KR930004419A - 피복 물질 및 이의 용도 - Google Patents
피복 물질 및 이의 용도 Download PDFInfo
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- KR930004419A KR930004419A KR1019920015251A KR920015251A KR930004419A KR 930004419 A KR930004419 A KR 930004419A KR 1019920015251 A KR1019920015251 A KR 1019920015251A KR 920015251 A KR920015251 A KR 920015251A KR 930004419 A KR930004419 A KR 930004419A
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- pyrrolopyrrole
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- 239000000463 material Substances 0.000 title claims 20
- 239000011248 coating agent Substances 0.000 title claims 10
- 238000000576 coating method Methods 0.000 title claims 10
- 239000010410 layer Substances 0.000 claims 20
- 239000000758 substrate Substances 0.000 claims 13
- 150000001875 compounds Chemical class 0.000 claims 10
- RQGPLDBZHMVWCH-UHFFFAOYSA-N pyrrolo[3,2-b]pyrrole Chemical compound C1=NC2=CC=NC2=C1 RQGPLDBZHMVWCH-UHFFFAOYSA-N 0.000 claims 9
- 239000002253 acid Substances 0.000 claims 8
- 150000003839 salts Chemical class 0.000 claims 7
- 238000000034 method Methods 0.000 claims 6
- 125000000217 alkyl group Chemical group 0.000 claims 5
- 125000002757 morpholinyl group Chemical group 0.000 claims 4
- 229910052757 nitrogen Inorganic materials 0.000 claims 4
- 125000005936 piperidyl group Chemical group 0.000 claims 4
- 125000000719 pyrrolidinyl group Chemical group 0.000 claims 4
- -1 2-mercaptoethyl Chemical group 0.000 claims 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims 3
- 229910052739 hydrogen Inorganic materials 0.000 claims 3
- 239000001257 hydrogen Substances 0.000 claims 3
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 3
- 229910052760 oxygen Inorganic materials 0.000 claims 3
- 239000001301 oxygen Substances 0.000 claims 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 3
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 claims 3
- 239000011241 protective layer Substances 0.000 claims 3
- 239000000126 substance Substances 0.000 claims 3
- 125000004568 thiomorpholinyl group Chemical group 0.000 claims 3
- 125000004642 (C1-C12) alkoxy group Chemical group 0.000 claims 2
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 claims 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 claims 2
- 125000001246 bromo group Chemical group Br* 0.000 claims 2
- 239000004020 conductor Substances 0.000 claims 2
- 125000004093 cyano group Chemical group *C#N 0.000 claims 2
- 229910052736 halogen Inorganic materials 0.000 claims 2
- 150000002431 hydrogen Chemical class 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 108091008695 photoreceptors Proteins 0.000 claims 2
- 125000004076 pyridyl group Chemical group 0.000 claims 2
- YKPJEYXZEBLYCI-UHFFFAOYSA-N pyrrolo[3,4-c]pyrrole Chemical compound C1=NC=C2C=NC=C21 YKPJEYXZEBLYCI-UHFFFAOYSA-N 0.000 claims 2
- 229910052717 sulfur Inorganic materials 0.000 claims 2
- 239000011593 sulfur Substances 0.000 claims 2
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 claims 1
- 125000000339 4-pyridyl group Chemical group N1=C([H])C([H])=C([*])C([H])=C1[H] 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims 1
- 238000010521 absorption reaction Methods 0.000 claims 1
- 238000000862 absorption spectrum Methods 0.000 claims 1
- 150000007513 acids Chemical class 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000004414 alkyl thio group Chemical group 0.000 claims 1
- 239000002216 antistatic agent Substances 0.000 claims 1
- 229910010293 ceramic material Inorganic materials 0.000 claims 1
- 125000001309 chloro group Chemical group Cl* 0.000 claims 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims 1
- 239000003989 dielectric material Substances 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- 125000002883 imidazolyl group Chemical group 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 229910001092 metal group alloy Inorganic materials 0.000 claims 1
