KR890006852A - 할로겐화 탄화수소를 매질로 하는 복합인산염화 조성물 - Google Patents
할로겐화 탄화수소를 매질로 하는 복합인산염화 조성물 Download PDFInfo
- Publication number
- KR890006852A KR890006852A KR1019880013589A KR880013589A KR890006852A KR 890006852 A KR890006852 A KR 890006852A KR 1019880013589 A KR1019880013589 A KR 1019880013589A KR 880013589 A KR880013589 A KR 880013589A KR 890006852 A KR890006852 A KR 890006852A
- Authority
- KR
- South Korea
- Prior art keywords
- weight
- parts
- halogenated hydrocarbons
- limit
- phosphate compositions
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
- C23F11/167—Phosphorus-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/02—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using non-aqueous solutions
- C23C22/03—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using non-aqueous solutions containing phosphorus compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Chemical Treatment Of Metals (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (1)
- 할로겐화탄화수소 용매 100중량부와, 인산 0.1내지 7중량부 물 0.2중량부 이상, 균일상 형성 한계까지 가용화 용매 110중량부 이하 질소 함유 유기 화합물 0 내지 22중량부 이하 비양자성 극성 유기 화합물 0 내지 33중량부 이하 폴리페놀 수지 0.1중량부 이상 작업 가능 점도 한계까지를 함유하는 인산 염화 처리 조성물.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62-262837 | 1987-10-20 | ||
JP62262837A JPH01108385A (ja) | 1987-10-20 | 1987-10-20 | ハロゲン化炭化水素を媒質とする複合リン酸塩化組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR890006852A true KR890006852A (ko) | 1989-06-16 |
KR930001014B1 KR930001014B1 (ko) | 1993-02-12 |
Family
ID=17381306
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019880013589A KR930001014B1 (ko) | 1987-10-20 | 1988-10-19 | 할로겐화 탄화수소를 매질로 하는 복합 인산염화 조성물 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPH01108385A (ko) |
KR (1) | KR930001014B1 (ko) |
-
1987
- 1987-10-20 JP JP62262837A patent/JPH01108385A/ja active Granted
-
1988
- 1988-10-19 KR KR1019880013589A patent/KR930001014B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR930001014B1 (ko) | 1993-02-12 |
JPH0553874B2 (ko) | 1993-08-11 |
JPH01108385A (ja) | 1989-04-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR870010123A (ko) | 내충격성 폴리아미드 성형 재료 | |
KR880005206A (ko) | 폴리에스테르 수지조성물 | |
KR900009935A (ko) | 액정 조성물 | |
KR890008086A (ko) | 사이클로헥산 유도체 | |
KR840004509A (ko) | 옥시캄 유도체를 함유하는 제약조성물과 그 제조방법 | |
KR880012590A (ko) | 신규 함질소 화합물 | |
KR870006137A (ko) | 폴리에스테르 조성물 | |
KR910016860A (ko) | 유기 폴리이소시아네이트의 안정화 방법 | |
KR880008980A (ko) | 안트라퀴논 화합물 및 이를 함유하는 편광 필름 | |
KR840004760A (ko) | 셀레늄 유기화합물의 제조방법 | |
KR880001764A (ko) | 열가소성 폴리에스테르 수지조성물 | |
KR890006852A (ko) | 할로겐화 탄화수소를 매질로 하는 복합인산염화 조성물 | |
KR890015319A (ko) | 잔해 콘덴서용 전해액 | |
KR880001744A (ko) | 내방사선성 폴리올레핀 조성물 | |
KR890004994A (ko) | 신규 백금 착화합물 | |
KR850005462A (ko) | 에폭시 수지의 경화방법 | |
KR910014446A (ko) | 폴리프로필렌계 수지 조성물 | |
KR870000413A (ko) | 윤활유 조성물 | |
KR870002203A (ko) | 폴리아미드 조성물 | |
KR880009087A (ko) | 에폭시 수지 조성물 | |
KR870008952A (ko) | 폴리아세탈 조성물 | |
KR910012071A (ko) | 폴리에틸렌 테레프탈레이트 수지조성물 | |
KR830003869A (ko) | 안정화된 고체형상 농약조성물 | |
KR850005861A (ko) | 에폭시수지 조성물 | |
KR840001529A (ko) | 불로운 유지방수제 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 19990109 Year of fee payment: 7 |
|
LAPS | Lapse due to unpaid annual fee |