KR900017909A - 구형의 친수성 규산, 이의 제조방법 및 이의 용도 - Google Patents
구형의 친수성 규산, 이의 제조방법 및 이의 용도 Download PDFInfo
- Publication number
- KR900017909A KR900017909A KR1019890006567A KR890006567A KR900017909A KR 900017909 A KR900017909 A KR 900017909A KR 1019890006567 A KR1019890006567 A KR 1019890006567A KR 890006567 A KR890006567 A KR 890006567A KR 900017909 A KR900017909 A KR 900017909A
- Authority
- KR
- South Korea
- Prior art keywords
- silicic acid
- hydrophilic silicic
- spherical hydrophilic
- temperature
- spherical
- Prior art date
Links
- 235000012239 silicon dioxide Nutrition 0.000 title claims description 6
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 title claims 5
- 238000002360 preparation method Methods 0.000 title 1
- 239000002245 particle Substances 0.000 claims description 5
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 claims 1
- 239000007795 chemical reaction product Substances 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 239000000945 filler Substances 0.000 claims 1
- 239000011888 foil Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 238000004806 packaging method and process Methods 0.000 claims 1
- 239000011148 porous material Substances 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 239000005049 silicon tetrachloride Substances 0.000 claims 1
- 239000002912 waste gas Substances 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/02—Amorphous compounds
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/30—Particle morphology extending in three dimensions
- C01P2004/32—Spheres
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/51—Particles with a specific particle size distribution
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/90—Other properties not specified above
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 이산화규소의 입자크기 분포도이다.
Claims (4)
- 입자크기가 0.5 내지 10㎛, 바람직하게는 0.5 내지 4㎛, 특히 바람직하게는 1내지 3㎛이고 BET-표면적이 <50㎡/g, 바람직하게는 1내지 10㎡/g인 내공(inner pore)이 없는 치밀하고 딱딱한 비결정성 입자로 구성된 구형의 친수성 규산.
- 수증기 및 가스상의 사염화 규소를 300 내지 400℃의 온도로 각각 가열하고, 두 성분을 300 내지 400℃의 온도에서 2 : 1 내지 8 : 1의 H2O : SiCI4몰비로 서로 혼합하여, 가스상의 혼합물을 600내지 1200℃온도로 가열시킨 좁은 예비반응관을 통과시킨후, 계속해서 600내지 1000℃, 바람직하게는 700내지 800℃로 가열시킨 반응관을 100㎜이상 H2O-컬럼의 저합하에>5초, 바람직하게는>9초 동안 통과시켜, 반응폐기가스로 부터 반응생성물을 분리시킴을 특징으로 하여, 입자크기가 0.5내지 10㎛, 바람직하게는 0.5내지 4㎛, 특히 바람직하게는 1내지3㎛이고 BET-표면적이 <50㎡/g, 바람직하게는 1내지 10㎡/g인 내공이 없는 치밀하고 딱딱한 비결정성 입자로 구성된 구형의 친수성 규산의 제조방법.
- 전자부품 포장용수지에 충진물로서 사용하기 위한, 제1항에 따른 구형의 친수성 규산의 용도.
- 플라스틱-박에 점착방지제로서 사용하기 위한. 제1항에 따른 구형의 친수성 규산의 용도.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3817045 | 1988-05-19 | ||
DEP3817045.0-41 | 1988-05-19 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR900017909A true KR900017909A (ko) | 1990-12-20 |
KR910004832B1 KR910004832B1 (ko) | 1991-07-13 |
Family
ID=6354684
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019890006567A KR910004832B1 (ko) | 1988-05-19 | 1989-05-17 | 구형의 친수성 규산, 이의 제조방법 및 이의 용도 |
Country Status (4)
Country | Link |
---|---|
US (1) | US4976943A (ko) |
JP (1) | JPH0238306A (ko) |
KR (1) | KR910004832B1 (ko) |
BR (1) | BR8902288A (ko) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1010672A1 (en) | 1998-12-17 | 2000-06-21 | PIRELLI CAVI E SISTEMI S.p.A. | Method and apparatus for forming an optical fiber preform by combustionless hydrolysis |
JP5640920B2 (ja) * | 2011-08-18 | 2014-12-17 | 信越化学工業株式会社 | チタニアドープ石英ガラス及びその製造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE13400C (de) * | R. SCHNEIDER in Düsseldorf | Neuerungen an dem durch Patent 108866 geschützten Mahlwerk mit konoidischem Läufer | ||
CA662036A (en) * | 1963-04-30 | L. Flemmert Gosta | Production of hydrophilic silicon dioxide | |
DE973859C (de) * | 1951-10-31 | 1960-06-30 | Dow Corning | Verfahren zur Herstellung feinverteilter hydrophober Kieselsaeure |
JPH01145317A (ja) * | 1987-12-01 | 1989-06-07 | Nippon Shokubai Kagaku Kogyo Co Ltd | 真球状シリカ微粒子の製法 |
-
1989
- 1989-05-12 US US07/351,054 patent/US4976943A/en not_active Expired - Fee Related
- 1989-05-17 KR KR1019890006567A patent/KR910004832B1/ko not_active IP Right Cessation
- 1989-05-17 BR BR898902288A patent/BR8902288A/pt not_active Application Discontinuation
- 1989-05-18 JP JP1123017A patent/JPH0238306A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
KR910004832B1 (ko) | 1991-07-13 |
US4976943A (en) | 1990-12-11 |
BR8902288A (pt) | 1990-01-09 |
JPH0563409B2 (ko) | 1993-09-10 |
JPH0238306A (ja) | 1990-02-07 |
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Date | Code | Title | Description |
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A201 | Request for examination | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 19940621 Year of fee payment: 4 |
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LAPS | Lapse due to unpaid annual fee |