KR930010667B1 - Manufacturing method for shadow mask of cathode-ray tube - Google Patents

Manufacturing method for shadow mask of cathode-ray tube Download PDF

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Publication number
KR930010667B1
KR930010667B1 KR1019900023047A KR900023047A KR930010667B1 KR 930010667 B1 KR930010667 B1 KR 930010667B1 KR 1019900023047 A KR1019900023047 A KR 1019900023047A KR 900023047 A KR900023047 A KR 900023047A KR 930010667 B1 KR930010667 B1 KR 930010667B1
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South Korea
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shadow mask
hole
metal plate
manufacturing
plate
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KR1019900023047A
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Korean (ko)
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KR920013560A (en
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권혁주
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삼성전관 주식회사
김정배
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/02Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
    • H01J29/06Screens for shielding; Masks interposed in the electron stream
    • H01J29/07Shadow masks for colour television tubes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems

Abstract

making a flat thin metal plate have a curvature by pressing process; applying a photoresist on the plate and placing an original plate with a number of patterns of small holes on the top of the plate and an original plate with a number of patterns of large holes on the bottom; exposing the patterns to infrared light and removing the unexposed parts with a developer; and etching away the opened parts after the developing with etchants.

Description

음극선관용 새도우 마스크의 제조방법Method of manufacturing shadow mask for cathode ray tube

제1도는 종래의 새도우 마스크 제조방법을 나타낸 단면도.1 is a cross-sectional view showing a conventional shadow mask manufacturing method.

제2도는 이 발명에 따른 새도우 마스크 제조방법을 나타낸 단면도이다.2 is a cross-sectional view showing a shadow mask manufacturing method according to the present invention.

* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings

1, 11 : 금속판 4, 5, 14, 15 : 감광막1, 11: metal plate 4, 5, 14, 15: photosensitive film

4a, 5a, 14a, 15a : 미노광부 또는 미경화부4a, 5a, 14a, 15a: unexposed or uncured portion

6, 8, 16, 18 : 구멍 형상의 패턴 7, 9, 17, 19 : 원판6, 8, 16, 18: hole-shaped pattern 7, 9, 17, 19: disc

10, 20 : 새도우 마스크10, 20: shadow mask

이 발명은 음극선관의 새도우 마스크(Shadow Mask)에 관한 것으로서, 더욱 상세하게는 새도우 마스크의 제작시 구멍(Hole)의 찢어짐이나 구멍 설계상의 오차를 줄일 수 있는 새도우 마스크의 제조방법에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a shadow mask of a cathode ray tube, and more particularly, to a method of manufacturing a shadow mask that can reduce tearing of holes or errors in hole design during fabrication of a shadow mask.

일반적으로 새도우 마스크는 음극선관에서 중요한 역할을 하는 부품으로서, 음극선관의 판넬 내측에 도포된 형광체와 전자빔을 방사하는 전자총사이에 설치되고, 수많은 구멍(Hole)이 형성되어 있다.In general, the shadow mask is a component that plays an important role in the cathode ray tube, and is installed between the phosphor coated inside the panel of the cathode ray tube and the electron gun emitting the electron beam, and a number of holes are formed.

따라서, 상기 전자총에서 방사된 전자빔이 편향요크의 자계 영향에 의해 편향되면서 새도우 마스크의 수많은 구멍들을 선택적으로 통과하여 판넬의 형광체에 부딪치게 됨으로써 화상이 나타나도록 된 것이다.Therefore, the electron beam emitted from the electron gun is deflected by the magnetic field effect of the deflection yoke, selectively passes through numerous holes of the shadow mask and strikes the phosphor of the panel so that an image appears.

