KR890010043A - 폴리실록사잔, 그의 제조방법 및 그의 세라믹 전구체로서의 용도, 및 상기 세라믹 - Google Patents

폴리실록사잔, 그의 제조방법 및 그의 세라믹 전구체로서의 용도, 및 상기 세라믹 Download PDF

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KR890010043A
KR890010043A KR1019880017669A KR880017669A KR890010043A KR 890010043 A KR890010043 A KR 890010043A KR 1019880017669 A KR1019880017669 A KR 1019880017669A KR 880017669 A KR880017669 A KR 880017669A KR 890010043 A KR890010043 A KR 890010043A
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hydrazine
polysiloxane
group
moles
producing
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KR1019880017669A
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크리스띠앙 꼴롱비에
뀌에쟝-피에르
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미셀 로세
소시에떼 이토샹
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Publication of KR890010043A publication Critical patent/KR890010043A/ko

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/54—Nitrogen-containing linkages
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/56—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides
    • C04B35/565—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on silicon carbide
    • C04B35/571—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on silicon carbide obtained from Si-containing polymer precursors or organosilicon monomers
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
    • C04B35/584—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride
    • C04B35/589—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride obtained from Si-containing polymer precursors or organosilicon monomers

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Silicon Polymers (AREA)
  • Ceramic Products (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)

Abstract

내용 없음

Description

폴리실록사잔, 그의 제조방법 및 그의 세라믹 전구체로서의 용도, 및 상기 세라믹
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (14)

