KR870700028A - 초미립 탄화붕소 분말의 제조방법 - Google Patents
초미립 탄화붕소 분말의 제조방법Info
- Publication number
- KR870700028A KR870700028A KR1019860700706A KR860700706A KR870700028A KR 870700028 A KR870700028 A KR 870700028A KR 1019860700706 A KR1019860700706 A KR 1019860700706A KR 860700706 A KR860700706 A KR 860700706A KR 870700028 A KR870700028 A KR 870700028A
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- KR
- South Korea
- Prior art keywords
- boron
- amount
- present
- source
- carbon source
- Prior art date
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- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/56—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides
- C04B35/563—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on boron carbide
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
- B01J19/121—Coherent waves, e.g. laser beams
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/90—Carbides
- C01B32/914—Carbides of single elements
- C01B32/991—Boron carbide
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/64—Burning or sintering processes
- C04B35/645—Pressure sintering
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
- C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/10—Solid density
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/60—Optical properties, e.g. expressed in CIELAB-values
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/90—Other properties not specified above
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Structural Engineering (AREA)
- Electromagnetism (AREA)
- Nanotechnology (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Optics & Photonics (AREA)
- Composite Materials (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
내용 없음.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 방법을 실시하는데 적합한 장치의 사시도이다.
Claims (17)
- 주로 휘발성 붕소원, 붕소원중의 붕소에 대하여 화학양론적인 양 이하의 휘발성 탄소원 및 붕소원중의 붕소에 대하여 적어도 화학양론적인 양의 수소원으로 이루어진 반응기체의 연속 스트림을 적어도 약 300토르(Torr)의 절대 압력하에, 적어도 일부의 휘발성 붕소원을 B4C로 전환시키기 유효한 양의 CO2레이저로 조사함을 특징으로 하여, 초미립 고순도 탄화붕소 분말을 제조하는 방법.
- 제1항에 있어서, 붕소원이 알킬보론, 알킬보레이트, 수소화 붕소 또는 할로겐화 붕소인 방법.
- 제3항에 있어서, 붕소원이 삼염화붕소인 방법.
- 제3항에 있어서, BCl3에 대하여 화학양론적인 양의 약 50% 까지의 탄소원이 존재하는 방법.
- 제4항에 있어서, 탄소원이, 반응기체 혼합물중의 BCl3에 대하여 화학양론적인 양의 약 20% 내지 약 60%의 양으로 출발기체 혼합물중에 존재하고 수소가, 반응기체 혼합물중의 BCl3에 대하여 화학양론적인 양의 100% 내지 1000%의 양으로 존재하며, 반응이 약 300 내지 1500토르의 압력에서 수행되고, 탄소원이 메탄 또는 에틸렌인 방법,
- 제5항에 있어서, 탄소원이 화학양론적 양의 약 40%내지 60%의 양으로 존재하고, 수소가 200 내지 800%의 양으로 존재하며, 반응은 약 600 내지 700토르의 압력에서 수행되는 방법.
- 제1항에 있어서, 탄소원이, 출발기체 혼합물중의 붕소원에 대하여 화학양론적 양의 약 40% 내지 60%의 양으로 출발 기체 혼합물중에 존재하는 방법.
- 제1항 또는 4항에 있어서, 탄소원이 휘발성 탄화수소 또는 휘발성 할로카본인 방법.
- 제1항 또는 제8항에 있어서, 탄소원이 메탄, 에틸렌 또는 사염화탄소인 방법.
- 제4항 또는 6항에 있어서, 탄소원이 메탄인 방법.
- 제7항에 있어서, 수소가, 출발 기체혼합물중의 붕소원에 대하여 화학양론적 양의 약 300 내지 400%의 양으로 출발 기체 혼합물중에 존재하는 방법.
- 제6항에 있어서, 수소가 화학양론적 양의 300% 내지 400%의 양으로 존재하는 방법.
- 제1항에 있어서, CO2레이저가 적어도 약 10와트의 출력으로 공급되는 방법.
- 제1항에 있어서, 반응이 약 300 내지 1500토로의 압력에서 수행되는 방법.
