KR860005445A - Mos형 집적회로 - Google Patents
Mos형 집적회로Info
- Publication number
- KR860005445A KR860005445A KR1019850005211A KR850005211A KR860005445A KR 860005445 A KR860005445 A KR 860005445A KR 1019850005211 A KR1019850005211 A KR 1019850005211A KR 850005211 A KR850005211 A KR 850005211A KR 860005445 A KR860005445 A KR 860005445A
- Authority
- KR
- South Korea
- Prior art keywords
- integrated circuit
- mos type
- type integrated
- mos
- circuit
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
- H01L27/092—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7833—Field effect transistors with field effect produced by an insulated gate with lightly doped drain or source extension, e.g. LDD MOSFET's; DDD MOSFET's
- H01L29/7835—Field effect transistors with field effect produced by an insulated gate with lightly doped drain or source extension, e.g. LDD MOSFET's; DDD MOSFET's with asymmetrical source and drain regions, e.g. lateral high-voltage MISFETs with drain offset region, extended drain MISFETs
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59257928A JPS61135149A (ja) | 1984-12-06 | 1984-12-06 | Mos型集積回路 |
JP59-257928 | 1984-12-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR860005445A true KR860005445A (ko) | 1986-07-23 |
KR900000179B1 KR900000179B1 (ko) | 1990-01-23 |
Family
ID=17313139
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019850005211A KR900000179B1 (ko) | 1984-12-06 | 1985-07-22 | Mos형 집적회로 |
Country Status (5)
Country | Link |
---|---|
US (1) | US4721990A (ko) |
EP (1) | EP0184222B1 (ko) |
JP (1) | JPS61135149A (ko) |
KR (1) | KR900000179B1 (ko) |
DE (1) | DE3581789D1 (ko) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4908688A (en) * | 1986-03-14 | 1990-03-13 | Motorola, Inc. | Means and method for providing contact separation in silicided devices |
JPH084112B2 (ja) * | 1986-06-25 | 1996-01-17 | 株式会社東芝 | Mos型半導体装置 |
US5338693A (en) * | 1987-01-08 | 1994-08-16 | International Rectifier Corporation | Process for manufacture of radiation resistant power MOSFET and radiation resistant power MOSFET |
JPS63262873A (ja) * | 1987-04-21 | 1988-10-31 | Fuji Xerox Co Ltd | 半導体装置 |
CA1309781C (en) * | 1988-06-21 | 1992-11-03 | Colin Harris | Compact cmos analog crosspoint switch matrix |
US6043538A (en) * | 1993-09-30 | 2000-03-28 | Intel Corporation | Device structure for high voltage tolerant transistor on a 3.3 volt process |
US5589790A (en) * | 1995-06-30 | 1996-12-31 | Intel Corporation | Input structure for receiving high voltage signals on a low voltage integrated circuit device |
US5831318A (en) * | 1996-07-25 | 1998-11-03 | International Rectifier Corporation | Radhard mosfet with thick gate oxide and deep channel region |
DE10224956A1 (de) * | 2002-06-05 | 2004-01-08 | Infineon Technologies Ag | Verfahren zur Einstellung der Einsatzspannung eines Feldeffekttansistors, Feldeffekttransistor sowie integrierte Schaltung |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53128281A (en) * | 1977-04-15 | 1978-11-09 | Hitachi Ltd | Insulated gate field effect type semiconductor device for large power |
US4433257A (en) * | 1980-03-03 | 1984-02-21 | Tokyo Shibaura Denki Kabushiki Kaisha | Voltage supply for operating a plurality of changing transistors in a manner which reduces minority carrier disruption of adjacent memory cells |
JPS58158972A (ja) * | 1982-03-16 | 1983-09-21 | Toshiba Corp | 半導体装置の製造方法 |
JPS59121976A (ja) * | 1982-12-28 | 1984-07-14 | Fujitsu Ltd | 半導体装置 |
-
1984
- 1984-12-06 JP JP59257928A patent/JPS61135149A/ja active Pending
-
1985
- 1985-07-22 KR KR1019850005211A patent/KR900000179B1/ko not_active IP Right Cessation
- 1985-12-05 US US06/804,622 patent/US4721990A/en not_active Expired - Lifetime
- 1985-12-06 DE DE8585115569T patent/DE3581789D1/de not_active Expired - Lifetime
- 1985-12-06 EP EP85115569A patent/EP0184222B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0184222A2 (en) | 1986-06-11 |
EP0184222B1 (en) | 1991-02-20 |
EP0184222A3 (en) | 1987-01-28 |
JPS61135149A (ja) | 1986-06-23 |
DE3581789D1 (de) | 1991-03-28 |
KR900000179B1 (ko) | 1990-01-23 |
US4721990A (en) | 1988-01-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20021231 Year of fee payment: 14 |
|
LAPS | Lapse due to unpaid annual fee |