KR870009257A - 투명하고 미끄럼성이 좋은 2축연신 폴리에스테르 필름 - Google Patents

투명하고 미끄럼성이 좋은 2축연신 폴리에스테르 필름 Download PDF

Info

Publication number
KR870009257A
KR870009257A KR870002802A KR870002802A KR870009257A KR 870009257 A KR870009257 A KR 870009257A KR 870002802 A KR870002802 A KR 870002802A KR 870002802 A KR870002802 A KR 870002802A KR 870009257 A KR870009257 A KR 870009257A
Authority
KR
South Korea
Prior art keywords
acid
film
recording material
material according
organic lubricant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR870002802A
Other languages
English (en)
Korean (ko)
Inventor
유지로 후꾸다
시게오 우쓰미
Original Assignee
다까미야 다다시
다이아호일 가부시끼 가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 다까미야 다다시, 다이아호일 가부시끼 가이샤 filed Critical 다까미야 다다시
Publication of KR870009257A publication Critical patent/KR870009257A/ko
Ceased legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/76Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/775Photosensitive materials characterised by the base or auxiliary layers the base being of paper
    • G03C1/785Photosensitive materials characterised by the base or auxiliary layers the base being of paper translucent
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/36Layered products comprising a layer of synthetic resin comprising polyesters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/20Carboxylic acid amides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2367/00Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
    • C08J2367/02Polyesters derived from dicarboxylic acids and dihydroxy compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Medicinal Chemistry (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Shaping By String And By Release Of Stress In Plastics And The Like (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
KR870002802A 1986-03-25 1987-03-25 투명하고 미끄럼성이 좋은 2축연신 폴리에스테르 필름 Ceased KR870009257A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP61066861A JPS62222829A (ja) 1986-03-25 1986-03-25 透明易滑二軸延伸ポリエステルフイルム
JP66861 1986-03-25

Publications (1)

Publication Number Publication Date
KR870009257A true KR870009257A (ko) 1987-10-24

Family

ID=13328060

Family Applications (1)

Application Number Title Priority Date Filing Date
KR870002802A Ceased KR870009257A (ko) 1986-03-25 1987-03-25 투명하고 미끄럼성이 좋은 2축연신 폴리에스테르 필름

Country Status (3)

Country Link
JP (1) JPS62222829A (enrdf_load_stackoverflow)
KR (1) KR870009257A (enrdf_load_stackoverflow)
GB (1) GB2188586B (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4894404A (en) * 1988-09-19 1990-01-16 Eastman Kodak Company Molding compositions based on poly(1,4-cyclohexylene dimethylene terephthalate) containing an amide crystallization aid
US6344310B1 (en) 1998-11-20 2002-02-05 Eastman Kodak Company Thin durable photographic element
WO2001072886A2 (en) * 2000-03-27 2001-10-04 E.I. Du Pont De Nemours And Company Reduction of friction effect between poly(ethylene terephthalate) preforms and bottles
US20120211150A1 (en) * 2011-02-18 2012-08-23 Cryovac, Inc. Method of Orienting A Polyester Film

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0061769B1 (en) * 1981-03-30 1987-04-01 Teijin Limited Magnetic recording medium

Also Published As

Publication number Publication date
GB8707094D0 (en) 1987-04-29
GB2188586A (en) 1987-10-07
GB2188586B (en) 1989-11-29
JPH0518692B2 (enrdf_load_stackoverflow) 1993-03-12
JPS62222829A (ja) 1987-09-30

Similar Documents

Publication Publication Date Title
KR870007239A (ko) 2축 배향된 방향족 폴리에스테르 필름
US4786558A (en) Composite film and antistatic composite film comprising a swellable inorganic silicate
KR920701305A (ko) 폴리에스테르카보네이트 조성물
KR830003546A (ko) 경화가능한 조성물의 제조방법
KR910011632A (ko) 실리카-핵 실리콘-쉘 입자, 상기 입자가 분산된 유화액 및 상기 유화액의 제조방법
KR940019756A (ko) 이축배향 폴리에스테르 필름
KR830007456A (ko) 보호용 유리판
KR930701553A (ko) 방오 피막 조성물
KR890700478A (ko) 감열성 공판인쇄원지용 필름
SK89887A3 (en) Elastic template made from silicon elastomer and manufacturing process thereof
BR8502756A (pt) Composicoes de emulsoes aquosas estaveis ao armazenamento,utilizaveis para o tratamento antiaderente e/ou hidrofobo de substratos,processo de preparacao,substratos induzidos e composicao para uso
US3524900A (en) Surface treating compositions
KR870009257A (ko) 투명하고 미끄럼성이 좋은 2축연신 폴리에스테르 필름
KR910020145A (ko) 개선된 감압성 접착제
US4797439A (en) Diorganopolysiloxanes curable into adhesive/elastomeric state
JPH0129833B2 (enrdf_load_stackoverflow)
KR900012971A (ko) 1,1-비스-(4-하이드록시페닐)-알킬사이클로 알칸을 기본으로 하는 폴리에스테르 및 폴리에스테르-카보네이트
KR930004361A (ko) 고투명 이활(易滑) 이형성 필름의 제조방법
KR880014010A (ko) 자기 가교성 아미노실록산 에멀젼의 제조방법
KR920009872A (ko) N-치환된 아크릴아미드 공중합체
KR890011921A (ko) 전기 및 전자 장치용 폴리이미드 수지 및 절연막
EP0819990A3 (en) Reclaimable transparencies for plain paper copiers
ID869B (id) Gabungan lembaran dan metoda untuk membuatnya
KR890014783A (ko) 금속표면 처리방법
JPS57149372A (en) Primer composition

Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 19870325

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 19890704

Comment text: Request for Examination of Application

Patent event code: PA02011R01I

Patent event date: 19870325

Comment text: Patent Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 19920222

Patent event code: PE09021S01D

E601 Decision to refuse application
PE0601 Decision on rejection of patent

Patent event date: 19920605

Comment text: Decision to Refuse Application

Patent event code: PE06012S01D

Patent event date: 19920222

Comment text: Notification of reason for refusal

Patent event code: PE06011S01I