- 229910044991 metal oxide Inorganic materials 0.000 claims 1
- 150000004706 metal oxides Chemical class 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 229910017604 nitric acid Inorganic materials 0.000 claims 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 239000000123 paper Substances 0.000 claims 1
- 125000004193 piperazinyl group Chemical group 0.000 claims 1
- 125000003226 pyrazolyl group Chemical group 0.000 claims 1
- 125000000168 pyrrolyl group Chemical group 0.000 claims 1
- 125000001425 triazolyl group Chemical group 0.000 claims 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 claims 1
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D165/00—Coating compositions based on macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Coating compositions based on derivatives of such polymers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/06—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being organic
- G03G5/0622—Heterocyclic compounds
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- G03G5/0646—Heterocyclic compounds containing two or more hetero rings in the same ring system
- G03G5/0648—Heterocyclic compounds containing two or more hetero rings in the same ring system containing two relevant rings
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- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/06—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being organic
- G03G5/0622—Heterocyclic compounds
- G03G5/0644—Heterocyclic compounds containing two or more hetero rings
- G03G5/0661—Heterocyclic compounds containing two or more hetero rings in different ring systems, each system containing at least one hetero ring
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- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
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- H10K85/621—Aromatic anhydride or imide compounds, e.g. perylene tetra-carboxylic dianhydride or perylene tetracarboxylic di-imide
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- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
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- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
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- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
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Abstract
내용 없음.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (25)
- 적어도 부분적으로는 강산의 염으로 전환되는 하기 일반식(Ⅰ)의 피롤로피롤 또는 이의 혼합물 박층으로 적어도 한 면을 피복시킨 기판을 포함함을 특징으로 하는 피복물질.상기 식에서, R1은 3급－아미노 그룹에 의해 치환된 하기 일반식의 페닐 또는 피리딜 라디칼이거나,하기 일반식의 피리딜 그룹이며,R2는 일반식의 그룹 또는 R1과 동일한 의미를 가지며, R3및 R4는 각각 독립적으로 C1－C18알킬, C5－C6사이클로알킬, －OH 또는 －SH에 의해 치환된 C1－C18알킬, 또는 비치환된 페닐, 벤질 또는 페닐에틸, 또는 할로겐, C1－C12알킬, C1－C12알콕시, 시아노 또는 니트로에 의해 치환된 페닐, 벤질 또는 페닐에틸이거나, 결합 질소원자와 함께 피롤리디닐, 피페리딜, 피롤릴, 이미다졸릴, 피라졸릴, 트리아졸릴, 피페라지닐, 모르폴리닐 및 티오모르폴리닐로 이루어진 그룹중에서 선택되는 5－ 또는 6－원 헤테로사이클릭 라디칼을 형성하고, R5내지 R6은 각각 독립적으로 수소, 할로겐, C1－C12알킬, C1－C12알콕시, C1－C12알킬머캅토 또는 시아노이며, X1및 X2는 각각 독립적으로 산소 또는 황이다.
- 제1항에 있어서, 일반식(Ⅰ)의 화합물의 그룹 R1및 R2와 X1및 X2가 각각 동일한 물질.
- 제1항에 있어서, 일반식(Ⅰ)의 화합물의 그룹 R3및 R4, R5및 R6와 R7및 R8이 각각 동일한 물질.
- 제1항에 있어서, R1이 피리딜 또는 일반식의 그룹이며, R2는 일반식의 그룹이거나 R1고 동일한 의미를 가지며, R3및 R4는 동일하며 C1－C12알킬, 2－하이드록시에틸, 2－머캅토에틸, 사이클로헥실, 벤질 또는 페닐에틸이거나, 결합 질소원자와 함께 피롤리디닐, 피페리딜, 모르폴리닐 또는 티오모르폴리닐을 형성하고, R5내지 R8은 각각 독립적으로 수소, 클로로, 브로모, C1－C4알킬, C1－C4알콕시 또는 C1－C4알킬머캅토인 물질.
- 제1항에 있어서, R3및 R4는 동일하며 C1－C4알킬, 2－하이드록시에틸 또는 2－머캅토에틸이거나, 결합 질소 원자와 함께 피롤리디닐, 피페리딜, 모르폴리닐 또는 티오모르폴리닐을 형성하며, R5내지 R8은 각각 독립적으로 수소, 또는 브로모인 물질.
- 제1항에 있어서, R1및 R2는 2－, 3－ 바람직하게는 4－피리딜이며, X1및 X2는 산소이거나, R1및 R2가 일반식(여기서, R3및 R4는 각각 메틸이거나 결합 질소원자와 함게 피롤리디닐, 피페리딜 또는 모르폴리닐을 형성한다)의 그룹이며 X1및 C2는 동일하고 산소, 바람직하게는 황인 물질.
