KR870002062A - 2,3-디히드로-1h-인덴 유도체의 제조 방법 - Google Patents

2,3-디히드로-1h-인덴 유도체의 제조 방법 Download PDF

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KR870002062A
KR870002062A KR1019850006362A KR850006362A KR870002062A KR 870002062 A KR870002062 A KR 870002062A KR 1019850006362 A KR1019850006362 A KR 1019850006362A KR 850006362 A KR850006362 A KR 850006362A KR 870002062 A KR870002062 A KR 870002062A
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lower alkyl
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alkyl group
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KR1019850006362A
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KR920003116B1 (ko
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야스오 오시로
히라끼 우에다
가즈유끼 나까가와
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오오쓰까 아끼히꼬
오오쓰까 세이야꾸 가부시끼 가이샤
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Abstract

내용 없음.

Description

2,3-디히드로-1H-인덴 유도체의 제조 방법
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Claims (1)

  1. a) 하기 일반식(101′)의 화합물을 환원시켜 하기 일반식(112′)의 화합물을 수득하거나, b) 하기 일반식(103)의 화합물을 하기 일반식(5)의 화합물과 반응시켜 하기 일반식(104)의 화합물을 수득한 후, 생성된 일반식(104)의 화합물을 환원시켜 하기 일반식(105)의 화합물을 수득하거나, c) 하기 일반식(102)의 화합물을 하기 일반식(6)의 화합물과 반응하켜 하기 일반식(106)의 화합물을 수득하거나, d) 하기 일반식(102)의 화합물을 하기 일반식(7)의 화합물과 반응시켜 하기 일반식(107)의 화합물을 수득하거나, e) 하기 일반식(102)의 화합물을 하기 일반식(8)의 화합물과 반응시켜 하기 일반식(108)의 화합물을 수득하거나, f) 하기 일반식(102)의 화합물을 하기 일반식(9)의 화합물과 반응시켜 하기 일반식(109)의 화합물을 수득하거나, g) 하기 일반식(102)의 화합물을 하기 일반식(13)의 화합물과 반응시켜 하기 일반식(110)의 화합물을 수득하거나, h) 하기 일반식(115)의 화합물을 할로겐화하여 하기 일반식(116)의 화합물을 수득하거나, 또는 i) 하기 일반식(225)의 화합물을 환원시켜 하기 일반식(117)의 화합물을 수득함으로써 하기 일반식(1)로 나타내지는 2,3-디히드로-1H-인덴 유도체와 그 염을 제조하는 방법.
    식중 R1과 R2는 각각 수소원자, 저급알킬기, 비치환페닐기, 할로겐 원자와 저급알킬기로 구성된 군으로부터 선택된 최소한 하나의 치환체를 페닐 고리에 갖는 치환페닐기, 비치환 시클로알킬기, 최소한 하나의 환로겐 원자를 치환체로 시클로알킬 고리에 갖는 치환 시클로알킬기, 시클로알킬-저급 알킬기, 히드록실기, 페닐-저급 알콕시기, 비치환 페닐-저급 알킬기 또는 할로겐 원자, 저급 알킬렌 디옥시 및 저급 알콕시기로 구성된 군으로부터 선택된 최소한 하나의 치환체를 페닐고리에 갖는 치환 페닐-저급 알킬기이고; R3은 할로겐원자 또는 저급 알킬기이고; R4는 수소원자, 할로겐원자, 페닐-저급알킬기, 시클로 알킬-저급 알킬기, 피페리디닐-저급 알카노일아미노-저급 알킬기, 피리디늄-저급 알카노일아미노-저급 알킬기 또는 저급알킬기이고; R5는 히드록시이미노기, 7-10 탄소원자를 갖는 알킬아미노기 또는 일반식 -NHR8[식중 R8은 수소원자, 할로겐-치환 저급 알카노일기, 저급 알킬아미노-저급 알킬기, 페닐-저급 알킬기 또는 일반식 -A-B-식중 A는 최소한 하나의 히드록시기를 치환체로 갖는 저급 알킬기 또는 일반식 -CO-(D)ℓ- 또는 -D-CO- (식중 D는 저급 알킬렌기이고, ℓ는 0 또는 1의 정수이다)의 기이고; B는 최소한 하나의 히드록시기를 치환체로 가질 수 있는 저급 알킬기로 구성된 군으로부터 선택된 최소한 하나의 치환체를 가질 수 있는 5- 또는 6- 원 포화 또는 불포화 복소환기; 옥소기, 카르복시기, 저급 알콕시카로보닐기, 피리딜기, 프탈이미도기, 피롤리디닐카르보닐-저급 알킬기, 비치환 페닐기, 할로겐 원자, 최소한 하나의 할로겐 원자를 치환체로 가질 수 있는 저급알킬기, 저급 알콕시기 및 니트로기로 구성된 군으로부터 선택된 1-3 치환체를 페닐 고리에 갖는 치환 페닐기, 페닐-저급 알킬기 및 최소한 하나의 저급 알콕시기를 페닐 고리에 치환체로 갖는 벤조일기이다)의 기이고; R6은 수소원자 또는 페닐기이고; R7은 수소원자 또는 저급 알킬기이다; 단, R5가 히드록시이미노기인 경우 R6과 R7은 수소원자이고, 또는 R5가 일반식 -NHR8(R8은 수소원자 또는 할로겐-치환 저급 알카노일기이다)의 기이고 R1과 R2가 각각 수소원자 또는 저급 알킬기이면, R4는 수소원자, 저급 알킬기, 할로겐 원자, 니트로기, 아미노기 또는 저급 알카노일기이어서는 안된다.
    R4는 히드록시기 또는 R15(식중 R15는 저급 알케닐기, 저급 알킬아미노-저급 알킬기, 페닐-저급 알킬기, 7-10 탄소원자를 갖는 저급 알킬기이다)의 기이고; RB는 수소원자 또는 R15(R15는 상기 정의와 동일하다)의 기이고; D는 저급알킬렌기; X는 수소원자 또는 할로겐원자; A′는 저급 알킬렌기; X1은 할로겐원자; Z는 식또는의 기, (단 식의 기내의 탄소원자수가 6을 넘어서는 안된다); R14는 7-10 탄소원자를 갖는 알킬기, 저급 알케닐기, 저급 알킬 아미노-저급 알킬기, 페닐-저급 알킬기 또는 일반식 -A″-B (식중 A″는 히드록시기를 치환체로 가질 수 있는 저급 알킬렌기이고 B는 상기 정의와 동일하다)의 기이고; R3′과 R4′은 각각 R3과 R4의 정의와 같고 (단, R3′과 R4′중의 최소한 하나는 수소원자이다); R3′과 R4′은 각각 R3과 R4의 정의와 같고 (단, R3″과 R4″중의 최소한 하나는 할로겐원자이다); R15는 저급 알케닐기, 저급 알킬아미노-저급 알킬기, 페닐-저급 알킬기 또는 7-10 탄소원자를 갖는 저급 알킬기이다.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019850006362A 1984-08-31 1985-08-31 2,3-디히드로-1h-인덴 유도체의 제조방법 KR920003116B1 (ko)

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TW203010B (ko) * 1990-10-31 1993-04-01 Otsuka Pharma Co Ltd
US5401848A (en) * 1990-11-26 1995-03-28 E. R. Squibb & Sons, Inc. Indane and quinoline derivatives
AU1886892A (en) * 1991-04-12 1992-11-17 Schering Corporation Bicyclic amides as inhibitors of acyl-coenzyme a: cholesterol acyl transferase
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