KR910021033U - 반도체 제조용 페이스트 경화장치 - Google Patents
반도체 제조용 페이스트 경화장치Info
- Publication number
- KR910021033U KR910021033U KR2019900006559U KR900006559U KR910021033U KR 910021033 U KR910021033 U KR 910021033U KR 2019900006559 U KR2019900006559 U KR 2019900006559U KR 900006559 U KR900006559 U KR 900006559U KR 910021033 U KR910021033 U KR 910021033U
- Authority
- KR
- South Korea
- Prior art keywords
- semiconductor manufacturing
- curing device
- paste curing
- paste
- semiconductor
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67121—Apparatus for making assemblies not otherwise provided for, e.g. package constructions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019900006559U KR920008611Y1 (ko) | 1990-05-16 | 1990-05-16 | 반도체 제조용 페이스트 경화장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019900006559U KR920008611Y1 (ko) | 1990-05-16 | 1990-05-16 | 반도체 제조용 페이스트 경화장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR910021033U true KR910021033U (ko) | 1991-12-20 |
KR920008611Y1 KR920008611Y1 (ko) | 1992-12-05 |
Family
ID=19298826
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019900006559U KR920008611Y1 (ko) | 1990-05-16 | 1990-05-16 | 반도체 제조용 페이스트 경화장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR920008611Y1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100342200B1 (ko) * | 1995-06-20 | 2002-10-25 | 앰코 테크놀로지 코리아 주식회사 | 리드프레임과 방열판을 동시에 로딩하는 장치 |
-
1990
- 1990-05-16 KR KR2019900006559U patent/KR920008611Y1/ko not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100342200B1 (ko) * | 1995-06-20 | 2002-10-25 | 앰코 테크놀로지 코리아 주식회사 | 리드프레임과 방열판을 동시에 로딩하는 장치 |
Also Published As
Publication number | Publication date |
---|---|
KR920008611Y1 (ko) | 1992-12-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
FPAY | Annual fee payment |
Payment date: 20031127 Year of fee payment: 12 |
|
LAPS | Lapse due to unpaid annual fee |