KR920016610A - 증착장치 - Google Patents
증착장치 Download PDFInfo
- Publication number
- KR920016610A KR920016610A KR1019920001809A KR920001809A KR920016610A KR 920016610 A KR920016610 A KR 920016610A KR 1019920001809 A KR1019920001809 A KR 1019920001809A KR 920001809 A KR920001809 A KR 920001809A KR 920016610 A KR920016610 A KR 920016610A
- Authority
- KR
- South Korea
- Prior art keywords
- film
- vacuum
- deposition
- winding
- vapor deposition
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/544—Controlling the film thickness or evaporation rate using measurement in the gas phase
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 일실시예에 있어서의 증착장치의 개략단면도, 제2도는 동증착장치에 있어서의 전류계근처와 증착메카니즘을 표시한 구성도.
Claims (1)
- 진공체임버와, 그 진공체임버내를 감압분위기로 하기 위한 진공펌프와, 진공체임버내에 증착재료를 구비한 적어도 1개의 진공증착원과, 그 진공증착원에 대향해서 형성되고 필름의 증착면을 냉각하여 회전하는 캔과, 필름을 캔에 공급하는 공급로울러와, 증착된 필름을 감는 감는 로울러와, 필름의 감기 및 주행을 보조하는 자유로울러와, 증착후의 필름에 직류의 전압을 인가하는 전압인가수단을 구비한 증착장치에 있어서, 상기 증착필름과 어어드간에 흐르는 전류를 계측하는 전류계측수단을 형성하는 것을 특징으로 하는 증착장치.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP91-17549 | 1991-02-08 | ||
JP3017549A JP2833230B2 (ja) | 1991-02-08 | 1991-02-08 | 蒸着装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR920016610A true KR920016610A (ko) | 1992-09-25 |
KR940011004B1 KR940011004B1 (ko) | 1994-11-22 |
Family
ID=11946999
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019920001809A KR940011004B1 (ko) | 1991-02-08 | 1992-02-08 | 증착장치 |
Country Status (3)
Country | Link |
---|---|
US (1) | US5258074A (ko) |
JP (1) | JP2833230B2 (ko) |
KR (1) | KR940011004B1 (ko) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4222013A1 (de) * | 1992-07-04 | 1994-01-05 | Leybold Ag | Vorrichtung zur Vakuumbeschichtung von Folien |
US5743966A (en) * | 1996-05-31 | 1998-04-28 | The Boc Group, Inc. | Unwinding of plastic film in the presence of a plasma |
KR100296692B1 (ko) * | 1996-09-10 | 2001-10-24 | 사토 도리 | 플라즈마cvd장치 |
US6047660A (en) * | 1997-09-06 | 2000-04-11 | Lee; Brent W. | Apparatus and method to form coated shielding layer for coaxial signal transmission cables |
US7025856B2 (en) * | 2001-02-02 | 2006-04-11 | The Regents Of The University Of California | Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge |
JP4516304B2 (ja) * | 2003-11-20 | 2010-08-04 | 株式会社アルバック | 巻取式真空蒸着方法及び巻取式真空蒸着装置 |
CN100562602C (zh) * | 2005-02-16 | 2009-11-25 | 株式会社爱发科 | 卷取式真空成膜装置 |
EP1870488A1 (de) * | 2006-06-23 | 2007-12-26 | Applied Materials GmbH & Co. KG | Vorrichtung zur Beeinflussung des elektrostatischen Zustands einer Folie |
EP2119813A1 (en) * | 2008-05-16 | 2009-11-18 | Applied Materials, Inc. | Coating device with insulation |
JP5481239B2 (ja) * | 2009-03-18 | 2014-04-23 | 東レ株式会社 | 薄膜付シートの製造装置及び薄膜付シートの製造方法、並びにこれらに用いられる円筒状ロール |
JP2013036104A (ja) * | 2011-08-10 | 2013-02-21 | Toray Advanced Film Co Ltd | 薄膜形成方法および薄膜形成装置 |
CN103361623B (zh) * | 2013-07-30 | 2016-07-06 | 林正亮 | 一种卷绕蒸发式真空镀膜机 |
DE102019204818A1 (de) * | 2019-04-04 | 2020-10-08 | Robert Bosch Gmbh | Verfahren zur Überwachung eines plasmagestützten Prozesses zur Beschichtung eines Bauteils und Vorrichtung zur Beschichtung eines Bauteils |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58130443A (ja) * | 1982-01-28 | 1983-08-03 | Fuji Photo Film Co Ltd | 磁気記録媒体の製造方法 |
JPS5916970A (ja) * | 1982-07-15 | 1984-01-28 | Citizen Watch Co Ltd | イオンプレ−テイングにおける蒸発材の蒸発量検知及び制御方法 |
JPH04276061A (ja) * | 1991-03-05 | 1992-10-01 | Matsushita Electric Ind Co Ltd | 蒸着装置 |
-
1991
- 1991-02-08 JP JP3017549A patent/JP2833230B2/ja not_active Expired - Fee Related
-
1992
- 1992-02-07 US US07/833,443 patent/US5258074A/en not_active Expired - Lifetime
- 1992-02-08 KR KR1019920001809A patent/KR940011004B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JPH04259374A (ja) | 1992-09-14 |
US5258074A (en) | 1993-11-02 |
JP2833230B2 (ja) | 1998-12-09 |
KR940011004B1 (ko) | 1994-11-22 |
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