JPS6023459B2 - Method for forming light absorption film for color picture tube - Google Patents

Method for forming light absorption film for color picture tube

Info

Publication number
JPS6023459B2
JPS6023459B2 JP13171377A JP13171377A JPS6023459B2 JP S6023459 B2 JPS6023459 B2 JP S6023459B2 JP 13171377 A JP13171377 A JP 13171377A JP 13171377 A JP13171377 A JP 13171377A JP S6023459 B2 JPS6023459 B2 JP S6023459B2
Authority
JP
Japan
Prior art keywords
photosensitive resin
resin film
light
picture tube
color picture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13171377A
Other languages
Japanese (ja)
Other versions
JPS5464971A (en
Inventor
一昭 平林
淳 木原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP13171377A priority Critical patent/JPS6023459B2/en
Publication of JPS5464971A publication Critical patent/JPS5464971A/en
Publication of JPS6023459B2 publication Critical patent/JPS6023459B2/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)

Description

【発明の詳細な説明】 本発明は、カラー受像管のガラス外囲器を形成するフェ
ースパネルの内面に、画像のコントラストを向上させる
ための光吸収膜を形成する方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for forming a light-absorbing film on the inner surface of a face panel forming a glass envelope of a color picture tube for improving image contrast.

いわゆるブラックマトリックス形式のカラー受像管は、
蟹光体ドットまたは受光体ストライプの相互間に光吸収
膜を有している。
The so-called black matrix color picture tube is
A light absorbing film is provided between the photoreceptor dots or photoreceptor stripes.

また、かかるカラー受像管の蟹光体ドット蚤または蟹光
体ストライプ幅は、シャドウマスクの孔部を通過して蟹
光面に到達する電子ビームの径よりも小さく設定される
のであり、かかる蟹光面は通常、下記の方法により形成
される。まず、フェースパネルの内面にネガタィプの感
光性樹脂膜が一様に塗布形成され、次にフェースパネル
内にシャドウマスクが装着される。
Further, the width of the light dots or stripes of the light beam of such a color picture tube is set smaller than the diameter of the electron beam that passes through the hole of the shadow mask and reaches the light surface of the light beam. The light surface is usually formed by the following method. First, a negative photosensitive resin film is uniformly coated on the inner surface of the face panel, and then a shadow mask is installed inside the face panel.

そして、3電子ビームの偏向中心となるべき位置(3個
所)に置かれた光源から発せられてシャドウマスクの孔
部を通過した光を感光性樹脂膜に与えて露光する。これ
により、シャドウマスクの孔部の3倍に相当する数の露
光点部分が硬化を起すので、次に現像処理を施して未露
光の膿部分を除去する。これにより、ドット状またはス
トライプ状の多数の樹脂膜(以下仮ドットという)が得
られるので、次にこの仮ドット上を含むフェースパネル
内面に、アクアダック等からなる光吸収性物質を一様に
塗布し、しかるのち前記仮ドットをエッチング処理によ
り分解除去する。この工程で、仮ドット上に位置してい
た光吸収性物質も一緒に除去されるので、マトリックス
ホール付きの光吸収膜が得られる。そして前記マトリッ
クスホール内に3種の蟹光体ドットまたは蟹光体ストラ
イプを形成するのであり、仮ドットの大きさしたがって
マトリックスホールの大きさが、蟹光体ドットまたは後
光体ストライプの実質的な大きさを決めることになる。
ところで、シャドウマスクの1個の孔部を通過した露光
光線の感光性樹脂膜上における輝度分布は第1図aに示
すようなものとなり、仮ドットの直径は真影部の直径d
minと半影部の直径dMxとの間に納まることになる
Then, the photosensitive resin film is exposed to light emitted from a light source placed at positions (three locations) that are to be the deflection centers of the three electron beams and passed through the holes of the shadow mask. As a result, a number of exposed points corresponding to three times the number of holes in the shadow mask are cured, and then a development process is performed to remove the unexposed pus portions. As a result, a large number of resin films in the form of dots or stripes (hereinafter referred to as temporary dots) are obtained.Next, a light-absorbing substance such as Aquaduck is uniformly applied to the inner surface of the face panel, including on the temporary dots. The temporary dots are then decomposed and removed by etching. In this step, the light-absorbing material located on the temporary dots is also removed, so a light-absorbing film with matrix holes is obtained. Then, three types of crab photon dots or crab photon stripes are formed within the matrix hole, and the size of the temporary dots and therefore the size of the matrix hole is determined by the actual size of the crab photon dots or halo photon stripes. You will decide the size.
By the way, the brightness distribution of the exposure light beam passing through one hole of the shadow mask on the photosensitive resin film is as shown in Figure 1a, and the diameter of the temporary dot is equal to the diameter d of the true shadow part.
It falls between min and the diameter dMx of the penumbra.

