KR950013594A - Ultrasonic Cleaner - Google Patents

Ultrasonic Cleaner Download PDF

Info

Publication number
KR950013594A
KR950013594A KR1019940029056A KR19940029056A KR950013594A KR 950013594 A KR950013594 A KR 950013594A KR 1019940029056 A KR1019940029056 A KR 1019940029056A KR 19940029056 A KR19940029056 A KR 19940029056A KR 950013594 A KR950013594 A KR 950013594A
Authority
KR
South Korea
Prior art keywords
cleaning
ultrasonic
tank
cleaning liquid
liquid
Prior art date
Application number
KR1019940029056A
Other languages
Korean (ko)
Inventor
요시히데 시바노
Original Assignee
요시히데 시바노
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 요시히데 시바노 filed Critical 요시히데 시바노
Publication of KR950013594A publication Critical patent/KR950013594A/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/14Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0064Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes
    • B08B7/0092Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes by cooling
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/02Cleaning by methods not provided for in a single other subclass or a single group in this subclass by distortion, beating, or vibration of the surface to be cleaned
    • B08B7/026Using sound waves
    • B08B7/028Using ultrasounds

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

본 발명은 공작물 표면을 세정함과 동시에 이 공작물의 가공등에 의하여 형성된 미세한 버(burr)를 제거하는 초음파 세정장치에 관한 것으로서, 초음파 세정에 의하여 공작물의 버를 완전히 제거할 수 있고, 장시간에 걸친 초음파 세정을 하더라도 높은 버제거 효과를 지속시킬 수 있도록 하기 위하여, 세정액을 수용하는 세정조와 상기 세정조의 저부에 설치된 초음파 진동자로 이루어지며. 상기 세정액에 상기 초음파 진동자에서 초음파를 방사하여 상기 세정액에 침적된 공작물을 세정하는 초음파 세정장치에 있어서, 상기 세정액에 용존 산소량 0.01∼2ppm이 되도록 탈기되고 또한 상기 세정액의 온도가 상기 세정액의 응고점이상 30℃이하인 것을 특징으로 한다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ultrasonic cleaning apparatus which cleans the surface of a workpiece and removes fine burrs formed by processing the workpiece. The present invention relates to an ultrasonic cleaning apparatus capable of completely removing burrs of a workpiece by ultrasonic cleaning. In order to be able to maintain a high burr removing effect even if the cleaning, it consists of a cleaning tank containing a cleaning liquid and an ultrasonic vibrator installed at the bottom of the cleaning tank. An ultrasonic cleaning apparatus for cleaning a workpiece deposited in the cleaning liquid by radiating ultrasonic waves from the ultrasonic vibrator to the cleaning liquid, wherein the cleaning liquid is degassed so as to have a dissolved oxygen amount of 0.01 to 2 ppm, and the temperature of the cleaning liquid is higher than the solidification point of the cleaning liquid. It is characterized by the following.

Description

초음파 세정장치Ultrasonic Cleaner

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 본 발명의 초음파세정장치에 대한 개략적인 구성을 나타낸 모식도.1 is a schematic diagram showing a schematic configuration of the ultrasonic cleaning device of the present invention.

Claims (5)

세정액을 수용하는 세정조와, 상기 세정조의 저부에 설치된 초음각 진동자로 이루어지며, 상기 세정액에 상기 초음파 진동자에서 초음파를 방사하여 상기 세정액에 침적된 공작물을 세정하는 초음파 세정장치에 있어서, 상기 세정액이 용존 산소량 0.01∼2ppm이 되도록 탈기되고 또한 상기 세정액의 온도가 상기 세정액의 응고점이상 30℃이하인 것을 특징으로 하는 초음파 세정장치.An ultrasonic cleaning device comprising a cleaning tank for accommodating a cleaning liquid and a supersonic vibrator provided at the bottom of the cleaning tank, wherein the cleaning liquid is dissolved in the cleaning liquid by radiating ultrasonic waves from the ultrasonic vibrator to clean the workpiece deposited in the cleaning liquid. An ultrasonic cleaning apparatus characterized by degassing so that the amount of oxygen is 0.01 to 2 ppm, and the temperature of the cleaning liquid is 30 ° C. or less above the freezing point of the cleaning liquid. 제1항에 있어서 상기 세정조는 상기 세정조에 세정액을 공급하는 세정액 공급수단과 상기 세정조내에서 세정액을 도출하는 세정액 도출수단을 구비하며, 상기 세정액 공급수단에 상기 세정액을 용존 산소량 0.01∼2ppm이 되도록 탈기하는 탈기수단과 세정액을 응고점이상 30℃이하의 온도로 냉각하는 냉각수단을 설치한 것을 특징으로 하는 초음파 세정장치.The cleaning tank according to claim 1, further comprising a cleaning solution supply means for supplying a cleaning solution to the cleaning tank and a cleaning solution derivation means for deriving the cleaning solution from the cleaning tank, wherein the cleaning solution is supplied with a dissolved oxygen amount of 0.01 to 2 ppm. An ultrasonic cleaning apparatus comprising: a degassing means for degassing and cooling means for cooling the cleaning liquid to a temperature of 30 ° C or less above a solidification point. 제1항에 있어서, 상기 탈기수단은 상기 세정액이 도입되는 밀봉조와 상기 밀봉조내를 감압하는 감압수단으로 이루어지며. 상기 감압수단에 의하여 감압된 상기 밀봉조내의 공간으로 상기 세정액의 용존 기체를 방출시킴으로써 탈기하는 것을 특징으로 하는 초음파 세정장치.The degassing means comprises a sealing tank into which the cleaning liquid is introduced and decompression means for depressurizing the inside of the sealing tank. And degassing by releasing the dissolved gas of the cleaning liquid into the space in the sealing tank decompressed by the decompression means. 제1항에 있어서, 상기 세정액 도출수단에 의하여 상기 세정조내에서 도출된 세정액을 상기 세정액 공급수단으로 순환시키는 세정액 순환경로를 구비하는 것을 특징으로 하는 초음파 세정장치.The ultrasonic cleaning apparatus according to claim 1, further comprising a cleaning solution circulation path for circulating the cleaning solution drawn out of the cleaning tank by the cleaning solution derivation means to the cleaning solution supply means. 제4항에 있어서, 상기 세정조가 상기 세정액 순환경로를 구비할 때에, 상기 냉각수단이 온도검지수단을 구비하며, 상기 냉각수단은 상기 온도검지수단에 의하여 검출되는 세정액의 온도가 소정 온도를 넘었을 때에 작동되는 것을 특징으로 하는 초음파 세정장치.5. The cleaning apparatus according to claim 4, wherein when the cleaning tank includes the cleaning solution circulation path, the cooling means includes a temperature detecting means, and the cooling means has a temperature exceeding a predetermined temperature detected by the temperature detecting means. Ultrasonic cleaning device, characterized in that when the operation. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019940029056A 1993-11-08 1994-11-07 Ultrasonic Cleaner KR950013594A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP5277999A JPH07124532A (en) 1993-11-08 1993-11-08 Ultrasonic flash removing and washing apparatus
JP93-277999 1993-11-08