종래에는 상기와 같은 새도우 마스크를 제작함에 있어서, 제1도에 나타낸 바와같이, 소정두께의 금속판(1) 양면에 감광막(4),(5)을 형성시킨다음, 상측에는 경(俓)이 작은 구멍 형상의 패턴(6)을 가지는 원판(7)을, 하측에는 경이 큰 수많은 구멍형상의 패턴(8)을 가지는 원판(9)을 덮어 적외선등의 광을 조사하여, 상, 하측의 감광액(4),(5)에 제각기 수많은 구멍형상의 패턴(6),(8)들을 인화시킨다.Conventionally, in manufacturing the shadow mask as described above, as shown in FIG. 1, the photosensitive films 4 and 5 are formed on both sides of the metal plate 1 of a predetermined thickness, and the upper side has a small diameter. The disk 7 having a hole-shaped pattern 6 is covered with a disk 9 having a large number of hole-shaped patterns 8 on the lower side thereof, and irradiated with light such as infrared rays, so that the upper and lower photosensitive liquids 4 ), (5) prints a large number of hole-shaped patterns (6) and (8), respectively.

그리고, 감광액(4),(5)의 미노광 또는 미경화부(4a),(5a)를 온수등으로 용해시켜 제거하고, 염화제이철등의 에칭(Etching) 액을 작용시켜 금속판(1)을 에칭함으로써 소정의 구멍을 금속판(1)에 형성시킨다.Then, the unexposed or uncured portions 4a and 5a of the photosensitive liquids 4 and 5 are dissolved and removed by hot water or the like, and the etching solution such as ferric chloride is applied to etch the metal plate 1. The predetermined hole is formed in the metal plate 1 by this.

그리고 상기와 같은 에칭공정에 의해 수많은 구멍을 형성한 금속판(1)을 제조한후, 프레스로 폼(Form) 공정을 행하여 소정의 곡률을 가지는 새도우 마스크(10)를 제조하게 되는 것이다.After the metal plate 1 having a large number of holes is formed by the etching process as described above, the shadow mask 10 having a predetermined curvature is manufactured by performing a form process by pressing.

그러나, 상기와 같은 새도우 마스크 제조방법은 편평한 금속판(1) 상태에서 에칭공정에 의한 구멍들을 형성한 다음 폼 공정에서 소정의 곡률로 성형할때 금속판(1)이 소정곡률로 휘어지게 됨에 따라 미리 형성된 구멍크기가 설계치와 달라지게 되므로 이를 일치시키기가 매우 어렵고, 또한 폼 공정시 금속판(1)의 연신으로 인한 구멍의 찢어짐등 새도우 마스크의 손상이 발생하게 되었으며, 대형 음극선관용 새도우 마스크 일수록 더욱 큰 영향을 미치는 문제점이 있었다.However, the shadow mask manufacturing method as described above is formed in advance as the metal plate 1 is bent to a predetermined curvature when the holes are formed by the etching process in a flat metal plate 1 state and then molded to a predetermined curvature in the foam process. As the hole size is different from the designed value, it is very difficult to match it, and damage of the shadow mask such as tearing of the hole due to the stretching of the metal plate 1 during the foaming process occurs, and the shadow mask for the large cathode ray tube has a greater effect. There was a problem.

이 발명은 상기의 문제점을 감안하여 이루어진 것으로서, 이 발명의 목적은, 새도우 마스크의 제조공정을 달리하여 이 새도우 마스크에 형성되는 수많은 구멍의 치수를 설계치와 동일하게 하여 정밀한 제작이 가능하게 하고, 구멍의 찢어짐등에 의한 새도우 마스크의 손상을 방지할 수 있는 음극선관용 새도우 마스크의 제조방법을 제공하는데 있다.The present invention has been made in view of the above-described problems, and an object of the present invention is to make precise manufacturing by making the dimensions of numerous holes formed in the shadow mask different from the design values by varying the manufacturing process of the shadow mask. The present invention provides a method for manufacturing a shadow mask for a cathode ray tube that can prevent damage to the shadow mask due to tearing.

