KR910011850A - 4-치환 카르보닐 쿠마린 화합물 - Google Patents
4-치환 카르보닐 쿠마린 화합물Info
- Publication number
- KR910011850A KR910011850A KR1019900022129A KR900022129A KR910011850A KR 910011850 A KR910011850 A KR 910011850A KR 1019900022129 A KR1019900022129 A KR 1019900022129A KR 900022129 A KR900022129 A KR 900022129A KR 910011850 A KR910011850 A KR 910011850A
- Authority
- KR
- South Korea
- Prior art keywords
- group
- substituted
- hydrogen atom
- carbonylcoumarin
- compound
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
- C07D405/04—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D311/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
- C07D311/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
- C07D311/04—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring
- C07D311/06—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2
- C07D311/08—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2 not hydrogenated in the hetero ring
- C07D311/18—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2 not hydrogenated in the hetero ring substituted otherwise than in position 3 or 7
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D413/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms
- C07D413/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings
- C07D413/04—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings directly linked by a ring-member-to-ring-member bond
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D417/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00
- C07D417/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings
- C07D417/04—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings directly linked by a ring-member-to-ring-member bond
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Plural Heterocyclic Compounds (AREA)
- Pyrane Compounds (AREA)
Abstract
내용 없음.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
도면은, 실시예에서 얻어진 본 화합물의 IR흡수 스펙트럼을 나타낸다.
제1도는 실시예 1에서 합성한 3-(벤조티아조-2-일)-4-에톡시카르보닐-7-디에틸아미노쿠마린의 IR흡수 스펙트럼이다.
Claims (7)
- 하기 일반식(Ⅰ)로 표시되는 4-치환 카르보닐쿠마린 화합물상기식에서, R1,R2는 각각 같거나 또는 독립으로 수소원자, 알킬기, 알콕시알킬기, 알케닐기, 히드록시알킬기, 아르알킬기, 아릴기, 알콕시카르보닐알킬기를 나타내며, 상호 결합하거나, 골격내의 아미노기가 치환된 벤젠핵과 결합하여 환을 형성하여도 좋고, R3는 수소원자, 알킬기, 알콕시알킬기, 히드록시알킬기, 할로게노알킬기, 수산기, 알콕시기, 알콕시알콕시기, 알콕시카르보닐기, 술폰산기, 할로겐 원자를 나타내고, X는 수소원자 알킬기, 시크로알킬기, 알콕시기, 시크로알콕시기, 수산기, 아릴기, 알케닐기, 아릴옥시기, 알케닐옥시기, 아르알킬기, 아르알킬옥시기, 알콕시카르보닐알콕시기, 알킬카르보닐알콕시기, 또는 다음의 치환기를 나타낸다.(여기에서 R4, R5는 수소원자, 알킬기, 히드록시알킬기, 히드록시알콕시알킬기, 알콕시알킬기, 시크로알킬기를 나타내고, n, m은 각각 1-5의 정수이다) 또한 Y는 수소원자, 알킬카르보닐기, 알콕시카르보닐기, 아릴기, 아릴카르보닐기, 알릴옥시카르보닐기, 알콕시카르보닐 알킬카르보닐기, 알콕시카르보닐알콕시카르보닐기 또는 헤테로 환기를 나타낸다.
- 제1항에 있어서, X가 알콕시기, 시크로알콕시기, 수산기, 아릴기, 아릴옥시기, 알콕시옥시기, 아르알킬옥시기, 알콕시카르보닐알콕시기, 알킬카르보닐알콕시기와 구조식로 된 치환체로부터 선택됨을 특징으로 하는 4-치환 카르보닐쿠마린 화합물.
- 제1항에 있어서, X는 알콕시기, 시크로알콕시기, 수산기, 아릴기, 아릴옥시기, 알케닐옥시기, 아르알킬옥시기, 알콕시카르보닐알콕시기, 알킬카르보닐알콕시기와 구조식로 된 치환체로부터 선택되고 Y는 알킬카르보닐기이거나 헤테로사이클릭환임을 특징으로 하는 4-치환카르보닐 쿠마린 화합물.
- 제3항에 있어서, 헤테로사이클릭환은로부터 선택됨을 특징으로 하는 4-치환카르보닐쿠마린 화합물.
- 제2항에 있어서, 일반식(Ⅰ)에서 R1과 R2는 에틸, R3는 수소원자임을 특징으로 하는 4-치환카르보닐쿠마린 화합물.
- 제3항에 있어서, 일반식(Ⅰ)에서 R1과 R2는 에틸, R3는 수소원자임을 특징으로 하는 4-치환카르보닐쿠마린 화합물.
- 제4항에 있어서, 일반식(Ⅰ)에서 R1과 R2는 에틸, R3는 수소원자임을 특징으로 하는 4-치환카르보닐쿠마린 화합물.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33828289 | 1989-12-28 | ||
JP1-338282 | 1989-12-28 | ||
JP338282 | 1989-12-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR910011850A true KR910011850A (ko) | 1991-08-07 |
KR920010073B1 KR920010073B1 (ko) | 1992-11-13 |
Family
ID=18316657
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019900022129A KR920010073B1 (ko) | 1989-12-28 | 1990-12-28 | 4-치환 카르보닐 쿠마린 화합물 |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0435261B1 (ko) |
KR (1) | KR920010073B1 (ko) |
CA (1) | CA2032602C (ko) |
DE (1) | DE69025733T2 (ko) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4547579A (en) * | 1978-10-10 | 1985-10-15 | Ciba-Geigy Corporation | Substituted benzopyran compounds |
DE3329394A1 (de) * | 1983-08-13 | 1985-02-28 | Bayer Ag, 5090 Leverkusen | Chromogene und fluorogene carbonsaeureester, verfahren zu deren herstellung sowie verfahren und mittel zum nachweis und zur bestimmung von hydrolasen |
SE8505716D0 (sv) * | 1985-12-03 | 1985-12-03 | Biocarb Ab | Novel compounds and conjugates thereof |
-
1990
- 1990-12-18 CA CA002032602A patent/CA2032602C/en not_active Expired - Fee Related
- 1990-12-27 EP EP90125520A patent/EP0435261B1/en not_active Expired - Lifetime
- 1990-12-27 DE DE69025733T patent/DE69025733T2/de not_active Expired - Fee Related
- 1990-12-28 KR KR1019900022129A patent/KR920010073B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE69025733D1 (de) | 1996-04-11 |
CA2032602C (en) | 2001-12-25 |
DE69025733T2 (de) | 1996-09-19 |
EP0435261A3 (en) | 1991-12-11 |
CA2032602A1 (en) | 1991-06-29 |
EP0435261B1 (en) | 1996-03-06 |
KR920010073B1 (ko) | 1992-11-13 |
EP0435261A2 (en) | 1991-07-03 |
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