光源の実効的な直径を大きくするとdminの値は小さ
くなるものの、仮ドットの直径を小さくすることはでき
ない。むしろ、dm松が大きくなるので、仮ドット同士
が連結したり、形状乱れを生じたりする。第1図bに示
すように、光源1の直径をC、シャドウマスク2の孔部
の直径をB、光源1からフェースパネル3内面までの距
離をL、シャドウマスク2からフェースパネル3内面ま
での距離をqとすると、L q
……【1}dmin=LFT・B−こで’C −と−.B+L≦q.C ・”・”【21d肌=L
・qとなる。
Although increasing the effective diameter of the light source reduces the value of dmin, it is not possible to decrease the diameter of the temporary dot. On the contrary, as the dm pine becomes larger, the temporary dots may connect with each other, or the shape may become disordered. As shown in Figure 1b, the diameter of the light source 1 is C, the diameter of the hole in the shadow mask 2 is B, the distance from the light source 1 to the inner surface of the face panel 3 is L, and the distance from the shadow mask 2 to the inner surface of the face panel 3 is If the distance is q, then L q
...[1}dmin=LFT・B-here'C-and-. B+L≦q. C ・”・” [21d skin = L
・It becomes q.

したがって光源1の直径Cを大きくするとdminは小
さくなるものの、dmaxが大きくなり、前述のように
蓬小の仮ドットを得ることがむずかしくなる。要するに
「第2図に示すように×−X′の水準を超える露光量部
分が点在しうるように光源等の大きさを設定しなければ
ならないのであるが、このような磯光量分布を感光性樹
脂膜の全域にわたって生じさせることは容易でない。本
発明は、前述の諸点に留意してなされたものであり、本
発明の光吸収膜形成方法によると、ネガタィプの感光性
樹脂膜上にポジタィプの感光性樹脂膜を設けるのであり
、これを以下図面に示した実施例とともに詳しく説明す
る。第3図aに示すように「まずフェースパネル11の
内面上に水港性ネガタィプの感光性樹脂膜12が一様に
塗布形成され、その乾燥を待って有機溶剤性のポジタィ
プの感光性樹脂膜13が一様に塗布形成される。
Therefore, if the diameter C of the light source 1 is increased, dmin becomes smaller, but dmax becomes larger, making it difficult to obtain small temporary dots as described above. In short, as shown in Figure 2, the size of the light source etc. must be set so that there may be scattered parts of the exposure amount exceeding the x-X' level, but it is necessary to It is not easy to form a photosensitive resin film over the entire area of the photosensitive resin film.The present invention has been made with the above-mentioned points in mind. This will be explained in detail below together with the embodiment shown in the drawings.As shown in FIG. 12 is uniformly coated, and after drying, a positive type organic solvent photosensitive resin film 13 is uniformly coated.