상기의 목적을 달성하기 위한 이 발명은 새도우 마스크 제조방법에 있어서; 편평한 소정두께의 금속판을 프레스 가공으로 소정의 곡률로 성형하는 폼 공정과; 상기 폼 공정에 의해 소정의 곡률로 형성된 금속판의 양면에 소정두께의 감광막들을 형성한 후, 상기 감광막의 상측에는 경이 작은 수많은 구멍 형상의 패턴을 가지는 원판을 증착하고, 상기 감광막의 하측에는 경이 큰 수많은 구멍형상의 패턴을 가지는 원판을 각각 증착하는 증착공정과; 상기 증착공정후, 적외선등의 광을 조사하여 각각의 원판들에 형성된 수많은 구멍형상의 패턴들을 상기 감광막에 인화시키고, 감광막의 미노광부를 온수등으로 용해시켜 제거하는 현상공정과; 상기 현상공정후, 감광막의 미노광부의 제거된 부위를 염화 제이철등의 에칭액으로 에칭하는 에칭공정을 순차적으로 수행함을 특징으로 하는 음극선관용 새도우 마스크 제조방법에 있다.The present invention for achieving the above object in the shadow mask manufacturing method; A foaming step of forming a flat metal plate having a predetermined thickness into a predetermined curvature by pressing; After forming the photoresist films having a predetermined thickness on both sides of the metal plate formed with a predetermined curvature by the foaming process, a plate having a large number of small hole-shaped patterns is deposited on the upper side of the photoresist film. A vapor deposition step of depositing a master plate having a hole-shaped pattern; After the deposition process, irradiating light such as infrared rays to print a large number of hole-shaped patterns formed on the respective original plates on the photosensitive film, and developing and removing the unexposed part of the photosensitive film by hot water or the like; After the developing step, an etching process for etching the removed portion of the unexposed portion of the photosensitive film with an etchant such as ferric chloride is sequentially performed.

이하, 이 발명의 실시예를 첨부도면에 의하여 상세하게 설명한다. 제2도는 이 발명에 따른 음극선관용 새도우 마스크(20)의 제조방법을 나타낸 것으로, 먼저 편평한 소정두께의 금속판(11)을 프레스 가공으로 소정의 곡률로 성형되게 하는 폼(Form) 공정을 행한다. 상기와 같이 폼 공정에 의해 소정의 곡률로 형성된 금속판(1)의 양면에 소정두께의 감광막(14), (15)을 형성한 후, 상측에는 경(徑)이 작은 수많은 구멍 형상의 패턴(16)을 가지는 원판(17)을, 하측에는 경이 큰 수많은 구멍형상의 패턴(18)을 가지는 원판(19)을 각각 밀착 배치한다.DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of this invention will be described in detail with the accompanying drawings. 2 shows a method of manufacturing the shadow mask 20 for cathode ray tubes according to the present invention, first of which a form process is performed in which a flat metal plate 11 of a predetermined thickness is formed into a predetermined curvature by pressing. After the photosensitive films 14 and 15 having a predetermined thickness are formed on both surfaces of the metal plate 1 formed with a predetermined curvature by the foaming process as described above, a large number of hole-shaped patterns 16 having small diameters are formed on the upper side. The disc 17 which has (), and the disc 19 which has many large hole-shaped patterns 18 in the lower side are arrange | positioned closely.

그리고 적외선등의 광을 조사하여 각 원판(17),(19)에 형성된 수 많은 구멍형상의 패턴(16),(18)을 감광막에 인화시키고, 감광막의 미노광 또는 미 경화부(14a), (15a)는 온수등으로 용해시켜 제거하며, 상기 제거된 부위를 염화 제이철등의 에칭액으로 에칭시킴으로써 소정의 곡률로 성형된 금속판(11)에 수많은 구멍이 배열형성되어 새도우 마스크(20)가 제조되는 것이다.Then, a large number of hole-shaped patterns 16 and 18 formed on each of the original plates 17 and 19 are irradiated onto the photosensitive film by irradiation with light such as infrared rays, and the unexposed or uncured portion 14a of the photosensitive film, 15a is removed by dissolving with hot water or the like, and etching the removed portion with an etchant such as ferric chloride to form numerous holes in the metal plate 11 formed at a predetermined curvature so that the shadow mask 20 is manufactured. will be.

