KR870001680A - Manufacturing method of solar cell - Google Patents

Abstract

No content.

Description

Solar cell manufacturing method

Cross section showing the continuous step of the present invention

* Explanation of symbols for main parts of the drawings

2: base material 4: junction

8: glass layer which is silicate 10: aluminum layer

14 mask 16 deformed surface layer

20: nickel layer 26: antireflection film

Claims (10)

A method of manufacturing a solar cell as a solid state semiconductor device, the method comprising the steps of preparing a silicon substrate having opposing first and second surfaces, and placing a mechanical mask having selected holes in contact with the first surface. And exposing the first surface to the selected pore-coating hydrogen ions at a strength and time sufficient to form a surface layer of the first surface coinciding with the hole and having poor adhesion of the metal. Method for manufacturing a solar cell. The method of claim 1 wherein the portion of the surface covered by the mask is metallized after exposure to a hydrogen ion beam. The method of claim 2 wherein all of the surfaces are exposed to the metal during metallization. The method of claim 1 including forming a junction to the substrate adjacent the first surface before the first surface is exposed to a hydrogen ion beam. The method of claim 1, wherein the first surface is exposed to the hydrogen ion beam for a time and intensity sufficient to reduce minority carrier loss of the substrate. The method of claim 2 wherein the metallization is performed using a metal selected from the group of metals including nickel, palladium, cobalt, platinum and rhodium. The method of claim 1 comprising an immersion plating step to metallize the corresponding portion of the surface covered by the mask. The method of claim 7, wherein the metallization step is induced to metallize the first side of the substrate. The method of claim 2 wherein the metallization step is carried out by depositing nickel from a plating bath comprising nickel salts and fluorides. ※ Note: The disclosure is based on the initial application.