  1. 하기식(Ⅱ)의 단위 및 필요하다면 하기식(Ⅲ)의 단위, 및 필요하다면 하기식(Ⅳ)의 단위와 조합된 하기식(Ⅰ)의 단위로 구성되고 분자량이 350 이상임을 특징으로 하는 신규 폴리실록사잔류.
    상기식중, R1및 R2,R3및 R4는 동일 또는 상이하고, 수소원자, 포화 또는 불포화 지방족 탄화수소기 또는 단일-또는 다고리 아릴, 알킬아릴 또는 아릴알킬기이다.
  2. 제1항에 있어서, 분자량이 400내지 50,000이고, 바람직하기로는 400 내지 10,000인 폴리실록사잔류.
  3. 제1 또는 2항에 있어서, R1및 R2,R3및 R4가 메틸, 에틸, 프로필, 부틸, 펜틸, 헥실, 헵틸 또는 옥틸기와 같은 탄소수 1 내지 8의 포화 지방족 탄화수소기, 비닐 또는 알릴과 같은 불포화기, 시클로프로필, 시클로부틸, 시클로펜틸, 시클로헥실 또는 시클로헵틸기와 같은 탄소수 3내지 7을 함유하는 지방족고리기, 또는 페닐, 벤질, 페닐에틸, 토릴, 크실릴 또는 나프틸기로 구성되는 군에서 선택된 기를 나타내는 폴리실록사잔류.
  4. 제1 내지 3항중의 어느 하나에 있어서, R1및 R2가 수소원자 또는 메틸, 에틸, 비닐 또는 페닐기이고, R3및 R4기가 수소원자인 폴리실록사잔류.
  5. 하기식(Ⅴ)의 적어도 하나의 할로실란과 하기식(Ⅵ)의 적어도 하나의 히드라진 및 물을 반응시킴을 특징으로 하는 제1내지 4항중의 어는 하나에 따른 폴리실록사잔류의 제조방법.
    상기식중, R1및 R2,R3및 R4는 동일 또는 상이하고, 수소원자, 포화 또는 불포화 지방족 탄화수소기 또는 단일- 또는 다고리 아릴, 아킬아릴 또는 아릴알킬기이고, Y는 할로겐원자, 특히 염소이고, (a+b)는 0 내지 3의 수, 바람직하기로는 약 2이다.
  6. 제5항에 있어서, 할로실란이 하기식의 생성물로 구성되는 군에서 선택되는 폴리실록사잔류의 제조방법.
  7. 제5 또는 6항에 있어서, 히드라잔이 비치환된 히드라진(N2H4), 메틸히드라진, 에틸히드라진, 페닐히드라진, 시클로헥실히드라진, 1,2-디메틸히드라진, 1,2-디에틸히드라진, 1,2-디페닐히드라진, 1,2-디벤질히드라진,-나프틸히드라진, 1,2-디이소프로필히드라진, 1,2-디톨릴히드라진, 1,2-디이소부틸히드라진, (2,3-디메틸페닐)히드라진 및 1,2-디(-나프틸)히드라진으로 구성되는 군에서 선택되는 폴리실록사잔류의 제조방법.
  8. 제5 내지 7항중의 어느 하나에 있어서, 히드라진(Ⅵ)과 물이 히드라진의 몰수에 첨가되는 물의 몰수가 실리콘 원자의 몰수에 첨가되는 할로겐원자 Y의 몰수보다 큰 양으로 사용되는 폴리실록사잔류의 제조방법.
  9. 제5 내지 9항중의 어느 하나에 있어서, 반응이 t-아민의 존재하에서 수행되는 폴리실록사잔류의 제조방법.
  10. 제9항에 있어서, 물의 몰수에 첨가되는 히드라진의 몰수가 실리콘 원자의 몰수보다 큰 폴리실록사잔류의 제조방법.
  11. 제10항에 있어서, 히드라진(Ⅵ) 단위몰당 물 0.05내지 1몰이 사용되는 폴리실록사잔류의 제조방법.
  12. 제9 내지 11항중의 어느 하나에 있어서, t-아민이 트리에틸아민, 트리메틸아민 트리페닐아민 및 피리딘으로 구성되는 군에서 선택된 폴리실록사잔류의 제조방법.
  13. 섬유, 필라멘트, 분말, 필름, 덮개, 플레이크, 도관, 기포제 또는 직조 또는 비직조 성형품과 같은 성형품 또는 복합재료의 형태인 제1 내지 4항중의 어느 하나에 따른 폴리실록사잔류.
  14. 하기 비율(중량 %)의 성분을 함유하고 제13항에 따른 폴리실록사잔류를 적어도 700℃에서 역분해시켜 수득함을 특징으로 하는 세라믹 성형품.
    -30 내지 70%의 Si -2 내지 30% N -1 내지 25%의 O- 0 내지 35%의 C
    ※참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019880017669A 1987-12-28 1988-12-28 폴리실록사잔, 그의 제조방법 및 그의 세라믹 전구체로서의 용도, 및 상기 세라믹 KR890010043A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR62-18215 1987-12-28
FR8718215A FR2625211A1 (fr) 1987-12-28 1987-12-28 Polysiloxazanes, leur procede de preparation, leur utilisation comme precurseurs de ceramiques et lesdites ceramiques

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KR890010043A true KR890010043A (ko) 1989-08-05

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US (1) US5010158A (ko)
EP (1) EP0327773B1 (ko)
JP (1) JPH0618886B2 (ko)
KR (1) KR890010043A (ko)
CN (2) CN1034558A (ko)
AT (1) ATE113629T1 (ko)
AU (1) AU612217B2 (ko)
CA (1) CA1331195C (ko)
DE (1) DE3852020D1 (ko)
DK (1) DK723588A (ko)
FR (1) FR2625211A1 (ko)
NO (1) NO172499C (ko)

Cited By (2)

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Publication number Priority date Publication date Assignee Title
US8058711B2 (en) 2009-12-02 2011-11-15 Cheil Industries, Inc. Filler for filling a gap and method for manufacturing semiconductor capacitor using the same
US9890255B2 (en) 2012-12-31 2018-02-13 Cheil Industries, Inc. Modified hydrogenated polysiloxazane, composition comprising same for forming silica-based insulation layer, method for preparing composition for forming

