KR930021826A - Corrosion - Google Patents

Corrosion Download PDF

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Publication number
KR930021826A
KR930021826A KR1019920007096A KR920007096A KR930021826A KR 930021826 A KR930021826 A KR 930021826A KR 1019920007096 A KR1019920007096 A KR 1019920007096A KR 920007096 A KR920007096 A KR 920007096A KR 930021826 A KR930021826 A KR 930021826A
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KR
South Korea
Prior art keywords
ammonia
corrosion
corrosion solution
sulfate
mol
Prior art date
Application number
KR1019920007096A
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Korean (ko)
Other versions
KR100272318B1 (en
Inventor
베른트 린딩거
Original Assignee
발테르 홀 체르
엘로-켐 애츠테크닉 게엠베하
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Application filed by 발테르 홀 체르, 엘로-켐 애츠테크닉 게엠베하 filed Critical 발테르 홀 체르
Priority to KR1019920007096A priority Critical patent/KR100272318B1/en
Publication of KR930021826A publication Critical patent/KR930021826A/en
Application granted granted Critical
Publication of KR100272318B1 publication Critical patent/KR100272318B1/en

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/32—Alkaline compositions
    • C23F1/34—Alkaline compositions for etching copper or alloys thereof

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Catalysts (AREA)
  • Electrolytic Production Of Metals (AREA)

Abstract

테트라민황산염, 암모니아, 암모니아황산염, 암모니아클로라이드에 필요에 따라 암모니아 질산염 및 부식을 촉진 촉매를 가미한 회로 기판용 및 동 또는 동계 합금용의 전해적으로 회수 가능한 부식액으로 바나듐 또는 바나듐계 화합물을 바나듐 성분으로 1-99mg/1하여 부식을 촉진.Tetramin sulfate, ammonia, ammonia sulfate, and ammonia chloride are electrolytically recoverable corrosion solutions for circuit boards and copper or copper alloys with ammonia nitrate and corrosion-promoting catalysts as needed. Promotes corrosion by 1-99mg / 1.

Description

부식액Corrosion

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

Claims (5)

테트라민황산염, 암모니아, 암모니아황산염, 암모니아클로라이드, 암모니아질산염 및, 바나듐 또는 바나듐계 화합물을 바나듐성분으로 1-99㎎/1함유하는 부식촉진용 촉애로 이루어진, 회로기판용 및 동 또는 동계 합급용의 전해적으로 회수가능한 부식액.Tetramin sulfate, ammonia, ammonia sulfate, ammonia chloride, ammonia nitrate, and corrosion promoting catalysts containing 1-99 mg / 1 of vanadium or vanadium compounds as vanadium components for circuit boards and copper or copper alloys Electrolytically recoverable corrosion solutions. 제1항에 있어서, 부식액이 동 1-2mol/1, 암모니아클로라이드 0.01-0.1mol/1, 암모니아 질산염 0.1-1.3mol/1, 암모니아황산염 1.8-2.1mol/1 및 pH 8.1-8.8조정용 암모니아 유효량을 함유하는 부식액.The corrosion solution according to claim 1, wherein the corrosion solution contains copper 1-2 mol / 1, ammonia chloride 0.01-0.1 mol / 1, ammonia nitrate 0.1-1.3 mol / 1, ammonia sulfate 1.8-2.1 mol / 1 and pH 8.1-8.8. Corrosive solution to contain. 제1항 또는 제2항에 있어서, 부식액이 CuSO4 ˙5H2O 330g/1, 암모니아황산염 80g/1, 암모니아클라이드 4g/1(NH4)3HPO44g/1, V2O590mg/1 및 pH8.4 조정용 암모니아 유효량을 함유하는 부식액.The corrosion solution according to claim 1 or 2, wherein the corrosion solution is CuSO 4 ˙ 5H 2 O 330 g / 1, ammonia sulfate 80 g / 1, ammonia chloride 4 g / 1 (NH 4 ) 3 HPO 4 4 g / 1, V 2 O 5 90 mg / 1 and pH8.4 corrosion solution containing an effective amount of ammonia for adjustment. 제1항 또는 제2항에 있어서, 부식액이 인산 또는 인산염의 형태로 0.1-20g/1를 함유하는 부식액.The corrosion solution according to claim 1 or 2, wherein the corrosion solution contains 0.1-20 g / 1 in the form of phosphoric acid or phosphate. 제3항에 있어서, 부식액이 인산 또는 인산염의 형태로 0.1-20g/1를 함유하는 부식액.4. The corrosion solution according to claim 3, wherein the corrosion solution contains 0.1-20 g / 1 in the form of phosphoric acid or phosphate. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019920007096A 1992-04-27 1992-04-27 Corrosive solution KR100272318B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019920007096A KR100272318B1 (en) 1992-04-27 1992-04-27 Corrosive solution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019920007096A KR100272318B1 (en) 1992-04-27 1992-04-27 Corrosive solution

Publications (2)

Publication Number Publication Date
KR930021826A true KR930021826A (en) 1993-11-23
KR100272318B1 KR100272318B1 (en) 2000-11-15

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ID=19332350

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920007096A KR100272318B1 (en) 1992-04-27 1992-04-27 Corrosive solution

Country Status (1)

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KR (1) KR100272318B1 (en)

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Publication number Publication date
KR100272318B1 (en) 2000-11-15

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