KR910020491A - 전사용 볼록판 및 이 전사용 볼록판에 의한 전사방법 - Google Patents
전사용 볼록판 및 이 전사용 볼록판에 의한 전사방법Info
- Publication number
- KR910020491A KR910020491A KR1019900016054A KR900016054A KR910020491A KR 910020491 A KR910020491 A KR 910020491A KR 1019900016054 A KR1019900016054 A KR 1019900016054A KR 900016054 A KR900016054 A KR 900016054A KR 910020491 A KR910020491 A KR 910020491A
- Authority
- KR
- South Korea
- Prior art keywords
- transfer
- convex plate
- transfer method
- convex
- plate
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M1/00—Inking and printing with a printer's forme
- B41M1/26—Printing on other surfaces than ordinary paper
- B41M1/30—Printing on other surfaces than ordinary paper on organic plastics, horn or similar materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
- B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
- B24C1/04—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods for treating only selected parts of a surface, e.g. for carving stone or glass
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06P—DYEING OR PRINTING TEXTILES; DYEING LEATHER, FURS OR SOLID MACROMOLECULAR SUBSTANCES IN ANY FORM
- D06P5/00—Other features in dyeing or printing textiles, or dyeing leather, furs, or solid macromolecular substances in any form
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Textile Engineering (AREA)
- Mechanical Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2139055A JPH0432846A (ja) | 1990-05-29 | 1990-05-29 | 転写用凸版及びその製造方法 |
JP2-139055 | 1990-05-29 | ||
JP2-178627 | 1990-07-05 | ||
JP2178627A JPH0465283A (ja) | 1990-07-05 | 1990-07-05 | 転写用凸版による転写法 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR910020491A true KR910020491A (ko) | 1991-12-20 |
KR940007799B1 KR940007799B1 (ko) | 1994-08-25 |
Family
ID=26471961
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019900016054A KR940007799B1 (ko) | 1990-05-29 | 1990-10-10 | 전사용 볼록판 및 이 전사용 볼록판에 의한 전사방법 |
Country Status (5)
Country | Link |
---|---|
US (2) | US5185225A (ko) |
EP (1) | EP0459055A3 (ko) |
KR (1) | KR940007799B1 (ko) |
AU (1) | AU629032B2 (ko) |
CA (1) | CA2028442A1 (ko) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5415971A (en) * | 1993-04-02 | 1995-05-16 | The Chromaline Corporation | Photoresist laminate including photoimageable adhesive layer |
FR2770434A1 (fr) * | 1997-11-05 | 1999-05-07 | Jean Michel Hostein | Procede de gravure a l'aide d'un masque de sablage - masque obtenu selon le procede |
EP1973110A3 (en) * | 2007-03-19 | 2009-04-29 | Ricoh Company, Ltd. | Minute structure and information recording medium |
CN110802521B (zh) * | 2019-11-15 | 2021-08-31 | 贵州航天南海科技有限责任公司 | 一种零件的局部喷砂方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2207495A1 (de) * | 1971-02-20 | 1972-08-24 | Dainippon Printing Co Ltd | Flachdruckplatten und Verfahren zu ihrer Herstellung |
CA1099435A (en) * | 1971-04-01 | 1981-04-14 | Gwendyline Y. Y. T. Chen | Photosensitive block copolymer composition and elements |
JPS4983501A (ko) * | 1972-12-18 | 1974-08-12 | ||
JPS50125805A (ko) * | 1974-03-19 | 1975-10-03 | ||
US4193798A (en) * | 1974-06-21 | 1980-03-18 | Sumitomo Chemical Company, Limited | Process for producing printing resin plates using liquid photosensitive resins |
JPS51120804A (en) * | 1975-04-14 | 1976-10-22 | Dainippon Printing Co Ltd | Plate for lithographic printing |
JPS5648633A (en) * | 1979-09-28 | 1981-05-01 | Dainippon Printing Co Ltd | Direct printing dry lithographic plate |
JPS5965838A (ja) * | 1982-10-07 | 1984-04-14 | Dainippon Screen Mfg Co Ltd | 多層構造を有する感材およびその製版方法 |
JPS608100A (ja) * | 1983-06-28 | 1985-01-16 | 旭化成株式会社 | 吹き付け食刻方法 |
GB8319979D0 (en) * | 1983-07-25 | 1983-08-24 | Stroud E J F | Printing plates |
GB8611229D0 (en) * | 1986-05-08 | 1986-06-18 | Ucb Sa | Forming positive pattern |
AU6210586A (en) * | 1986-09-01 | 1988-03-03 | Sullivan, D.F. | Improved screen printed photopolymer images |
US5049476A (en) * | 1988-07-18 | 1991-09-17 | Hoechst Celanese Corporation | Photopolymerizable, positive working, peel developable, single sheet color proofing system |
-
1990
- 1990-09-05 AU AU62181/90A patent/AU629032B2/en not_active Ceased
- 1990-10-02 EP EP19900310786 patent/EP0459055A3/en not_active Withdrawn
- 1990-10-10 KR KR1019900016054A patent/KR940007799B1/ko not_active IP Right Cessation
- 1990-10-24 CA CA002028442A patent/CA2028442A1/en not_active Abandoned
- 1990-10-30 US US07/605,376 patent/US5185225A/en not_active Expired - Fee Related
-
1992
- 1992-10-30 US US07/968,876 patent/US5326673A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR940007799B1 (ko) | 1994-08-25 |
EP0459055A3 (en) | 1992-05-27 |
AU629032B2 (en) | 1992-09-24 |
CA2028442A1 (en) | 1991-11-30 |
US5185225A (en) | 1993-02-09 |
AU6218190A (en) | 1991-12-05 |
US5326673A (en) | 1994-07-05 |
EP0459055A2 (en) | 1991-12-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
LAPS | Lapse due to unpaid annual fee |