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박막형 감열헤드(TPH) 제조방법Thin Film Thermal Head (TPH) Manufacturing Method
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제2도 (가)는 본 발명 박막형 감열헤드 구조도, (나) 및 (다)는 본 발명 설명을 위한 공정도.2 (a) is a structural diagram of the thin film type thermal head of the present invention, (b) and (c) is a process chart for explaining the present invention.
Claims (1)
알루미나기판(1)위에 글라즈드층(2)을 입힌 글라즈드 알루미나 기판위에 발열층(3') 및 도체층(4)을 증착하고, 포토레지스트(8)를 입힌 후 패턴닝하여 제조하는 박막형 감열헤드(TPH) 제조방법에 있어서, 상기 발열층(3')가 발열체를 Ta-Si로 하고, 상기 도체층(4)위의 포토레지스트(8)를 마스크로 하여 상기 발열층(3') 상부가 내마모, 내산화특성을 갖는 보호막(7)작용을 하도록 에노다이징 처리를 한후 상기 포토레지스트(8)를 제거하여 제조하는 것을 특징으로 하는 박막형 감열헤드(TPH)의 제조방법.A thin film type which is formed by depositing a heat generating layer 3 'and a conductor layer 4 on a glazed alumina substrate coated with a glazed layer 2 on an alumina substrate 1, applying a photoresist 8, and patterning the same. In the method of manufacturing a heat-sensitive head (TPH), the heat generating layer (3 ') is a heating element as Ta-Si, and the heat generating layer (3') using a photoresist (8) on the conductor layer (4) as a mask. A method of manufacturing a thin film type thermal head (TPH), characterized in that the photoresist (8) is removed after the anodizing treatment so that the upper part has a protective film (7) functioning to have abrasion resistance and oxidation resistance.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019900001602A1990-02-091990-02-09
Thin Film Thermal Head (TPH) Manufacturing Method
KR910015411A
(en)