KR880013190A - 초전도 세라믹패턴과 그 제조방법 - Google Patents

초전도 세라믹패턴과 그 제조방법

Info

Publication number
KR880013190A
KR880013190A KR1019880004307A KR880004307A KR880013190A KR 880013190 A KR880013190 A KR 880013190A KR 1019880004307 A KR1019880004307 A KR 1019880004307A KR 880004307 A KR880004307 A KR 880004307A KR 880013190 A KR880013190 A KR 880013190A
Authority
KR
South Korea
Prior art keywords
manufacturing
superconducting ceramic
ceramic pattern
pattern
superconducting
Prior art date
Application number
KR1019880004307A
Other languages
English (en)
Other versions
KR910004994B1 (ko
Inventor
슌페이 야마자끼
Original Assignee
세미콘덕터에너지라보라터리 캄파니 리미티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26435026&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=KR880013190(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from JP62093733A external-priority patent/JPS63258083A/ja
Priority claimed from JP62093732A external-priority patent/JP2670554B2/ja
Application filed by 세미콘덕터에너지라보라터리 캄파니 리미티드 filed Critical 세미콘덕터에너지라보라터리 캄파니 리미티드
Publication of KR880013190A publication Critical patent/KR880013190A/ko
Application granted granted Critical
Publication of KR910004994B1 publication Critical patent/KR910004994B1/ko

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0661—Processes performed after copper oxide formation, e.g. patterning
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0381—Processes for depositing or forming copper oxide superconductor layers by evaporation, e.g. MBE
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0408—Processes for depositing or forming copper oxide superconductor layers by sputtering
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0884—Treatment of superconductor layers by irradiation, e.g. ion-beam, electron-beam, laser beam or X-rays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0912—Manufacture or treatment of Josephson-effect devices
    • H10N60/0941—Manufacture or treatment of Josephson-effect devices comprising high-Tc ceramic materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/10—Junction-based devices
    • H10N60/12—Josephson-effect devices
    • H10N60/124—Josephson-effect devices comprising high-Tc ceramic materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/80—Constructional details
    • H10N60/85—Superconducting active materials
    • H10N60/855—Ceramic superconductors
    • H10N60/857—Ceramic superconductors comprising copper oxide
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/901—Printed circuit
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/922—Static electricity metal bleed-off metallic stock
    • Y10S428/9265—Special properties
    • Y10S428/93—Electric superconducting
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/70—High TC, above 30 k, superconducting device, article, or structured stock
    • Y10S505/701—Coated or thin film device, i.e. active or passive
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/70—High TC, above 30 k, superconducting device, article, or structured stock
    • Y10S505/701—Coated or thin film device, i.e. active or passive
    • Y10S505/703—Microelectronic device with superconducting conduction line
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/70—High TC, above 30 k, superconducting device, article, or structured stock
    • Y10S505/706—Contact pads or leads bonded to superconductor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/73—Vacuum treating or coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/742—Annealing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24926—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including ceramic, glass, porcelain or quartz layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
KR1019880004307A 1987-04-15 1988-04-15 초전도 세라믹패턴과 그 제조방법 KR910004994B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP62093733A JPS63258083A (ja) 1987-04-15 1987-04-15 超電導材料の作製方法
JP62-93733 1987-04-15
JP62-93732 1987-04-15
JP62093732A JP2670554B2 (ja) 1987-04-15 1987-04-15 酸化物超電導材料の作製方法

Publications (2)

Publication Number Publication Date
KR880013190A true KR880013190A (ko) 1988-11-30
KR910004994B1 KR910004994B1 (ko) 1991-07-20

Family

ID=26435026

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019880004307A KR910004994B1 (ko) 1987-04-15 1988-04-15 초전도 세라믹패턴과 그 제조방법

Country Status (6)