이와 같이 제조되는 이 발명의 새도우 마스크(20)는 편평한 금속판(11)에 폼 공정으로 소정의 곡률을 이룬 상태에서 에칭공정에 의한 수많은 구멍들을 형성하기 때문에 구멍들이 설계치대로 정확하게 형성될 수 있고, 또한, 폼 공정이 구멍 형성을 위한 에칭공정보다 먼저 이루어지기 때문에 폼 공정에 의해 금속판의 연신으로 구멍이 찢어지는 등의 불량 및 손상이 방지되는 것이다.The shadow mask 20 of the present invention manufactured as described above forms a large number of holes in the flat metal plate 11 by the etching process in a predetermined curvature in a foaming process, so that the holes can be accurately formed as designed. In addition, since the foam process is performed before the etching process for forming the hole, defects and damage such as tearing of the hole due to the stretching of the metal plate by the foam process are prevented.

이상에서와 같이, 이 발명에 따른 음극선관용 새도우 마스크의 제조방법에 의하면, 새도우 마스크에 수많은 구멍을 형성하기 위한 에칭공정이 새도우 마스크를 소정의 곡률 상태로 성형하는 폼 공정후에 행하여지게 됨으로써 구멍의 크기가 설계치에 일치되고, 구멍이 찢어지는 등의 손상이 방지되어 생산성이 향상되며, 대형의 음극선관용 새도우 마스크 일수록 그 효과는 더욱 크다.As described above, according to the manufacturing method of the shadow mask for cathode ray tube according to the present invention, the size of the hole by the etching step for forming a number of holes in the shadow mask is carried out after the foam step of forming the shadow mask to a predetermined curvature state Is in accordance with the design value, and damage such as tearing of holes is prevented and productivity is improved, and the larger the shadow mask for a cathode ray tube, the greater the effect.

Claims (1)

새도우 마스크 제조방법에 있어서; 편평한 소정두께의 금속판을 프레스 가공으로 소정의 곡률로 성형하는 폼 공정과; 상기 폼 공정에 의해 소정의 곡률로 형성된 금속판의 양면에 소정두께의 감광막들을 형성한 후, 상기 감광막의 상측에는 경이 작은 수많은 구멍 형상의 패턴을 가지는 원판을 증착하고, 상기 감광막의 하측에는 경이 큰 수많은 구멍형상의 패턴을 가지는 원판을 각각 증착하는 증착공정과; 상기 증착공정후, 적외선등의 광을 조사하여 각각의 원판들에 형성된 수많은 구멍형상의 패턴들을 상기 감광막에 인화시키고, 감광막의 미노광부를 온수등으로 용해시켜 제거하는 현상공정과; 상기 현상공정후, 감광막의 미노광부의 제거된 부위를 염화제이철등의 에칭액으로 에칭하는 에칭공정을 순차적으로 수행함을 특징으로 하는 음극선관용 새도우 마스크 제조방법.In a shadow mask manufacturing method; A foaming step of forming a flat metal plate having a predetermined thickness into a predetermined curvature by pressing; After forming the photoresist films having a predetermined thickness on both sides of the metal plate formed with a predetermined curvature by the foaming process, a plate having a large number of small hole-shaped patterns is deposited on the upper side of the photoresist film. A vapor deposition step of depositing a master plate having a hole-shaped pattern; After the deposition process, irradiating light such as infrared rays to print a large number of hole-shaped patterns formed on the respective original plates on the photosensitive film, and developing and removing the unexposed part of the photosensitive film by hot water or the like; And after the developing step, an etching step of etching the removed portion of the unexposed portion of the photosensitive film with an etching solution such as ferric chloride is sequentially performed.
KR1019900023047A 1990-12-31 1990-12-31 Manufacturing method for shadow mask of cathode-ray tube KR930010667B1 (en)

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KR930010667B1 true KR930010667B1 (en) 1993-11-05

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