다이아몬드의 화학 증착 장치 Download PDF

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Publication number
KR950018640A
KR950018640A KR1019940036698A KR19940036698A KR950018640A KR 950018640 A KR950018640 A KR 950018640A KR 1019940036698 A KR1019940036698 A KR 1019940036698A KR 19940036698 A KR19940036698 A KR 19940036698A KR 950018640 A KR950018640 A KR 950018640A
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South Korea
Prior art keywords
substrate
substrate assembly
contact
thermal spreader
cooling element
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KR1019940036698A
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English (en)
Inventor
죠지 코스키 필립
오드먼드 에인셋 에릭
윈필드 우드러프 데이비드
Original Assignee
제이 엘. 채스킨
제네랄 일렉트릭 캄파니
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Publication of KR950018640A publication Critical patent/KR950018640A/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • C23C16/463—Cooling of the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/271—Diamond only using hot filaments
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4586—Elements in the interior of the support, e.g. electrodes, heating or cooling devices
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

본 발명은 구리로 만들어지고 열방식 스프레더 안에 삽입되거나 또는 그와 관련된 가열 수단을 가진 열방식 스프레더와 함께 기재 또는 기재를 보유하는 홀더가 되는 기재 조립체의 후방 접촉에 의해서 다이아몬드의 화학증착 장치에 있어 온도의 균일함과 제어를 개선한 것이다. 열방식 스프레더는 스테인레스 강으로 만들어지고, 또한 냉각재 통로를 가진 냉각 요소 열저항 유니트와 접촉한다.

Description

열방식 스프레더를 포함하는 다이아몬드의 화학 증착 장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 요소인 기재 조립체 중 하나의 구조를 통합한, 본 발명에 따른 장치의 바람직한 실시예중 하나의 단면도.
제2도는 기재 조립체의 또 다른 구조의 단면도.

Claims (11)

  1. 화학 증착법에 의한 다이아몬드제조 장치에 있어서 : 적어도 하나의 가열 필라멘트와; 용착된 다이아몬드를 수납할 수 있는 기재를 포함하며, 전방 다이아몬드 수납 측면과 배면을 가진 적어도 하나의 기재 조립체와 ; 열전도율이 적어도 약 0.5W/cm˚C인 금속으로 만들어지며, 전방측면과 배면을 가지며, 상기 전방측면은 상기 기재 조립체의 배면과 접촉하는, 열방식 스프레더와 ; 최대한 약 0.3W/cm˚C의 열전도율을 가진 고온 저항물질로 만들어지며, 전방측면과 배면을 가지며, 상기 전방측면은 상기 기재 조립체의 배면과 접촉하는 열저항 유니트; 및 상기 열저항 유니트의 배면과 접촉하며, 적어도 약 0.5-0.3W/cm˚C의 열전도율을 가진 금속으로 만들어진 냉각 요소를 포함하는 장치.
  2. 제1항에 있어서, 상기 기재 조립체는 평평한 후방 표면을 가지는 장치.
  3. 제2항에 있어서, 상기 열저항 유니트가 상기 냉각 요소와 접촉하는 패턴 영역을 가진 장치.
  4. 제3항에 있어서, 상기 접촉영역이 균일한 장치.
  5. 제3항에 있어서, 복수의 가열 필라멘트를 포함하는 장치.
  6. 제5항에 있어서, 상기 냉각요소는 그 안에 냉각재 통로를 가진 장치.
  7. 제5항에 있어서, 상기 기재 조립체는 그 자체가 기재인 평평한 플레이트로 구성된 장치.
  8. 제5항에 있어서, 상기 기재 조립체는 그 안에 장착된 적어도 하나의 기재와 함께 기재 홀더를 포함하는 장치.
  9. 제5항에 있어서, 상기 열방식 스프레더는 그 안에 또는 그것에 인접하게 있는 가열 수단을 가진 장치.
  10. 제9항에 있어서, 상기 가열 수단은 상기 열방식 스프레더내에 삽입되어 있는 장치.
  11. 제10항에 있어서, 상기 가열 수단은 복수의 카트리지 히터를 포함하는 장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940036698A 1993-12-27 1994-12-26 열방식 스프레더를 포함하는 다이아몬드의 화학 증착 장치 KR950018640A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/172,797 1993-12-27
US08/172,797 US5397396A (en) 1993-12-27 1993-12-27 Apparatus for chemical vapor deposition of diamond including thermal spreader

Publications (1)

Publication Number Publication Date
KR950018640A true KR950018640A (ko) 1995-07-22

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KR1019940036698A KR950018640A (ko) 1993-12-27 1994-12-26 열방식 스프레더를 포함하는 다이아몬드의 화학 증착 장치

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Country Link
US (1) US5397396A (ko)
EP (1) EP0664346A1 (ko)
JP (1) JPH07278813A (ko)
KR (1) KR950018640A (ko)

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Also Published As

Publication number Publication date
JPH07278813A (ja) 1995-10-24
US5397396A (en) 1995-03-14
EP0664346A1 (en) 1995-07-26

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