KR890005128A - 유기금속-함유 화합물 - Google Patents
유기금속-함유 화합물 Download PDFInfo
- Publication number
- KR890005128A KR890005128A KR1019880011577A KR880011577A KR890005128A KR 890005128 A KR890005128 A KR 890005128A KR 1019880011577 A KR1019880011577 A KR 1019880011577A KR 880011577 A KR880011577 A KR 880011577A KR 890005128 A KR890005128 A KR 890005128A
- Authority
- KR
- South Korea
- Prior art keywords
- formula
- compound
- organometallic
- methyl
- hydrogen
- Prior art date
Links
- 150000001875 compounds Chemical class 0.000 title claims 12
- 125000002524 organometallic group Chemical group 0.000 claims 7
- 150000003440 styrenes Chemical class 0.000 claims 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 5
- 229910052739 hydrogen Inorganic materials 0.000 claims 4
- 239000001257 hydrogen Substances 0.000 claims 4
- 150000001728 carbonyl compounds Chemical class 0.000 claims 3
- FZFAMSAMCHXGEF-UHFFFAOYSA-N chloro formate Chemical compound ClOC=O FZFAMSAMCHXGEF-UHFFFAOYSA-N 0.000 claims 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims 2
- AOGYCOYQMAVAFD-UHFFFAOYSA-N chlorocarbonic acid Chemical class OC(Cl)=O AOGYCOYQMAVAFD-UHFFFAOYSA-N 0.000 claims 2
- 150000002431 hydrogen Chemical class 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 2
- 229910052717 sulfur Inorganic materials 0.000 claims 2
- CDIYNUQGXSNSNJ-UHFFFAOYSA-N 1,1-bis(trimethylsilyl)ethyl (4-prop-1-en-2-ylphenyl) carbonate Chemical compound CC(=C)C1=CC=C(OC(=O)OC(C)([Si](C)(C)C)[Si](C)(C)C)C=C1 CDIYNUQGXSNSNJ-UHFFFAOYSA-N 0.000 claims 1
- -1 4-nitrophenoxy Chemical group 0.000 claims 1
- VRGSUEDEJCAJDN-UHFFFAOYSA-N [P].C=CC1=CC=CC=C1 Chemical class [P].C=CC1=CC=CC=C1 VRGSUEDEJCAJDN-UHFFFAOYSA-N 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 claims 1
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000010534 nucleophilic substitution reaction Methods 0.000 claims 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
- G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
- C07F7/0812—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te comprising a heterocyclic ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F30/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
- C08F30/04—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (13)
- 하기식(Ⅰ)의 유기금속-함유 스티렌 유도체.상기식에서, R1내지R6는 독립적으로 C1-C4알킬, C1-C4알콕시, 페닐, 벤질, 페녹시, 기-M(R8)3또는이거나 또는 R3와 R4는 함께이고 또 R1내지 R3는 또한 수소원자일 수 있고 R7은 수소 또는 C1-C4알킬이고, R8은 C1-C4알킬, C1-C4알콕시, 페닐, 벤질 또는 페녹시이며, M은 Si, Ge, Sn, CH2Si 또는 OSi이고 X는 O,S 또는 NH이며 a는 0 또는 1, b는 1 내지 6의 정수이고 c는 3 내지 6의 정수이다.
- 제1항에 있어서, M이 CH2Si, OSi 또는 Si인 스티렌 유도체.
- 제1항에 있어서, X가 S 또는 O인 스티렌 유도체.
- 제1항에 있어서, R1내지 R2가 각각 수소이고, R3가 메틸 또는 Si(CH3)3이고 R4내지 R6가 각각 메틸 또는 R3와 R4가 함께또는인 스티렌 유도체.
- 제4항에 있어서, R1과 R2가 각각 수소이고, R3가 메틸 또는 Si(CH3)3이고 R4내지 R6는 각각 메틸인 스티렌 유도체.
- 제1항에 있어서, a는 0이며 R7은 수소 또는 메틸인 스티렌 유도체.
- 제1항에 있어서, 4-(2´-트리메틸실릴-2´-프로폭시카르보닐옥시)-스티렌, 4-(2´-트리메틸실릴-2´-프로폭시카르보닐옥시)-α-메틸스티렌과 4-(1´,1´-비스트리메틸실릴에톡시카르보닐옥시)-α-메틸스티렌인 화합물.
- a)하기식(Ⅱ)의 유기금속-함유 알코올과 하기식(Ⅲa)의 클로로로포름산 유도체를 직접 반응시키거나 또는 하기식(Ⅴ)의 유기금속-함유 클로로포르메이트와 하기식(Ⅵa)의 화합물과 직접 반응시키거나 또는 b)하기식(Ⅱ)의 유기금속-함유 알코올과 하기식(Ⅲb)의 클로로포름산 유도체와 반응시켜 하기식(Ⅳ)의 카르보닐 화합물을 얻거나 또는 하기식(Ⅴ)의 유기금속-함유 클로로포르메이트와 하기식(Ⅵb)의 화합물과 반응시켜 하기식(Ⅳ)의 화합물을 얻고 이어서 하기식(Ⅳ)의 카르보닐화합물과 인 일리드와의 위티히 반응을 수행하여 제1항에 따른 일반식(Ⅰ)의 유기름속-함유 스티렌 유도체를 제조하는 방법.상기 식들에서 R6내지 R7, M,X와 a는 상기 정의한 바와 같다.
