KR890700264A - 레지스트 조성물을 회수, 재사용하기 위한 방법 및 장치 - Google Patents

레지스트 조성물을 회수, 재사용하기 위한 방법 및 장치

Info

Publication number
KR890700264A
KR890700264A KR1019880700846A KR880700846A KR890700264A KR 890700264 A KR890700264 A KR 890700264A KR 1019880700846 A KR1019880700846 A KR 1019880700846A KR 880700846 A KR880700846 A KR 880700846A KR 890700264 A KR890700264 A KR 890700264A
Authority
KR
South Korea
Prior art keywords
reusing
recovering
resist composition
resist
composition
Prior art date
Application number
KR1019880700846A
Other languages
English (en)
Other versions
KR950014608B1 (ko
Inventor
아사아끼 야마시타
키요토 모리
츠기오 사이토오
시로오 시마우치
Original Assignee
칸토오 카가쿠 가부시끼 가이샤 노자와 순타로오
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 칸토오 카가쿠 가부시끼 가이샤 노자와 순타로오 filed Critical 칸토오 카가쿠 가부시끼 가이샤 노자와 순타로오
Publication of KR890700264A publication Critical patent/KR890700264A/ko
Application granted granted Critical
Publication of KR950014608B1 publication Critical patent/KR950014608B1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/2496—Self-proportioning or correlating systems
    • Y10T137/2499—Mixture condition maintaining or sensing
    • Y10T137/2506—By viscosity or consistency

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
KR1019880700846A 1986-12-25 1987-12-25 레지스트 조성물을 회수, 재 사용하기 위한 방법 및 장치 KR950014608B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP30776786A JP2527318B2 (ja) 1986-12-25 1986-12-25 レジスト組成物を回収、再使用するための方法および装置
JP307767 1986-12-25
PCT/JP1987/001035 WO1988005179A1 (en) 1986-12-25 1987-12-25 Method and apparatus for recovering and reusing resist composition

Publications (2)

Publication Number Publication Date
KR890700264A true KR890700264A (ko) 1989-03-10
KR950014608B1 KR950014608B1 (ko) 1995-12-11

Family

ID=17973024

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019880700846A KR950014608B1 (ko) 1986-12-25 1987-12-25 레지스트 조성물을 회수, 재 사용하기 위한 방법 및 장치

Country Status (6)

Country Link
US (2) US4967782A (ko)
EP (1) EP0296249B1 (ko)
JP (1) JP2527318B2 (ko)
KR (1) KR950014608B1 (ko)
DE (1) DE3750475T2 (ko)
WO (1) WO1988005179A1 (ko)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5289222A (en) * 1992-06-26 1994-02-22 Semiconductor Systems, Inc. Drain arrangement for photoresist coating apparatus
JP3116297B2 (ja) * 1994-08-03 2000-12-11 東京エレクトロン株式会社 処理方法及び処理装置
TW306011B (ko) * 1995-04-19 1997-05-21 Tokyo Electron Co Ltd
JP3721016B2 (ja) 1999-09-30 2005-11-30 宮崎沖電気株式会社 レジスト処理装置
US6907432B1 (en) 2000-11-28 2005-06-14 Shipley Company, L.L.C. Method and system for recycling materials
KR20020065105A (ko) * 2001-02-05 2002-08-13 동안엔지니어링 주식회사 반도체 세정폐수 중 절삭가공 폐수에서 농축, 회수된실리콘 입자의 재활용 방법
US6740163B1 (en) * 2001-06-15 2004-05-25 Seagate Technology Llc Photoresist recirculation and viscosity control for dip coating applications
SG116641A1 (en) * 2004-04-26 2005-11-28 Matsushita Electric Ind Co Ltd Method and apparatus for recycling ultraviolet curing resin, and method for manufacturing optical recording medium using that recycling method.
KR101424275B1 (ko) * 2004-11-08 2014-08-13 브레우어 사이언스 인코포레이션 마이크로 전자공학적 제조 공정 중에 기판의 외부 에지를코팅하는 장치
JP2006210751A (ja) * 2005-01-31 2006-08-10 Mitsubishi Chemical Engineering Corp シンナーのリサイクル供給装置
JP2007072138A (ja) * 2005-09-06 2007-03-22 Tokyo Ohka Kogyo Co Ltd レジスト液製造方法及びこれを用いたレジスト膜
DE202005020274U1 (de) * 2005-12-23 2006-02-23 Bohnet, Saskia Beschichtungsanlage für Wafer
US10354858B2 (en) * 2013-12-31 2019-07-16 Texas Instruments Incorporated Process for forming PZT or PLZT thinfilms with low defectivity
CN108661987B (zh) * 2018-05-30 2020-01-03 雷沃重工股份有限公司 作用于液压系统的报警系统和方法
JP7050140B1 (ja) * 2020-12-21 2022-04-07 株式会社デンソーテン 調合装置および調合方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2711750A (en) * 1950-09-15 1955-06-28 Austin S Norcross Apparatus for controlling the viscosity of a processing liquid
US2848353A (en) * 1954-10-21 1958-08-19 Edward O Norris Method and apparatus for spraying articles including separation and recirculation of coating material
US2968638A (en) * 1959-02-18 1961-01-17 Joseph G Meckler Paint reclaiming
FR2175721B1 (ko) * 1972-03-13 1979-04-13 Parke Davis & Co
JPS5746544B2 (ko) * 1975-02-03 1982-10-04
JPS52118306A (en) * 1976-03-30 1977-10-04 Isao Tanaka Apparatus for recoverying resin left photoosensitive in molding photoosensitive resin printing plate
CA1163489A (en) * 1980-10-31 1984-03-13 David L. Atwell Process for making an imaging medium solution by heating a combination including a dye dispersion and a nitrocellulose solution
JPS57166721A (en) * 1981-04-06 1982-10-14 Nec Corp Surface acoustic wave dispersion type delay line
JPS57166033A (en) * 1981-04-06 1982-10-13 Toshiba Corp Applying device for resist with adjusting mechanism for quantity of exhaust gas
US4426877A (en) * 1982-03-03 1984-01-24 Srivatsa Sanjay R Method and apparatus for recovering oil from waste oil emulsion
JPS58166721A (ja) * 1982-03-29 1983-10-01 Oki Electric Ind Co Ltd 超高精度レジストスピナ
JPS599654A (ja) * 1982-07-09 1984-01-19 Hitachi Ltd フオトレジスト定温注入システム
DE3332457C2 (de) * 1983-09-08 1986-06-05 Wolfgang Dipl.-Ing. 8941 Memmingerberg Richter Verfahren zur Rückgewinnung von Lackiermaterial aus dem beim Spritzlackieren entstehenden Overspray und Anordnung zur Durchführung des Verfahrens

Also Published As

Publication number Publication date
JP2527318B2 (ja) 1996-08-21
DE3750475T2 (de) 1994-12-15
EP0296249A4 (en) 1991-01-16
WO1988005179A1 (en) 1988-07-14
US5084483A (en) 1992-01-28
EP0296249A1 (en) 1988-12-28
DE3750475D1 (de) 1994-10-06
EP0296249B1 (en) 1994-08-31
KR950014608B1 (ko) 1995-12-11
US4967782A (en) 1990-11-06
JPS63161453A (ja) 1988-07-05

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