- 제1항에 있어서, 피롤로피롤층이 질산, 염산, 브롬화 수소산, 트리클로로아세트산 또는 트리플루오로아세트산과 적어도 부분적으로 염을 형성하는 물질.
- 제1항에 있어서, 일반식(Ⅰ)의 화합물층의 두께가 500 내지 5000Å인 물질.
- 제1항에 있어서, 기판이 종이, 유리, 세라믹 물질, 플라스틱, 적층물, 금속, 금속 합금 또는 금속 산화물을 포함하는 물질.
- 제1항에 있어서, 일반식(Ⅰ)의 화합물이 1,4－디케토－3,6－비스(4′－피리딜)피롤로[3,4－c]피롤, 1,4－디케토－3,6－비스(3′－피리딜)피롤로[3,4－c]피롤 및 1,4－디티오케토－3,6－비스(4′－디메틸아미노페틸)피롤로[3,4－c]피롤인 물질.
- 적어도 한 면을 일반식(Ⅰ)의 피롤로피롤으로 피복시킨 기판을 강산으로 처리하고 일반식(Ⅰ)의 피롤로피롤을 적어도 부분적으로는 강산의 염으로 전환시킴을 특징으로 하여, 제1항에서 정의된 피복물질을 제조하는 방법.
- 제11항에 있어서, 피복된 기판을 강산 증기에 노출시키는 방법.
- 정보 입력에 따라 기록층으로 작용하는 일반식(Ⅰ)의 화합물과 이의 강산이 염을 레이저 광으로 조사시키고 정보가 상기 층의 조사된 영역에서 기록되고 기억되도록 기록층의 흡수 스펙트럼을 변화시킴을 특징으로 하여, 제1항에서 정의된 피복물질내에 정보를 기억시키는 방법.
- 제13항에 있어서, 피복물질이 투명한 기판/기록층/반사층/불투명 또는 투명한 보호층을 포함하는 구조를 갖는 방법.
- 제13항에 있어서, 피복물질이 투명한 기판/기록층/반사층/불투명 또는 투명한 보호층을 포함하는 구조를 갖는 방법.
- 제13항에 있어서, 피복물질이 투명한 기판/기록층/반사층/불투명 또는 투명한 보호층을 포함하는 구조를 갖는 방법.
- 제13항에 있어서, 레이저 광 조사에 의해 기억된 정보가 저에너지 레이저를 사용하는 광검출기에 의해 해독되는 방법.
- 기록층이 적어도 부분적으로는 강산의 염인 일반식(Ⅰ)의 화합물을 포함하며 기록층내 환경보다 더 높거나 더 낮은 흡수력을 갖는 비트 형태로 정보를 함유하는, 정보가 기록된 피복물질.
- 제1항에 있어서, 기판이 유전성 물질인 대전방지 처리된 물질.
- 기판이 전기전도성 물질을 포함하며 추가로 전하－수송층이 적어도 부분적으로는 강산의 염 형태인 일반식(Ⅰ)의 피롤로피롤층에 도포되는, 제1항에서 정의된 물질을 포함함을 특징으로 하는 광수용체.
- 기판이 전기전도성 물질을 포함하며 추가로 전하－수송층이 적어도 부분적으로는 강산의 염 형태인 일반식(Ⅰ)의 피롤로피롤층에 도포되는, 제1항에서 정의된 물질을 포함함을 특징으로 하는 태양 셀 또는 태양 전지.
- 기판이 일반식(Ⅰ)의 피롤로피롤층을 피복시킨 1쌍의 전극으로 인해 피복된 물질인, 피복물질을 포함함을 특징으로 하는 센서.
- 제1항에서 정의한 물질의, 태양 전지와 태양 셀 제조용 및 광수용체 제조용 광학 기록물질로서의 용도.
- 유전성 기판을 갖는 제1항에서 정의한 물질의, 대전방지 가공 처리된 물질로서의 용도.
