KR900002847A - 진공시스템용 정전기 집진기 - Google Patents

진공시스템용 정전기 집진기 Download PDF

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Publication number
KR900002847A
KR900002847A KR1019890010971A KR890010971A KR900002847A KR 900002847 A KR900002847 A KR 900002847A KR 1019890010971 A KR1019890010971 A KR 1019890010971A KR 890010971 A KR890010971 A KR 890010971A KR 900002847 A KR900002847 A KR 900002847A
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KR
South Korea
Prior art keywords
dielectric member
hub
dust
target surface
dust collector
Prior art date
Application number
KR1019890010971A
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English (en)
Other versions
KR910004447B1 (ko
Inventor
히로시 사에끼
준지 이께다
하지메 이시마루
Original Assignee
하지메 이시마루
다니이 아끼오
마쓰시다 덴끼 산교오 가부시기가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 하지메 이시마루, 다니이 아끼오, 마쓰시다 덴끼 산교오 가부시기가이샤 filed Critical 하지메 이시마루
Publication of KR900002847A publication Critical patent/KR900002847A/ko
Application granted granted Critical
Publication of KR910004447B1 publication Critical patent/KR910004447B1/ko

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
    • B03C3/02—Plant or installations having external electricity supply
    • B03C3/04—Plant or installations having external electricity supply dry type
    • B03C3/12—Plant or installations having external electricity supply dry type characterised by separation of ionising and collecting stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Particle Accelerators (AREA)
  • Cleaning In General (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Electrostatic Separation (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

내용 없음.

Description

진공시스템용 정전기 집진기
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제 1 도는 본 발명의 첫째특징에 따른 정전기 집진기의 부분단면도.
제 2 도는 본 발명의 둘째특징에 따른 정전기 집진기의 개략도.
* 도면의 주요부분에 대한 부호의 설명
1 : 진공실의 벽 2 : 전자총
3 : 필라멘트 9 : 기질
10 : 유전부재 13 : 분진
14 : 카세트.

Claims (2)

  1. 제거된 분진을 받는 표적면이 설치된 진공실을 밀폐한 벽 ; 분진이 음전하로 충전되도록 상기 표면사의 분진에 전자비임을 방출하기위한 전자비임방출수단 : 진공실에 설치되고 상기 표적면과 직면하는 수집면을 갖는 유전부재 ; 음전하의 분진이 상긴 수집면에 유인되게 상기 수집면에 양전위를 부여하는 수단으로 이루어짐을 특징으로 하는 정전기 집진기.
  2. 제 1 항에 있어서, 정전기 집진기가 상기 유전부재를 수용하고 첫째 및 둘째 허브와 상기 수집면에 양전위를 부여하는 전극을 포함하는 카세트 ; 상기 첫째 허브에서 둘째 허브로 공급되도록 상기 첫째 및 둘째 허브위를 지나는 상기 유전부재 : 상기 첫째 허브에서 둘째 허브로 상기 유전부재가 공급되는 경로의 코오스에서, 표적면과 직면하는 위치에 배치된 상기 전극 ; 상기 유전부재가 공급되도록 상기 둘째 허브를 구동하는 구동수단으로 이루어짐을 특징으로 하는, 상기 유전부재가 테이프와 같은 형상으로 형성되는 정전기 집진기.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019890010971A 1988-08-01 1989-08-01 진공시스템용 정전기 집진기 KR910004447B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP63192535A JP2656080B2 (ja) 1988-08-01 1988-08-01 静電集塵装置
JP88-192535 1988-08-01

Publications (2)

Publication Number Publication Date
KR900002847A true KR900002847A (ko) 1990-03-23
KR910004447B1 KR910004447B1 (ko) 1991-06-29

Family

ID=16292893

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890010971A KR910004447B1 (ko) 1988-08-01 1989-08-01 진공시스템용 정전기 집진기

Country Status (5)

Country Link
US (1) US4941224A (ko)
EP (1) EP0356684B1 (ko)
JP (1) JP2656080B2 (ko)
KR (1) KR910004447B1 (ko)
DE (1) DE68903078T2 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100393478B1 (ko) * 2000-03-29 2003-08-06 주식회사종근당 자가유화 매트릭스형 경점막·경피흡수제제

