KR930009725U - 웨이퍼의 저압 증착장치 - Google Patents

웨이퍼의 저압 증착장치

Info

Publication number
KR930009725U
KR930009725U KR2019910017064U KR910017064U KR930009725U KR 930009725 U KR930009725 U KR 930009725U KR 2019910017064 U KR2019910017064 U KR 2019910017064U KR 910017064 U KR910017064 U KR 910017064U KR 930009725 U KR930009725 U KR 930009725U
Authority
KR
South Korea
Prior art keywords
low pressure
deposition equipment
pressure deposition
wafer low
wafer
Prior art date
Application number
KR2019910017064U
Other languages
English (en)
Other versions
KR940007175Y1 (ko
Inventor
이승희
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR2019910017064U priority Critical patent/KR940007175Y1/ko
Publication of KR930009725U publication Critical patent/KR930009725U/ko
Application granted granted Critical
Publication of KR940007175Y1 publication Critical patent/KR940007175Y1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
KR2019910017064U 1991-10-14 1991-10-14 웨이퍼의 저압 증착장치 KR940007175Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019910017064U KR940007175Y1 (ko) 1991-10-14 1991-10-14 웨이퍼의 저압 증착장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019910017064U KR940007175Y1 (ko) 1991-10-14 1991-10-14 웨이퍼의 저압 증착장치

Publications (2)

Publication Number Publication Date
KR930009725U true KR930009725U (ko) 1993-05-26
KR940007175Y1 KR940007175Y1 (ko) 1994-10-14

Family

ID=19320543

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019910017064U KR940007175Y1 (ko) 1991-10-14 1991-10-14 웨이퍼의 저압 증착장치

Country Status (1)

Country Link
KR (1) KR940007175Y1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100442419B1 (ko) * 2001-07-24 2004-07-30 주식회사 크레젠 반도체 제조장치

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100442419B1 (ko) * 2001-07-24 2004-07-30 주식회사 크레젠 반도체 제조장치

Also Published As

Publication number Publication date
KR940007175Y1 (ko) 1994-10-14

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Legal Events

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