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US5128494A (en) * 1985-04-26 1992-07-07 Sri International Hydridosiloxanes as precursors to ceramic products
US5120686A (en) * 1985-12-20 1992-06-09 The Dexter Corporation Method of preparing a polysilazane
FR2635528A1 (fr) * 1988-08-17 1990-02-23 Atochem Procede de preparation de polyhydrosilazanes derives d'hydrazine et l'utilisation desdits silazanes comme precurseurs de ceramique
FR2653131A1 (fr) * 1989-10-17 1991-04-19 Rhone Poulenc Chimie Procede de preparation de polyorganosilazane de masse moleculaire elevee.
EP0426529A1 (fr) * 1989-10-31 1991-05-08 Elf Atochem S.A. Revêtements en céramique, procédé de fabrication desdits revêtements et substrats ainsi revêtus
US5256487A (en) * 1989-12-08 1993-10-26 The B. F. Goodrich Company High char yield silazane derived preceramic polymers and cured compositions thereof
JPH0468027A (ja) * 1990-07-09 1992-03-03 Shin Etsu Chem Co Ltd 有機シラザン重合体の製造方法及び該重合体を用いたセラミックスの製造方法
US5329000A (en) * 1991-10-31 1994-07-12 Becton, Dickinson And Company Purification of DNA with silicon tetrahydrazide
FR2693204A1 (fr) * 1992-08-27 1994-01-07 Atochem Elf Sa Procédé de préparation en milieu solvant de polysilylhydrazines.
AU669398B2 (en) * 1992-11-13 1996-06-06 Becton Dickinson & Company Boron silicates aluminum silicates phosphosilicates and purification of DNA
US5571848A (en) * 1995-01-20 1996-11-05 Massachusetts Institute Of Technology, A Ma Corp. Method for producing a microcellular foam
KR100600631B1 (ko) * 1998-04-24 2006-07-13 쇼쿠바이가세고교 가부시키가이샤 저유전율 실리카계 피막 형성용 도포액 및 저유전율피막으로 도포된 기재
US6755366B2 (en) 2002-09-30 2004-06-29 Solutia Inc. Device for direct insertion of yarn in automatic winder
US7122222B2 (en) * 2003-01-23 2006-10-17 Air Products And Chemicals, Inc. Precursors for depositing silicon containing films and processes thereof
US20040164251A1 (en) * 2003-02-26 2004-08-26 Bergh Rudy Van Den Storage phosphor panel, radiation image sensor and methods of making the same
US20140322486A1 (en) * 2013-04-30 2014-10-30 Shigeto Kobori Method for preparing modified silica film, coating liquid for the same and modified silica film prepared from the same

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DE2218960A1 (de) * 1972-04-19 1973-11-08 Bayer Ag Formkoerper aus mogenen mischungen von siliciumcarbid und siliciumnitrid und verfahren zu ihrer erstellung
US4612383A (en) * 1985-04-26 1986-09-16 S R I International Method of producing polysilazanes
US4788309A (en) * 1985-04-26 1988-11-29 Sri International Method of forming compounds having Si-N groups and resulting products
JPH0618885B2 (ja) * 1986-02-12 1994-03-16 東燃株式会社 ポリシロキサザンおよびその製法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8058711B2 (en) 2009-12-02 2011-11-15 Cheil Industries, Inc. Filler for filling a gap and method for manufacturing semiconductor capacitor using the same
US9890255B2 (en) 2012-12-31 2018-02-13 Cheil Industries, Inc. Modified hydrogenated polysiloxazane, composition comprising same for forming silica-based insulation layer, method for preparing composition for forming

Also Published As

Publication number Publication date
FR2625211A1 (fr) 1989-06-30
DK723588A (da) 1989-06-29
JPH01213339A (ja) 1989-08-28
NO172499B (no) 1993-04-19
NO885239D0 (no) 1988-11-24
AU2748988A (en) 1989-06-29
CN1063477A (zh) 1992-08-12
AU612217B2 (en) 1991-07-04
ATE113629T1 (de) 1994-11-15
DK723588D0 (da) 1988-12-27
US5010158A (en) 1991-04-23
DE3852020D1 (de) 1994-12-08
NO885239L (no) 1989-06-29
NO172499C (no) 1993-07-28
EP0327773A1 (fr) 1989-08-16
CA1331195C (fr) 1994-08-02
EP0327773B1 (fr) 1994-11-02
JPH0618886B2 (ja) 1994-03-16
CN1034558A (zh) 1989-08-09

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