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US5125124A (en) * 1988-08-01 1992-06-30 Matsushita Electric Industrial Co., Ltd. Electrostatic dust collector for use in vacuum system
US5400465A (en) * 1994-03-30 1995-03-28 Home Care Industries, Inc. Vacuum cleaner with charge generator and bag therefor
US5762691A (en) * 1995-03-21 1998-06-09 Sikorsky Aircraft Corporation Aerodynamic-electrostatic particulate collection system
FI111475B (fi) * 1997-09-24 2003-07-31 Metso Paper Inc Menetelmä ja sovitelma sumun ja pölyn hallitsemiseksi paperin ja kartongin valmistuksessa ja jälkikäsittelyssä
FI105052B (fi) * 1998-07-08 2000-05-31 Valmet Corp Menetelmä paperin valmistamiseksi, sovitelma menetelmän toteuttamiseksi ja menetelmän avulla valmistettu paperituote
US20050210902A1 (en) 2004-02-18 2005-09-29 Sharper Image Corporation Electro-kinetic air transporter and/or conditioner devices with features for cleaning emitter electrodes
US7695690B2 (en) 1998-11-05 2010-04-13 Tessera, Inc. Air treatment apparatus having multiple downstream electrodes
US6176977B1 (en) 1998-11-05 2001-01-23 Sharper Image Corporation Electro-kinetic air transporter-conditioner
US20030206837A1 (en) 1998-11-05 2003-11-06 Taylor Charles E. Electro-kinetic air transporter and conditioner device with enhanced maintenance features and enhanced anti-microorganism capability
GB0300688D0 (en) * 2003-01-13 2003-02-12 Gallaher Ltd Contaminant removal device and method
US7724492B2 (en) 2003-09-05 2010-05-25 Tessera, Inc. Emitter electrode having a strip shape
US7906080B1 (en) 2003-09-05 2011-03-15 Sharper Image Acquisition Llc Air treatment apparatus having a liquid holder and a bipolar ionization device
US7767169B2 (en) 2003-12-11 2010-08-03 Sharper Image Acquisition Llc Electro-kinetic air transporter-conditioner system and method to oxidize volatile organic compounds
US20060016333A1 (en) 2004-07-23 2006-01-26 Sharper Image Corporation Air conditioner device with removable driver electrodes
JP2006222242A (ja) * 2005-02-10 2006-08-24 Tokyo Electron Ltd 半導体製造装置および製造方法
US7833322B2 (en) 2006-02-28 2010-11-16 Sharper Image Acquisition Llc Air treatment apparatus having a voltage control device responsive to current sensing
US20080157007A1 (en) * 2006-12-27 2008-07-03 Varian Semiconductor Equipment Associates, Inc. Active particle trapping for process control
US8092577B2 (en) 2008-12-19 2012-01-10 Steris Corporation Method and apparatus for removing gaseous or vaporous sterilants from a medium
TWI484055B (zh) * 2009-07-23 2015-05-11 Hon Hai Prec Ind Co Ltd 承載組件及使用該承載組件之鍍膜裝置
DE102017211316A1 (de) 2017-07-04 2019-01-10 MTU Aero Engines AG Turbomaschinen-Dichtring
CN111512238B (zh) * 2017-12-28 2024-01-30 Asml荷兰有限公司 从设备部件中移除污染物颗粒的设备和方法
DE102021207398A1 (de) 2021-07-13 2023-01-19 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Vorrichtung und Verfahren zur Beschichtung eines Substrates

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US4071334A (en) * 1974-08-29 1978-01-31 Maxwell Laboratories, Inc. Method and apparatus for precipitating particles from a gaseous effluent
DE3414121A1 (de) * 1984-04-14 1985-10-24 Brown, Boveri & Cie Ag, 6800 Mannheim Verfahren und vorrichtung zur reinigung von abgasen
US4744833A (en) * 1987-06-11 1988-05-17 International Business Machines Corporation Electrostatic removal of contaminants

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100393478B1 (ko) * 2000-03-29 2003-08-06 주식회사종근당 자가유화 매트릭스형 경점막·경피흡수제제

Also Published As

Publication number Publication date
EP0356684B1 (en) 1992-09-30
DE68903078D1 (de) 1992-11-05
DE68903078T2 (de) 1993-02-18
JPH0243980A (ja) 1990-02-14
EP0356684A2 (en) 1990-03-07
JP2656080B2 (ja) 1997-09-24
KR910004447B1 (ko) 1991-06-29
US4941224A (en) 1990-07-17
EP0356684A3 (en) 1990-04-04

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