KR900015261A - Wafer support jig and pressure reduction gas growth method using this jig - Google Patents
Wafer support jig and pressure reduction gas growth method using this jig Download PDFInfo
- Publication number
- KR900015261A KR900015261A KR1019890017771A KR890017771A KR900015261A KR 900015261 A KR900015261 A KR 900015261A KR 1019890017771 A KR1019890017771 A KR 1019890017771A KR 890017771 A KR890017771 A KR 890017771A KR 900015261 A KR900015261 A KR 900015261A
- Authority
- KR
- South Korea
- Prior art keywords
- jig
- ring
- support
- wafer
- pressure reduction
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
- H01L21/203—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy using physical deposition, e.g. vacuum deposition, sputtering
Abstract
내용 없음.No content.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제1도는 본 발명의 실시예를 나타내는 사시도,1 is a perspective view showing an embodiment of the present invention,
제2도와 제3도는 본 발명의 치구를 가로형 감압기상 성장장치에 적용할 경우의 측면도.2 and 3 are side views when the jig of the present invention is applied to the horizontal pressure reducer growth apparatus.
Claims (4)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP89-30891 | 1989-03-20 | ||
JP1989030891U JP2537563Y2 (en) | 1989-03-20 | 1989-03-20 | Vertical vacuum deposition equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
KR900015261A true KR900015261A (en) | 1990-10-26 |
Family
ID=31256340
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019890012753A KR920006572B1 (en) | 1989-03-20 | 1989-09-04 | Jig for wafer holder |
KR1019890017771A KR900015261A (en) | 1989-03-20 | 1989-12-01 | Wafer support jig and pressure reduction gas growth method using this jig |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019890012753A KR920006572B1 (en) | 1989-03-20 | 1989-09-04 | Jig for wafer holder |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP2537563Y2 (en) |
KR (2) | KR920006572B1 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100481829B1 (en) * | 1997-05-30 | 2005-07-04 | 삼성전자주식회사 | Wafer holding shield of semiconductor sputtering equipment |
JP3368852B2 (en) * | 1998-11-27 | 2003-01-20 | 株式会社村田製作所 | Method of forming laminated pattern |
EP1091391A1 (en) * | 1999-10-05 | 2001-04-11 | SICO Produktions- und Handelsges.m.b.H. | Wafers holding boat |
JP4526683B2 (en) * | 2000-10-31 | 2010-08-18 | 株式会社山形信越石英 | Quartz glass wafer support jig and manufacturing method thereof |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6089282U (en) * | 1983-11-28 | 1985-06-19 | 沖電気工業株式会社 | Susceptor for vapor phase growth |
JPH0715138Y2 (en) * | 1986-02-07 | 1995-04-10 | 信越石英株式会社 | Vertical storage jig |
JPS62142839U (en) * | 1986-03-04 | 1987-09-09 |
-
1989
- 1989-03-20 JP JP1989030891U patent/JP2537563Y2/en not_active Expired - Lifetime
- 1989-09-04 KR KR1019890012753A patent/KR920006572B1/en not_active IP Right Cessation
- 1989-12-01 KR KR1019890017771A patent/KR900015261A/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
JPH02122431U (en) | 1990-10-08 |
JP2537563Y2 (en) | 1997-06-04 |
KR920006572B1 (en) | 1992-08-08 |
KR910007098A (en) | 1991-04-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
WITB | Written withdrawal of application |