KR940001973U - Equipment that uses RF plasma - Google Patents

Equipment that uses RF plasma

Info

Publication number
KR940001973U
KR940001973U KR2019920010408U KR920010408U KR940001973U KR 940001973 U KR940001973 U KR 940001973U KR 2019920010408 U KR2019920010408 U KR 2019920010408U KR 920010408 U KR920010408 U KR 920010408U KR 940001973 U KR940001973 U KR 940001973U
Authority
KR
South Korea
Prior art keywords
plasma
equipment
Prior art date
Application number
KR2019920010408U
Other languages
Korean (ko)
Other versions
KR950005389Y1 (en
Inventor
정석렬
이형기
민인홍
Original Assignee
현대전자산업 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업 주식회사 filed Critical 현대전자산업 주식회사
Priority to KR92010408U priority Critical patent/KR950005389Y1/en
Publication of KR940001973U publication Critical patent/KR940001973U/en
Application granted granted Critical
Publication of KR950005389Y1 publication Critical patent/KR950005389Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32889—Connection or combination with other apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
KR92010408U 1992-06-12 1992-06-12 Apparatus using rf plasma KR950005389Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR92010408U KR950005389Y1 (en) 1992-06-12 1992-06-12 Apparatus using rf plasma

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR92010408U KR950005389Y1 (en) 1992-06-12 1992-06-12 Apparatus using rf plasma

Publications (2)

Publication Number Publication Date
KR940001973U true KR940001973U (en) 1994-01-03
KR950005389Y1 KR950005389Y1 (en) 1995-07-08

Family

ID=19334739

Family Applications (1)

Application Number Title Priority Date Filing Date
KR92010408U KR950005389Y1 (en) 1992-06-12 1992-06-12 Apparatus using rf plasma

Country Status (1)

Country Link
KR (1) KR950005389Y1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR200231719Y1 (en) * 2001-01-31 2001-07-03 김현석 Fleece shorts
KR100622844B1 (en) * 2004-10-13 2006-09-19 주식회사 에이디피엔지니어링 Plasma processing apparatus

Also Published As

Publication number Publication date
KR950005389Y1 (en) 1995-07-08

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20040618

Year of fee payment: 10

LAPS Lapse due to unpaid annual fee