KR900000863B1 - 심부 자외선 석판인쇄 내식막 조성물 및 그의 이용법 - Google Patents

심부 자외선 석판인쇄 내식막 조성물 및 그의 이용법 Download PDF

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Publication number
KR900000863B1
KR900000863B1 KR1019860002420A KR860002420A KR900000863B1 KR 900000863 B1 KR900000863 B1 KR 900000863B1 KR 1019860002420 A KR1019860002420 A KR 1019860002420A KR 860002420 A KR860002420 A KR 860002420A KR 900000863 B1 KR900000863 B1 KR 900000863B1
Authority
KR
South Korea
Prior art keywords
composition
film
solubilizer
cast film
castable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
KR1019860002420A
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English (en)
Korean (ko)
Other versions
KR860008476A (ko
Inventor
슈와로츠코프 죠즈
Original Assignee
제이. 티. 베이커 케미컬 컴퍼니
케네드 엘. 핏쉬맨
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 제이. 티. 베이커 케미컬 컴퍼니, 케네드 엘. 핏쉬맨 filed Critical 제이. 티. 베이커 케미컬 컴퍼니
Publication of KR860008476A publication Critical patent/KR860008476A/ko
Application granted granted Critical
Publication of KR900000863B1 publication Critical patent/KR900000863B1/ko
Expired legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/492—Photosoluble emulsions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/0163—Non ionic diazonium compounds, e.g. diazosulphonates; Precursors thereof, e.g. triazenes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR1019860002420A 1985-04-15 1986-03-31 심부 자외선 석판인쇄 내식막 조성물 및 그의 이용법 Expired KR900000863B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/723,273 US4624908A (en) 1985-04-15 1985-04-15 Deep ultra-violet lithographic resist composition and process of using
US723273 2000-11-27

Publications (2)

Publication Number Publication Date
KR860008476A KR860008476A (ko) 1986-11-15
KR900000863B1 true KR900000863B1 (ko) 1990-02-17

Family

ID=24905568

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019860002420A Expired KR900000863B1 (ko) 1985-04-15 1986-03-31 심부 자외선 석판인쇄 내식막 조성물 및 그의 이용법

Country Status (4)

Country Link
US (1) US4624908A (https=)
EP (1) EP0198674A3 (https=)
JP (1) JPS61240237A (https=)
KR (1) KR900000863B1 (https=)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4752551A (en) * 1986-10-02 1988-06-21 J. T. Baker Inc. Photosensitive solubilization inhibition agents, and deep ultra-violet lithographic resist compositions
US4808512A (en) * 1986-10-02 1989-02-28 J. T. Baker Inc. Process of deep ultra-violet imaging lithographic resist compositions
EP0271187B1 (en) * 1986-10-17 1995-12-20 Amdahl Corporation Split instruction and operand cache management
US5158855A (en) * 1987-09-24 1992-10-27 Hitachi, Ltd. α-diazoacetoacetates and photosensitive resin compositions containing the same
EP0319325A3 (en) * 1987-12-04 1990-12-27 Wako Pure Chemical Industries, Ltd. Photosensitive material and process for forming pattern using the same
US5169741A (en) * 1988-10-11 1992-12-08 Matsushita Electric Industrial Co., Ltd. Method for forming high sensitivity positive patterns employing a material containing a photosensitive compound having a diazo group, an alkaline-soluble polymer, a compound capable of adjusting the pH to 4 or less and a solvent
US4959293A (en) * 1988-10-28 1990-09-25 J. T. Baker, Inc. Deep UV photoresist with alkyl 2-diazo-1-ones as solubility modification agents
DE3837438A1 (de) * 1988-11-04 1990-05-10 Basf Ag Strahlungsempfindliches gemisch
DE3837513A1 (de) * 1988-11-04 1990-05-10 Basf Ag Strahlungsempfindliches gemisch
DE3900735A1 (de) * 1989-01-12 1990-07-26 Hoechst Ag Neue mehrfunktionelle (alpha)-diazo-(beta)-ketoester, verfahren zu ihrer herstellung und deren verwendung
US5039596A (en) * 1989-06-29 1991-08-13 Hoechst Celanese Corporation Deep u.v. photoresist process utilizing compositions containing polycyclic cyclopentane 2-diazo-1,3-dione
US5182185A (en) * 1989-06-29 1993-01-26 Hoechst Celanese Corporation Deep u.v. photoresist compositions containing 4-tert-butylstyrene/maleimide copolymer and polycyclic cyclopentane-2-diazo-1,3-dione and elements utilizing the compositions
EP0410256A1 (de) * 1989-07-26 1991-01-30 Siemens Aktiengesellschaft Lichtempfindliches Gemisch
DE4014648A1 (de) * 1990-05-08 1991-11-14 Hoechst Ag Positiv arbeitendes strahlungsempfindiches gemisch und strahlungsempfindliches aufzeichnungsmaterial fuer die belichtung mit duv-strahlung
DE4014649A1 (de) * 1990-05-08 1991-11-14 Hoechst Ag Neue mehrfunktionelle verbindungen mit (alpha)-diazo-ss-ketoester- und sulfonsaeureester-einheiten, verfahren zu ihrer herstellung und deren verwendung
GB9407511D0 (en) * 1994-04-15 1994-06-08 Smithkline Beecham Corp Compounds
US5876897A (en) * 1997-03-07 1999-03-02 Clariant Finance (Bvi) Limited Positive photoresists containing novel photoactive compounds
US7022452B2 (en) * 2002-09-04 2006-04-04 Agilent Technologies, Inc. Contrast enhanced photolithography

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL247406A (https=) * 1959-01-17
US4207107A (en) * 1978-08-23 1980-06-10 Rca Corporation Novel ortho-quinone diazide photoresist sensitizers
US4339522A (en) * 1979-06-18 1982-07-13 International Business Machines Corporation Ultra-violet lithographic resist composition and process
US4284706A (en) * 1979-12-03 1981-08-18 International Business Machines Corporation Lithographic resist composition for a lift-off process
US4522911A (en) * 1983-06-28 1985-06-11 International Business Machines Corporation Deep ultra-violet lithographic resists with diazohomotetramic acid compounds

Also Published As

Publication number Publication date
KR860008476A (ko) 1986-11-15
EP0198674A3 (en) 1987-09-02
US4624908A (en) 1986-11-25
JPS61240237A (ja) 1986-10-25
EP0198674A2 (en) 1986-10-22
JPH036495B2 (https=) 1991-01-30

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