Publications (1)

Publication Number Publication Date
KR950013594A true KR950013594A (en) 1995-06-15

Family

ID=17591223

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940029056A KR950013594A (en) 1993-11-08 1994-11-07 Ultrasonic Cleaner

Country Status (4)

Country Link
JP (1) JPH07124532A (en)
KR (1) KR950013594A (en)
CN (1) CN1116566A (en)
MY (1) MY131769A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150068758A (en) * 2013-12-12 2015-06-22 세메스 주식회사 Unit for supplying chemical

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007098817A (en) * 2005-10-06 2007-04-19 Star Cluster:Kk Method of removing flash of simultaneous decoration molded article
CN104001908A (en) * 2014-05-23 2014-08-27 美诺精密压铸(上海)有限公司 Ultrasonic casting burr removing device
CN106583333B (en) * 2016-12-07 2019-01-08 贵州黎阳航空动力有限公司 A kind of complexity lumen class part backwashing equipment and its backwash technique
CN107716391A (en) * 2017-09-22 2018-02-23 河南师范大学 A kind of processing unit for the washing of human hair wig
CN112871861A (en) * 2020-12-10 2021-06-01 苏州格瑞泰克环保科技有限公司 Oil separating and cooling device for hydrocarbon cleaning machine

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150068758A (en) * 2013-12-12 2015-06-22 세메스 주식회사 Unit for supplying chemical

Also Published As

Publication number Publication date
JPH07124532A (en) 1995-05-16
MY131769A (en) 2007-08-30
CN1116566A (en) 1996-02-14

Similar Documents

Publication Publication Date Title
KR930023072A (en) Ultrasonic Cleaning Method
US3340199A (en) Azeotropic halogenated hydrocarbonalcohol solvent composition
KR960035859A (en) A surface treatment liquid of a semiconductor substrate, a surface treatment method using the treatment liquid, and a surface treatment apparatus
KR950005347A (en) Exhaust Treatment System in Polishing Equipment
MY144266A (en) Method of cleaning membrane modules
KR960015776A (en) Liquid supply device
JPH06254520A (en) Cleaning process by cavitation in liquefied gas
KR900701418A (en) Surface and Fluid Clean Methods
JP6261814B2 (en) Washing apparatus and washing method, and membrane separation bioreactor
KR950013594A (en) Ultrasonic Cleaner
FR2817230B1 (en) DEVICE AND METHOD FOR CLEANING PARTS OF A BOAT UNDERWATER
US5820688A (en) Method for the treatment of semiconductor material
JPH0440270A (en) Cleaning method for electronic component
JP2010046570A (en) Apparatus for manufacturing feed liquid for ultrasonic treatment apparatus, method for manufacturing feed liquid for ultrasonic treatment apparatus and ultrasonic treatment system
ES2185389T3 (en) METHOD AND APPARATUS FOR THE TREATMENT OF LIQUIDS BY ULTRASONIC VIBRATIONS.
JP6020626B2 (en) Device Ge substrate cleaning method, cleaning water supply device and cleaning device
GB982122A (en) Purification of electrolyte used in electrolytic machining
JP2001050692A (en) Cooling piping facility
JPS6012187A (en) Washing method and device
JPS61148821A (en) Processing apparatus
JPS60130832A (en) Water washing device for semiconductor wafer
JP2014225570A (en) METHOD FOR CLEANING Ge SUBSTRATE FOR DEVICE, CLEANING WATER SUPPLY DEVICE AND CLEANING DEVICE
JPH01151975A (en) Washing method
KR950021190A (en) Semiconductor device cleaning method
JPS5837116A (en) Cooling method of bright continuous annealing furnace

Legal Events

Date Code Title Description
N231 Notification of change of applicant
A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application