そしてその後は従来と同様に、フェースパネル寮1内に
所定のシャドウマスクが装着され「偏向中心となるべき
3位置に置いた光源からの光を与えて露光処理を施す。
このように構成すると、露光処理の初期に感光するのは
ポジタィプの感光性樹脂膜13のみであり、ネガタィプ
の感光性樹脂膜12が感光する時期は遅れる。
After that, as in the past, a predetermined shadow mask is installed inside the face panel dormitory 1, and exposure processing is performed by applying light from light sources placed at three positions that should be the deflection center.
With this configuration, only the positive type photosensitive resin film 13 is exposed to light at the beginning of the exposure process, and the time when the negative type photosensitive resin film 12 is exposed to light is delayed.

この結果、第3図bに示すような鞍光量分布が膜厚方向
に生じる。この様子を第4図および第5図a,bにより
説明すると、第4図に示すようにポジタィプの感光性樹
脂膜を感光させうる露光量を5t ネガタィプの感光性
樹脂膜を感光させうる露光量(dMnに相当)を10と
した場合、従来方法では露光時間aで足りたものが本発
明の場合、1.虫の露光時間を必要とする。しかし、半
影部による露光の大半をポジタィプの感光性樹脂膜13
が受けもつことになるので、ネガタィプの感光性樹脂膜
12のdmaxを小さくすることができる。すなわち、
従来の露光時間aにおけるネガタィプ感光性樹脂膜12
の露光量7.5,5,33は、本発明の露光時間1.9
において、6.25,25,0にそれぞれ対応する結果
「 第5図a,bに対比して示すようにdmaXを小さ
くでき、仮ドット同士が連結するという事態の発生が防
止される。露光処理後、ポジタィブの感光性樹脂膜13
の感光部分は、アルカリ性水溶液による現像で除去でき
、未感光部分はネガタィプ感光性樹脂膜13の未感光部
分を温水による現像で除去するごいに同時に除去できる
As a result, a saddle light amount distribution as shown in FIG. 3b occurs in the film thickness direction. To explain this situation with reference to FIG. 4 and FIGS. 5a and 5b, as shown in FIG. (corresponding to dMn) is 10, in the conventional method, exposure time a was sufficient, but in the present invention, 1. Requires insect exposure time. However, most of the exposure from the penumbra is done by the positive photosensitive resin film 13.
Therefore, the dmax of the negative type photosensitive resin film 12 can be reduced. That is,
Negative type photosensitive resin film 12 at conventional exposure time a
The exposure amount of 7.5, 5, 33 is the exposure time of 1.9 of the present invention.
, the results corresponding to 6.25, 25, and 0, respectively, indicate that dmaX can be made smaller as shown in FIG. After that, positive photosensitive resin film 13
The exposed areas can be removed by development with an alkaline aqueous solution, and the unexposed areas can be removed at the same time as the unexposed areas of the negative type photosensitive resin film 13 are removed by development with hot water.