- 기판이 1쌍의 전극으로 피복되며 일반식(Ⅰ)의 피롤로피롤이 활성 층으로서 작용하는, 일반식(Ⅰ)의 피롤로피롤의 피복된 물질의 센서로서의 용도.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH02495/91-0 | 1991-08-26 | ||
| CH249591 | 1991-08-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR930004419A true KR930004419A (ko) | 1993-03-22 |
Family
ID=4235096
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019920015251A KR930004419A (ko) | 1991-08-26 | 1992-08-25 | 피복 물질 및 이의 용도 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US5316852A (ko) |
| EP (1) | EP0530145A1 (ko) |
| JP (1) | JPH05201143A (ko) |
| KR (1) | KR930004419A (ko) |
| CA (1) | CA2076723A1 (ko) |
| TW (1) | TW213506B (ko) |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| TW472072B (en) * | 1995-05-12 | 2002-01-11 | Ciba Sc Holding Ag | Process for colouration of high molecular weight organic materials in the mass with soluble phthalocyanine precursors |
| JP2001013056A (ja) * | 1999-07-02 | 2001-01-19 | Minolta Co Ltd | 微小開口形成方法 |
| US20070140908A1 (en) | 2003-10-22 | 2007-06-21 | Toyo Ink Mfg., Ltd. of Tokyo, Japan | Proton acceptance type sensor, hydrogen gas sensor and acid sensor |
| WO2006087967A1 (ja) * | 2005-02-21 | 2006-08-24 | Techno Polymer Co., Ltd. | レーザーマーキング用の積層体 |
| JP5022573B2 (ja) * | 2005-06-02 | 2012-09-12 | 富士フイルム株式会社 | 光電変換素子、及び撮像素子、並びに、これらに電場を印加する方法 |
| CA2700713A1 (en) * | 2007-10-09 | 2009-04-16 | Zhimin Hao | Pyrrolopyrrole derivatives, their manufacture and use |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4579949A (en) * | 1982-05-17 | 1986-04-01 | Ciba-Geigy Corporation | Preparation of pyrrolo[3,4-c]pyrroles |
| US4791211A (en) * | 1982-09-27 | 1988-12-13 | Ciba-Geigy Corporation | Process for the production of 2-stilbylnaphthotriazole optical bleaches |
| US4529688A (en) * | 1983-10-13 | 1985-07-16 | Xerox Corporation | Infrared sensitive phthalocyanine compositions |
| DE3582576D1 (de) * | 1985-01-03 | 1991-05-23 | Ciba Geigy Ag | Dithioketo-pyrrolo-pyrrole, verfahren zu deren herstellung und verwendung. |
| US4791204A (en) * | 1985-11-26 | 1988-12-13 | Ciba-Geigy Corporation | 1,4-diketopyrrolo[3,4-c]pyrrole pigments |
| DE3703495A1 (de) * | 1987-02-05 | 1988-08-18 | Langhals Heinz | Lichtechte, leichtloesliche perylen-fluoreszenzfarbstoffe |
| JPH01230055A (ja) * | 1987-11-30 | 1989-09-13 | Mita Ind Co Ltd | 電子写真用感光体 |
| EP0353184B1 (de) * | 1988-07-20 | 1994-06-15 | Ciba-Geigy Ag | Verfahren zur Herstellung aminierter Diketodi(het)aryl-pyrrolopyrrole und Verwendung derselben als photoleitfähige Substanzen |
| US5144333A (en) * | 1989-06-09 | 1992-09-01 | Ciba-Geigy Corporation | Process for the storage of information in an organic recording layer |
| KR920002741A (ko) * | 1990-07-20 | 1992-02-28 | 베르너 발데크 | 디케토피롤로피롤을 기재로 하는 전기 발색 조성물 |
| EP0490817B1 (de) * | 1990-12-12 | 1996-09-11 | Ciba-Geigy Ag | Verfahren zur Speicherung von Informationen mit hoher Speicherdichte |
-
1992
- 1992-08-18 EP EP92810630A patent/EP0530145A1/de not_active Withdrawn
- 1992-08-18 US US07/931,914 patent/US5316852A/en not_active Expired - Fee Related
- 1992-08-20 TW TW081106598A patent/TW213506B/zh active
- 1992-08-24 JP JP4245965A patent/JPH05201143A/ja active Pending
- 1992-08-24 CA CA002076723A patent/CA2076723A1/en not_active Abandoned
- 1992-08-25 KR KR1019920015251A patent/KR930004419A/ko not_active Application Discontinuation
-
1994
- 1994-01-25 US US08/187,243 patent/US5472815A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP0530145A1 (de) | 1993-03-03 |
| TW213506B (ko) | 1993-09-21 |
| US5472815A (en) | 1995-12-05 |
| JPH05201143A (ja) | 1993-08-10 |
| US5316852A (en) | 1994-05-31 |
| CA2076723A1 (en) | 1993-02-27 |
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