KR940025542U - Plasma processing equipment of semiconductor manufacturing equipment - Google Patents

Plasma processing equipment of semiconductor manufacturing equipment

Info

Publication number
KR940025542U
KR940025542U KR2019930006084U KR930006084U KR940025542U KR 940025542 U KR940025542 U KR 940025542U KR 2019930006084 U KR2019930006084 U KR 2019930006084U KR 930006084 U KR930006084 U KR 930006084U KR 940025542 U KR940025542 U KR 940025542U
Authority
KR
South Korea
Prior art keywords
equipment
plasma processing
semiconductor manufacturing
processing equipment
manufacturing equipment
Prior art date
Application number
KR2019930006084U
Other languages
Korean (ko)
Other versions
KR950009254Y1 (en
Inventor
김인기
신호철
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR2019930006084U priority Critical patent/KR950009254Y1/en
Publication of KR940025542U publication Critical patent/KR940025542U/en
Application granted granted Critical
Publication of KR950009254Y1 publication Critical patent/KR950009254Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32522—Temperature

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
KR2019930006084U 1993-04-17 1993-04-17 Plasma processing apparatus of semiconductor manufacturing apparatus KR950009254Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019930006084U KR950009254Y1 (en) 1993-04-17 1993-04-17 Plasma processing apparatus of semiconductor manufacturing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019930006084U KR950009254Y1 (en) 1993-04-17 1993-04-17 Plasma processing apparatus of semiconductor manufacturing apparatus

Publications (2)

Publication Number Publication Date
KR940025542U true KR940025542U (en) 1994-11-18
KR950009254Y1 KR950009254Y1 (en) 1995-10-23

Family

ID=19353796

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019930006084U KR950009254Y1 (en) 1993-04-17 1993-04-17 Plasma processing apparatus of semiconductor manufacturing apparatus

Country Status (1)

Country Link
KR (1) KR950009254Y1 (en)

Also Published As

Publication number Publication date
KR950009254Y1 (en) 1995-10-23

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Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20040920

Year of fee payment: 10

LAPS Lapse due to unpaid annual fee