Country Link
US (2) US5098884A (ko)
EP (1) EP0287383B2 (ko)
KR (1) KR910004994B1 (ko)
CN (1) CN1018115B (ko)
AU (1) AU599223B2 (ko)
DE (1) DE3879536T3 (ko)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5248658A (en) * 1987-04-07 1993-09-28 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a superconducting oxide pattern by laser sublimation
AU599223B2 (en) * 1987-04-15 1990-07-12 Semiconductor Energy Laboratory Co. Ltd. Superconducting ceramic pattern and its manufacturing method
US5401716A (en) * 1987-04-15 1995-03-28 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing superconducting patterns
DE3851462T2 (de) * 1987-05-18 1995-05-04 Sumitomo Electric Industries Verfahren zur Herstellung eines supraleitenden Materials des Oxydverbundtyps.
US5225394A (en) * 1987-08-31 1993-07-06 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing high Tc superconducting circuits
FR2641530B2 (fr) * 1988-01-29 1993-05-28 Centre Nat Rech Scient Nouveau materiau composite, procede de fabrication et application
EP0358879A3 (en) * 1988-09-13 1991-02-27 Hewlett-Packard Company Method of making high density interconnects
JPH06291374A (ja) * 1993-03-31 1994-10-18 Sumitomo Electric Ind Ltd ジョセフソン接合素子
AU6674794A (en) * 1993-05-14 1994-12-12 University Of British Columbia, The Fabrication of oxide superconductor devices by impurity ion implantation
JPH07263767A (ja) 1994-01-14 1995-10-13 Trw Inc イオンインプランテーションを用いたプレーナ型の高温超伝導集積回路
US5912503A (en) * 1997-01-02 1999-06-15 Trw Inc. Planar in-line resistors for superconductor circuits
US7247603B2 (en) * 2003-10-23 2007-07-24 Star Cryoelectronics Charge dissipative dielectric for cryogenic devices
KR100595855B1 (ko) * 2004-12-29 2006-06-30 동부일렉트로닉스 주식회사 알루미늄 증착 콘택트 형성 방법
US7615385B2 (en) 2006-09-20 2009-11-10 Hypres, Inc Double-masking technique for increasing fabrication yield in superconducting electronics
CN102437281A (zh) * 2011-12-08 2012-05-02 南京大学 一种超导隧道结及其制备方法
CN111063788B (zh) * 2019-11-27 2022-06-07 中国科学院上海微系统与信息技术研究所 一种超导转变边探测器的制备方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3346425A (en) * 1964-04-01 1967-10-10 Gen Electric Superconductors
US4316785A (en) * 1979-11-05 1982-02-23 Nippon Telegraph & Telephone Public Corporation Oxide superconductor Josephson junction and fabrication method therefor
JPS58122724A (ja) * 1982-01-18 1983-07-21 Toshiba Corp 半導体素子の製造方法
JPS61191070A (ja) * 1985-02-20 1986-08-25 Toshiba Corp 半導体装置の製造方法
JPS6215864A (ja) * 1985-07-15 1987-01-24 Hitachi Ltd 太陽電池の製造方法
US4732867A (en) * 1986-11-03 1988-03-22 General Electric Company Method of forming alignment marks in sapphire
US4826808A (en) * 1987-03-27 1989-05-02 Massachusetts Institute Of Technology Preparation of superconducting oxides and oxide-metal composites
US4960751A (en) * 1987-04-01 1990-10-02 Semiconductor Energy Laboratory Co., Ltd. Electric circuit having superconducting multilayered structure and manufacturing method for same
AU599223B2 (en) * 1987-04-15 1990-07-12 Semiconductor Energy Laboratory Co. Ltd. Superconducting ceramic pattern and its manufacturing method
CA1328242C (en) * 1987-05-18 1994-04-05 Nobuhiko Fujita Process for manufacturing a superconductor and a method for producing a superconducting circuit
US4837609A (en) * 1987-09-09 1989-06-06 American Telephone And Telegraph Company, At&T Bell Laboratories Semiconductor devices having superconducting interconnects
JPH01290526A (ja) * 1988-05-18 1989-11-22 Seiko Epson Corp 高温超電導材料
EP0508844B1 (en) * 1991-03-11 1997-05-21 Sumitomo Electric Industries, Ltd. Superconducting thin film having at least one isolated superconducting region formed of oxide superconductor material and method for manufacturing the same

Also Published As

Publication number Publication date
DE3879536T2 (de) 1993-07-01
EP0287383A2 (en) 1988-10-19
US5877124A (en) 1999-03-02
US5098884A (en) 1992-03-24
AU599223B2 (en) 1990-07-12
EP0287383A3 (en) 1989-04-05
DE3879536D1 (de) 1993-04-29
KR910004994B1 (ko) 1991-07-20
CN88102320A (zh) 1988-11-02
CN1018115B (zh) 1992-09-02
DE3879536T3 (de) 2003-07-24
AU1457388A (en) 1988-10-20
EP0287383B1 (en) 1993-03-24
EP0287383B2 (en) 2002-08-21

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