そして、かくして得られた仮ドットを用いてマトリック
スホール付きの光吸収層を形成し、そのマトリックスホ
ール内に姿光体ドットまたは蟹光体ストライプを埋める
のは従来どおりである。以上のように本発明によると、
ネガタィプの感光性樹脂膜上にポジタィプの感光性樹脂
膜を重ねて設け、しかるのち露光処理を施すのであって
、真影部の径を変えることなく半影部の径を小さくした
のと同等の効果が得られ、径小にしてかつ形状の揃った
マトリックスホール付きの光吸収膜を得ることができる
Then, the provisional dots thus obtained are used to form a light absorption layer with matrix holes, and the matrix holes are filled with phosphor dots or crab phosphor stripes in the conventional manner. According to the present invention as described above,
A positive type photosensitive resin film is overlaid on a negative type photosensitive resin film and then exposed to light, which is equivalent to reducing the diameter of the penumbra without changing the diameter of the true shadow area. It is possible to obtain a light-absorbing film with a matrix hole having a small diameter and a uniform shape.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図a,bは感光性樹脂膜の露光状態と露光点の輝度
分布とを示す図、第2図は露光位置と膜厚方向露光量と
の関係を示す図、第3図a,bは本発明の−実施例にお
ける感光性樹脂膜と感光部分との関係を示す断面図、第
4図は露光時間と露光量との関係を示す特性図、第5図
a,bは従釆の露光量分布と本発明により得られる滋光
量分布とを対比して示す図である。 11…フェースパネル、12…ネガタィプの感光性樹脂
膜、13・・・ポジタィプの感光性樹脂膜。 第1図第2図 第3図 第4図 第5図
Figures 1a and b are diagrams showing the exposure state of the photosensitive resin film and the brightness distribution of the exposure point, Figure 2 is a diagram showing the relationship between the exposure position and the exposure amount in the film thickness direction, Figure 3a and b is a cross-sectional view showing the relationship between the photosensitive resin film and the photosensitive area in the embodiment of the present invention, FIG. 4 is a characteristic diagram showing the relationship between exposure time and exposure amount, and FIGS. FIG. 3 is a diagram showing a comparison between an exposure amount distribution and a bright light amount distribution obtained by the present invention. 11... Face panel, 12... Negative type photosensitive resin film, 13... Positive type photosensitive resin film. Figure 1 Figure 2 Figure 3 Figure 4 Figure 5

Claims (1)

【特許請求の範囲】[Claims] 1 カラー受像管のフエースパネル内面にネガタイプの
感光性樹脂膜およびポジタイプの感光性樹脂膜をこの順
序で形成する工程と、両感光性樹脂膜を所定のパターン
で露光する工程と、前記ポジタイプの感光性樹脂膜の全
部および前記ネガタイプの感光性樹脂膜の未露光部分を
除去する工程と、前記フエースパネル内面の露光部分に
光吸収性膜を形成する工程と、前記ネガタイプの感光性
樹脂膜の露光部分を除去する工程とを備えたことを特徴
とするカラー受像管の光吸収膜形成方法。
1 A step of forming a negative type photosensitive resin film and a positive type photosensitive resin film on the inner surface of the face panel of a color picture tube in this order, a step of exposing both photosensitive resin films in a predetermined pattern, and a step of exposing the positive type photosensitive resin film to light in a predetermined pattern. a step of removing the entire photosensitive resin film and an unexposed portion of the negative type photosensitive resin film; a step of forming a light absorbing film on the exposed portion of the inner surface of the face panel; and exposing the negative type photosensitive resin film. 1. A method for forming a light absorption film for a color picture tube, comprising the step of removing a portion.
JP13171377A 1977-11-02 1977-11-02 Method for forming light absorption film for color picture tube Expired JPS6023459B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13171377A JPS6023459B2 (en) 1977-11-02 1977-11-02 Method for forming light absorption film for color picture tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13171377A JPS6023459B2 (en) 1977-11-02 1977-11-02 Method for forming light absorption film for color picture tube

Publications (2)

Publication Number Publication Date
JPS5464971A JPS5464971A (en) 1979-05-25
JPS6023459B2 true JPS6023459B2 (en) 1985-06-07

Family

ID=15064449

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13171377A Expired JPS6023459B2 (en) 1977-11-02 1977-11-02 Method for forming light absorption film for color picture tube

Country Status (1)

Country Link
JP (1) JPS6023459B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1325748C (en) * 2001-04-11 2007-07-11 住友金属工业株式会社 Screw joint for steel pipe

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IE56082B1 (en) * 1982-11-01 1991-04-10 Microsi Inc Photobleachable compositions
US5108874A (en) * 1982-11-01 1992-04-28 Microsi, Inc. Composite useful in photolithography
US5188924A (en) * 1984-05-14 1993-02-23 Kabushiki Kaisha Toshiba Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1325748C (en) * 2001-04-11 2007-07-11 住友金属工业株式会社 Screw joint for steel pipe

Also Published As

Publication number Publication date
JPS5464971A (en) 1979-05-25

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