- 제14항중에 있어서, 반응이 약 600 내지 700토르의 압력에서 수행되는 방법.
- 제1항 내지 15항중 어느 한 항에 따른 방법에 의해 제조된 탄화 붕소.
- a) 3.9 내지 4.2의 B/C 비; b) 금속당 10ppm 미만의 금속불순물; c) 100 내지 1300Å 범위의 입자크기; d) 단일분산된 분말; e) 적어도 50m2/g의 표면적; f) 미세결정성 구조 : 및 g) 이론적 밀도(2.52g/㎤)로 조밀화 될 수 있는 특성을 갖는 탄화붕소.※참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US70084185A | 1985-02-12 | 1985-02-12 | |
US700841 | 1985-02-12 | ||
PCT/US1986/000322 WO1986004524A1 (en) | 1985-02-12 | 1986-02-12 | Process for the preparation of submicron-sized boron carbide powders |
Publications (1)
Publication Number | Publication Date |
---|---|
KR870700028A true KR870700028A (ko) | 1987-02-28 |
Family
ID=24815094
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019860700706A KR870700028A (ko) | 1985-02-12 | 1986-02-12 | 초미립 탄화붕소 분말의 제조방법 |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0211948A4 (ko) |
JP (1) | JPS62501838A (ko) |
KR (1) | KR870700028A (ko) |
WO (1) | WO1986004524A1 (ko) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE454690B (sv) * | 1986-02-28 | 1988-05-24 | Asea Cerama Ab | Sett att framstella kroppar av borkarbid |
US5032242A (en) * | 1987-04-27 | 1991-07-16 | The Dow Chemical Company | Titanium diboride/boron carbide composites with high hardness and toughness |
WO1988008328A1 (en) * | 1987-04-27 | 1988-11-03 | The Dow Chemical Company | Titanium diboride/boron carbide composites with high hardness and toughness |
US5958348A (en) * | 1997-02-28 | 1999-09-28 | Nanogram Corporation | Efficient production of particles by chemical reaction |
US6849334B2 (en) | 2001-08-17 | 2005-02-01 | Neophotonics Corporation | Optical materials and optical devices |
US6919054B2 (en) | 2002-04-10 | 2005-07-19 | Neophotonics Corporation | Reactant nozzles within flowing reactors |
KR20020004959A (ko) | 1999-03-10 | 2002-01-16 | 캠베 노부유키 | 산화 아연 입자 |
FR2945035B1 (fr) * | 2009-04-29 | 2011-07-01 | Commissariat Energie Atomique | Procede d'elaboration d'une poudre comprenant du carbone, du silicium et du bore, le silicium se presentant sous forme de carbure de silicium et le bore se presentant sous forme de carbure de bore et/ou de bore seul |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2232613A1 (en) * | 1973-06-07 | 1975-01-03 | Poudres & Explosifs Ste Nale | Deposition from vapour phase using laser heating - boron cpds. obtd. on silica, carbon or tungsten substrates |
US4080431A (en) * | 1976-12-20 | 1978-03-21 | Ppg Industries, Inc. | Recovery of refractory hard metal powder product |
US4343687A (en) * | 1980-05-27 | 1982-08-10 | Research Foundation Of City University Of New York | Production of chain reactions by laser chemistry |
JPS59206042A (ja) * | 1983-05-07 | 1984-11-21 | Sumitomo Electric Ind Ltd | 微粉末の製造方法及び製造装置 |
-
1986
- 1986-02-12 EP EP19860901635 patent/EP0211948A4/en not_active Ceased
- 1986-02-12 KR KR1019860700706A patent/KR870700028A/ko not_active Application Discontinuation
- 1986-02-12 WO PCT/US1986/000322 patent/WO1986004524A1/en not_active Application Discontinuation
- 1986-02-12 JP JP61501339A patent/JPS62501838A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JPS62501838A (ja) | 1987-07-23 |
WO1986004524A1 (en) | 1986-08-14 |
EP0211948A4 (en) | 1988-01-21 |
EP0211948A1 (en) | 1987-03-04 |
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