- 하기식(Ⅳ)의 유기금속-함유 화합물.상기 식에서, R1내지 R7, M,X 및 a는 제1항에서 정의한 바와 같다.
- 하기식(Ⅶ)의 유기금속-함유 화합물.상기 식에서, R1내지 R7와 M은 제1항에서 정의한 바와 같고 Y는 친핵적 치환에 적합한 이탈기이다.
- 제10항에 있어서, Y가 1- 이미다졸릴라디칼 또는 하기식(Ⅷ)의 기인 화합물.상기 식에서 R9은 할로겐, NO2, CN 또는 CF3이며 d는 1 내지 5의 정수이다.
- 제11항에 있어서, 식(Ⅷ)의 기가 4-니트로페녹시인 화합물.
- 제8항의 식(Ⅴ)의 유기금속-함유 클로로포르메이트와 하기식(Ⅸ)의 화합물과 하기식(XI)의 카르보닐 화합물과 반응시켜 제10항에 따른 하기식(XII)의 화합물을 제조하는 방법.상기 식들에서 Y는 제9항에서 정의된 바와 같다.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH03425/87-2 | 1987-09-07 | ||
| CH342587 | 1987-09-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR890005128A true KR890005128A (ko) | 1989-05-11 |
Family
ID=4255706
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019880011577A KR890005128A (ko) | 1987-09-07 | 1988-09-07 | 유기금속-함유 화합물 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4916247A (ko) |
| EP (1) | EP0307356A3 (ko) |
| JP (1) | JPH01100179A (ko) |
| KR (1) | KR890005128A (ko) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5329034A (en) * | 1990-08-09 | 1994-07-12 | Sagami Chemical Research Center | Silanol compounds, polymerizable monomers and polymers having mesogenic groups |
| ATE218905T1 (de) * | 1994-03-25 | 2002-06-15 | Novartis Erfind Verwalt Gmbh | Licht-diffusor und herstellungsverfahren eines licht-diffusors |
| US6358675B1 (en) * | 1998-10-02 | 2002-03-19 | 3M Innovative Properties Company | Silicon-containing alcohols and polymers having silicon-containing tertiary ester groups made therefrom |
| US6171757B1 (en) | 1999-07-12 | 2001-01-09 | International Business Machines Corporation | Organometallic polymers and use thereof |
| MY143187A (en) * | 2005-03-23 | 2011-03-31 | Ciba Holding Inc | Coating compositions for marking substrates |
| US8642504B2 (en) * | 2005-07-25 | 2014-02-04 | Gill Jennings & Every Llp | Aqueous and transparent coatings for marking substrates |
| JP5581208B2 (ja) * | 2007-07-18 | 2014-08-27 | データレース リミテッド | レーザー感受性被覆配合物 |
| ATE527327T1 (de) * | 2007-07-18 | 2011-10-15 | Datalase Ltd | Beschichtungszusammensetzungen |
| US8853314B2 (en) | 2008-10-23 | 2014-10-07 | Datalase Ltd. | Heat absorbing additives |
| EP2342295A1 (en) | 2008-10-27 | 2011-07-13 | DataLase Ltd | Coating composition for marking substrates |
| GB0906756D0 (en) * | 2009-04-20 | 2009-06-03 | Givaudan Sa | Alpha-silyl alcohols possessing olfactory properties reminiscent of patchouli oil |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2840603A (en) * | 1956-10-12 | 1958-06-24 | Dow Chemical Co | Vinylphenyl aliphatic aminocarboxylic acids |
| US3321361A (en) * | 1964-04-06 | 1967-05-23 | Stauffer Chemical Co | Acaricidal method |
| DE1795262B2 (de) * | 1968-08-30 | 1972-12-07 | Farbwerke Hoechst AG, vormals Mei ster Lucius & Bruning, 6000 Frankfurt | Verfahren zur herstellung von fluor- und siliciumhaltigen polykondensaten |
| DE3141860A1 (de) * | 1981-10-22 | 1983-05-05 | Bayer Ag, 5090 Leverkusen | Trifluormethyl-phenoxy-phenyl-silicium-derivate, verfahren zu ihrer herstellung und ihre verwendung als herbizide und pflanzenwuchsregulatoren |
| US4491628A (en) * | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
| FR2570844B1 (fr) * | 1984-09-21 | 1986-11-14 | Commissariat Energie Atomique | Film photosensible a base de polymere silicie et son utilisation comme resine de masquage dans un procede de lithographie |
-
1988
- 1988-08-29 US US07/237,473 patent/US4916247A/en not_active Expired - Fee Related
- 1988-08-30 EP EP19880810597 patent/EP0307356A3/de not_active Withdrawn
- 1988-09-07 JP JP63224365A patent/JPH01100179A/ja active Pending
- 1988-09-07 KR KR1019880011577A patent/KR890005128A/ko not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01100179A (ja) | 1989-04-18 |
| EP0307356A2 (de) | 1989-03-15 |
| US4916247A (en) | 1990-04-10 |
| EP0307356A3 (de) | 1990-11-22 |
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| WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |