KR940018419A - 발수성을 향상시킨 불소 함유 고분자 성형체 및 이로 부터 제조된 세정용 지그 - Google Patents

발수성을 향상시킨 불소 함유 고분자 성형체 및 이로 부터 제조된 세정용 지그 Download PDF

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Publication number
KR940018419A
KR940018419A KR1019940000534A KR19940000534A KR940018419A KR 940018419 A KR940018419 A KR 940018419A KR 1019940000534 A KR1019940000534 A KR 1019940000534A KR 19940000534 A KR19940000534 A KR 19940000534A KR 940018419 A KR940018419 A KR 940018419A
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South Korea
Prior art keywords
polytetrafluoroethylene
fluorine
water repellency
molded article
cleaning jig
Prior art date
Application number
KR1019940000534A
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English (en)
Inventor
유키노리 사이키
미나 이치카와
마사아츠 시모무라
마사히로 오노
노부아츠 와타나베
Original Assignee
이마무라 가즈수케
오노다 세멘토 가부시키가이샤
스즈키 마사유키
가부시키가이샤 아스크
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Priority claimed from JP16201793A external-priority patent/JPH07145253A/ja
Priority claimed from JP29071893A external-priority patent/JPH07142433A/ja
Application filed by 이마무라 가즈수케, 오노다 세멘토 가부시키가이샤, 스즈키 마사유키, 가부시키가이샤 아스크 filed Critical 이마무라 가즈수케
Publication of KR940018419A publication Critical patent/KR940018419A/ko

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C08J7/126—Halogenation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2327/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
    • C08J2327/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
    • C08J2327/12—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms

Abstract

발수성을 향상시킨 불소 함유 고분자 성형체, 특히, 발수성을 향상시킨 폴리테트라플루오로에틸렌 성형체, 및 수성계 세정공정에 있어서 피세정물의 유지구로서 사용하는 세제용 지그를 개시한다. 표면을 거칠게 처리한 후 불소 함유 개스로 처리하면 발수성이 우수한 성형체가 얻어진다. 표면 처리된 폴리테트라플루오로에틸렌으로 된 발수성 지그는 반도체 웨이퍼 및 글래스 판 또는 액정표시장치의 세정용 캐리어로서 사용하는 데 적합한다.

Description

발수성을 향상시킨 불소 함유 고분자 성형체 및 이로 부터 제조된 세정용 지그
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제 1 도는 PTFE 시이트를 와이어 포일 부러쉬로 거칠게 하고, 불소 개스로 접촉처리하지 않은 것(a), 불소 개스로 접촉처리한 것(b)을 ESCA로 측정한 C15의 스펙트럼을 나타내고, 제 3 도는 실시예 1 에서 PTFE 시이트를 표면을 거칠게 하는 각종 방법에 의하여 거칠게 된 것을 온도를 변화시켜 불소 접촉처리하였을 때의 접촉각을 나타낸 도면이며, 제 3 도중 1은 숏 블라스트, 2는 저온 플라스마 법에 의한 스팩터링, 3은 와이어 포일 부러쉬, 4는 벨트 센더에 의해 표면을 거칠게 한것을 나타내고, 5는 표면 거침처리를 하지 않은 것을 나타낸다.

Claims (13)

  1. 표면을 거칠게 한 후 불소개스로 처리하여 얻어진 발수성이 향상된 불소함유 고분자 성형체.
  2. 제 1 항에 있어서, 표면을 거칠게 하는 수단이 기계적 또는 전기적 처리에 의한 것인 불소함유 고분자 성형체.
  3. 제 1 항에 있어서, 불소개스와 접촉각이 가열하여 수행한 것인 불소함유 고분자 성형체.
  4. 제 3 항에 있어서, 가열온도가 100~300℃인 불소함유 고분자 성형체.
  5. 융점이상 분해점 미만의 온도에서 가열처리함으로써 발수성을 향상시킨 폴리테트라플루오로에틸렌 성형체.
  6. 제 5 항에 있어서, 가열처리가 표면을 거칠게 한 후에 수행한 것이 폴리테트라플루오로에틸렌 성형체.
  7. 융점이상 분해점 미만의 온도에서 불소개스와 접촉시킴으로서 발수성을 향상시킨 폴리테트라플루오로에틸렌 성형체.
  8. 불소개스와 접촉시킨 후에 표면을 융점이상 분해점 미만의 온도에서 열처리함으로써 발수성을 향상시킨 폴리테트라플루우로에틸렌 성형체.
  9. 제 7 항 또는 제 8 항에 있어서, 불소개스와 표면을 거칠게 한 후에 수행한 것인 폴리테트라플루오로에틸렌 성형체.
  10. 불소개스에서 접촉처리한 폴리테트라플루오로에틸렌제 수성계 세정용 지그.
  11. 제10항에 있어서, 온도가 상온~250℃에서 불소개스 농도가 10~200torr의 조건하 불소개스로 접촉처리함을 특징으로 하는 폴리테트라플루오로에틸렌제; 수성계 세정용 지그.
  12. 제11항에 있어서, 폴리테트라플루오로에틸렌제 수성계 세정용 지그가 폴리테트라플루오로에틸렌제 형체를 절삭 가공하여 얻어진 것인 폴리테트라플루오로에틸렌제 수성계 세정용 지그.
  13. 제11항에 있어서, 폴리테트라플루오로에틸렌제 수성계 세정용 지그가 반도체 웨이퍼 세정을 캐리어, 액정 표시용 글리스판 세정용 캐리어 또는 이 가이드 롤인 폴리테트라플루오로에틸렌제 수성계 세정용 지그.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940000534A 1993-01-18 1994-01-13 발수성을 향상시킨 불소 함유 고분자 성형체 및 이로 부터 제조된 세정용 지그 KR940018419A (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP592693 1993-01-18
JP5926/1993 1993-01-18
JP16201793A JPH07145253A (ja) 1993-06-30 1993-06-30 ポリテトラフルオロエチレン成形体の撥水性向上方法
JP162017/1983 1993-06-30
JP29071893A JPH07142433A (ja) 1993-11-19 1993-11-19 ポリテトラフルオロエチレン製水系洗浄用治具
JP290718/1993 1993-11-19

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KR940018419A true KR940018419A (ko) 1994-08-18

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US (1) US5599489A (ko)
KR (1) KR940018419A (ko)
DE (1) DE4401363A1 (ko)

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US5599489A (en) 1997-02-04

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