KR940004332U - 웨이퍼 세척 장치 - Google Patents

웨이퍼 세척 장치

Info

Publication number
KR940004332U
KR940004332U KR2019920013378U KR920013378U KR940004332U KR 940004332 U KR940004332 U KR 940004332U KR 2019920013378 U KR2019920013378 U KR 2019920013378U KR 920013378 U KR920013378 U KR 920013378U KR 940004332 U KR940004332 U KR 940004332U
Authority
KR
South Korea
Prior art keywords
cleaning equipment
wafer cleaning
wafer
equipment
cleaning
Prior art date
Application number
KR2019920013378U
Other languages
English (en)
Other versions
KR950006643Y1 (ko
Inventor
정상곤
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR92013378U priority Critical patent/KR950006643Y1/ko
Publication of KR940004332U publication Critical patent/KR940004332U/ko
Application granted granted Critical
Publication of KR950006643Y1 publication Critical patent/KR950006643Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/048—Overflow-type cleaning, e.g. tanks in which the liquid flows over the tank in which the articles are placed

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR92013378U 1992-07-20 1992-07-20 웨이퍼 세척 장치 KR950006643Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR92013378U KR950006643Y1 (ko) 1992-07-20 1992-07-20 웨이퍼 세척 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR92013378U KR950006643Y1 (ko) 1992-07-20 1992-07-20 웨이퍼 세척 장치

Publications (2)

Publication Number Publication Date
KR940004332U true KR940004332U (ko) 1994-02-24
KR950006643Y1 KR950006643Y1 (ko) 1995-08-16

Family

ID=19337010

Family Applications (1)

Application Number Title Priority Date Filing Date
KR92013378U KR950006643Y1 (ko) 1992-07-20 1992-07-20 웨이퍼 세척 장치

Country Status (1)

Country Link
KR (1) KR950006643Y1 (ko)

Also Published As

Publication number Publication date
KR950006643Y1 (ko) 1995-08-16

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Legal Events

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A201 Request for examination
E701 Decision to grant or registration of patent right
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